• 한국컴퓨터정보학회:학술대회논문집
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• 한국컴퓨터정보학회 2020년도 제62차 하계학술대회논문집 28권2호
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• pp.295-296
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• 2020

본 논문에서는 RPA(Robotic Process Automation) Tool 개발 과정 중 머신 러닝, 딥러닝에 필요한 이미지 크롤링 및 전처리 기능을 이용한 가공된 데이터 셋 처리 과정을 기술한다. 개발된 RPA 툴에서 머신러닝 및 딥러닝에 사용될 데이터 확보 기능을 제공하며, 세부적으로 이미지 전처리(Convert Gray, Histogram Equalization, Binary, Resize)등 반복적으로 사용되는 기능들을 제공한다. 개발된 툴을 통해 RPA의 자동화 기능과, 전처리 기능의 융합을 통해 업무의 효율성을 제공한다.

• 대한안전경영과학회지
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• 제15권2호
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• pp.263-271
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• 2013

This paper reviewed the relationship between innovation(organization innovation, personnel innovation, product innovation, process innovation) and firm performance in small business. Based on the responses from 218 firms, the results of multiple regression analysis showed that personnel innovation, product innovation, and process innovation effect positively on all firm performance(sales, profit, market share, customer satisfaction), and organization innovation effects positively only on market share and customer satisfaction. The results of hierarchical regression analysis showed that technical innovation(product innovation, process innovation) effects more positively on sales, profit and customer satisfaction than administrative innovation(organization innovation, personnel innovation).

• 한국펄프종이공학회:학술대회논문집
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• 한국펄프종이공학회 1999년도 춘계학술발표논문집
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• pp.45-48
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• 1999

• 한국펄프종이공학회:학술대회논문집
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• 한국펄프종이공학회 1999년도 춘계학술발표논문집
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• pp.26-26
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• 1999

• 한국펄프종이공학회:학술대회논문집
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• 한국펄프종이공학회 2002년도 추계학술발표논문집
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• pp.261-267
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• 2002

• 한국펄프종이공학회:학술대회논문집
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• 한국펄프종이공학회 2001년도 춘계학술발표논문집
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• pp.136-143
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• 2001

• 한국펄프종이공학회:학술대회논문집
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• 한국펄프종이공학회 2004년도 추계학술발표집
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• pp.257-258
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• 2004

• 한국펄프종이공학회:학술대회논문집
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• 한국펄프종이공학회 2008년도 춘계학술대회
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• pp.54-59
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• 2008

• 한국펄프종이공학회:학술대회논문집
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• 한국펄프종이공학회 2000년도 춘계학술발표논문집
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• pp.150-158
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• 2000

• 세라미스트
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• 제22권4호
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• pp.429-451
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• 2019

Quartz glass is a key material for making semiconductor process components because of its purity, low thermal expansion, high UV transmittance and relatively low cost. Domestic quartz glass has a market worth about 500 billion won in 2018, and the market power of Japanese materials is very high. Quartz glass for semiconductor process can be divided into general process and exposure. For general process, molten quartz glass is mainly used, but synthetic quartz glass with higher purity is preferred. Synthetic quartz glass is used as the photomask for the exposure process. Recently, as semiconductors started the sub-nm process, the transition from the transmission type using ArF ultraviolet (194 nm) to the reflection type using EUV ultraviolet (13.5 nm) began. Therefore, the characteristics required for the synthetic quartz glass substrates used so far are also rapidly changing. This article summarizes the current technical trends of quartz glass and recent technical issues. Lastly, the present situation and development possibility of quartz glass technology in Korea were diagnosed.