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Current Status of Quartz Glass for Semiconductor Process

반도체 공정용 석영유리 현황

  • Kim, Hyeong-Jun (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
  • 김형준 (한국세라믹기술원 엔지니어링세라믹센터)
  • Received : 2019.09.19
  • Accepted : 2019.10.30
  • Published : 2019.12.31
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Abstract

Quartz glass is a key material for making semiconductor process components because of its purity, low thermal expansion, high UV transmittance and relatively low cost. Domestic quartz glass has a market worth about 500 billion won in 2018, and the market power of Japanese materials is very high. Quartz glass for semiconductor process can be divided into general process and exposure. For general process, molten quartz glass is mainly used, but synthetic quartz glass with higher purity is preferred. Synthetic quartz glass is used as the photomask for the exposure process. Recently, as semiconductors started the sub-nm process, the transition from the transmission type using ArF ultraviolet (194 nm) to the reflection type using EUV ultraviolet (13.5 nm) began. Therefore, the characteristics required for the synthetic quartz glass substrates used so far are also rapidly changing. This article summarizes the current technical trends of quartz glass and recent technical issues. Lastly, the present situation and development possibility of quartz glass technology in Korea were diagnosed.

Keywords

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