• Title/Summary/Keyword: Substrate Effect

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Enzymatic Hydrolysis of Marine Algae Hizikia fusiforme (해조류 톳 (Hizikia fusiforme)의 효소 가수분해)

  • Song, Bu-Bok;Kim, Sung-Koo;Jeong, Gwi-Taek
    • KSBB Journal
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    • v.26 no.4
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    • pp.347-351
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    • 2011
  • In this study, we investigated the effect of reaction factors on enzymatic hydrolysis of Hizikia fusiforme, which is brown algae in marine biomass resource, using commercial enzymes. The composition of H. fusiforme is 38.9% of reducing sugar, 4.8% of moisture, 17.8% of ash, and 38.5% of others. In the condition of 1-5% substrate, the increase of substrate concentration enhanced the increase of reducing sugar formation; however, the hydrolysis yield did not increase after 24 h. After reaction of 75 h, conversion yield of reducing sugar were obtained to 16.45%, 17.99%, and 14.55% at 1, 2.5, and 5% substrate, respectively. As a result of effect of enzyme amount, the formation of reducing sugar did not show considerable change at 1% substrate. However, in the condition of 2.5% substrate, the great change of reducing sugar formation was observed by the increase of enzyme amount. The conversion yields of reducing sugar were obtained to 18.77% and 22.83% at 1% and 2.5% substrate with 30% enzyme, respectively. As a result of heat treatment of biomass, the high yield was obtained in 2.5% substrate and the yields were increased to 0.06-7.2% by the heat treatment. This result will provide the basic information for production process of biofuels and chemicals from marine biomass H. fusiforme.

The Effect of Substrate DC Bias on the Low -Temperature Si homoepitaxy in a Ultrahigh Vacuum Electron Cyclotron Resonance Chemical Vapor Deposition (초고진공 전자 사이클로트론 화학 기상 증착 장치에 의한 저온 실리콘 에피 성장에 기판 DC 바이어스가 미치는 영향)

  • 태흥식;황석희;박상준;윤의준;황기웅;송세안
    • Journal of the Korean Vacuum Society
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    • v.2 no.4
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    • pp.501-506
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    • 1993
  • The spatial potential distribution of electron cyclotron resonance plasma is measured as a function of tehsubstrate DC bias by Langmuir probe method. It is observed that the substrate DC bias changes the slope of the plasma potential near the subsrate, resulting in changes in flux and energy of the impinging ions across plasma $_strate boundary along themagnetric field. The effect of the substrate DC bias on the low-temperature silicon homoepitaxy (below $560^{\circ}C$) is examine dby in situ reflection high energy electron diffraction (RHEED), cross-section transmission electron microscopy (XTEM),plan-view TEM and high resolution transmision electron microscopy(HRTEM). While the polycrystalline silicon layers are grow withnegative substrate biases, the single crystaline silicon layers are grown with negative substrate biases, the singel crystalline silicon layers are grown with positive substrate biases. As the substrate bias changes form negative to positive values, the growth rate decreases. It is concluded that the control of the ion energy during plasma deposition is very important in silicon epitaxy at low temperatures below $560^{\circ}C$ by UHV-ECRCVD.VD.

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Low temperature deposition of LaMnO3 on IBAD-MgO template assisted by plasma (IBAD-MgO 기판상에 플라즈마를 이용한 LaMnO3 저온 증착)

  • Kim, H.S.;Oh, S.S.;Ha, D.W.;Ha, H.S.;Ko, R.K.;Moon, S.H.
    • Progress in Superconductivity and Cryogenics
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    • v.14 no.1
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    • pp.1-3
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    • 2012
  • LMO($LaMnO_3$) buffer layer of superconducting coated conductor was deposited on IBAD-MgO template in the plasma atmosphere at $650^{\circ}C$ which is relatively low compared with conventional deposition temperature of more than $800^{\circ}C$. Deposition method of LMO was DC sputtering, and target and deposition chamber were connected to the cathode and anode respectively. When DC voltage was applied between target and chamber, plasma was formed on the surface of target. The tape substrate was located with the distance of 10 cm between target and tape substrate. When anode bias was connected to the tape substrate, electrons were attracted from plasma in target surface to the tape substrate, and only tape substrate was heated by electron bombardment without heating any other zone. The effect of electron bombardment on the surface of substrate was investigated by increasing bias voltage to the substrate. We found out that the sample of electron bombardment had the effect of surface heating and had good texturing at low controlling temperature.

Radiation Characteristics of a Probe-Fed Microstrip Patch Antenna on a Finite Grounded High Permittivity Substrate

  • Kwak, Eun-Hyuk;Yoon, Young-Min;Kim, Boo-Gyoun
    • Journal of Electrical Engineering and Technology
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    • v.10 no.4
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    • pp.1738-1745
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    • 2015
  • Radiation characteristics of a probe-fed rectangular microstrip patch antenna printed on a finite grounded high permittivity substrate are investigated systematically for various square grounded dielectric substrate sizes with several thicknesses and dielectric constants by experiment and full wave simulation. The effect of the substrate size on the radiation characteristics of a rectangular patch antenna is mainly determined by the effective dielectric constant of surface waves on a grounded dielectric substrate. As the effective dielectric constant of surface waves increases, the substrate sizes for the maximum broadside gain and the required onset for a large magnitude of squint angle decrease, while the variations of the broadside gain, the front-to-back ratio, and the magnitude of squint angle versus the substrate size increase due to the increase of the power of the surface wave.

Effect of a Finite Substrate on the Radiation Characteristics of a Linear Phased Array Antenna Positioned along the E-plane (유한한 기판 크기가 E-평면으로 배열된 선형 위상 배열 안테나의 방사 특성에 미치는 영향)

  • Kim, Tae-Young;Kim, Gun-Su;Yoon, Young-Min;Kim, Boo-Gyoun
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.48 no.5
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    • pp.46-53
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    • 2011
  • The effect of a finite substrate on the radiation characteristics of a linear 7-element array antenna positioned along the E-plane is investigated. Active reflection coefficients and average active element patterns are simulated for various substrate sizes. The E-plane radiation pattern of a fully excited array for various scan angles is correlated with the active reflection coefficient and average acitive element pattern. The effect of E-plane substrate size on the radiation characteristics of a linear array along the E-plane is larger than that of H-plane substarte size.

A Study on the Reduction of Gossypol Levels by Mixed Culture Solid Substrate Fermentation of Cottonseed Meal

  • Zhang, Wenju;Xu, Zirong;Sun, Jianyi;Yang, Xia
    • Asian-Australasian Journal of Animal Sciences
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    • v.19 no.9
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    • pp.1314-1321
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    • 2006
  • The objective of this work was to study the effect of mixed culture solid substrate fermentation of C. tropicalis ZD-3 with A. niger ZD-8 on detoxification of cottonseed meal (CSM), and to investigate the effect of fermentation period, proportion of CSM in substrate, sodium carbonate, minerals and heat treatment on the reduction of free gossypol levels during mixed culture solid substrate fermentation of CSM. Experiment 1: Three groups of disinfected CSM substrate were incubated for 48 h after inoculation with either of the fungi C. tropicalis ZD-3, A. niger ZD-8 or mixed culture (C. tropicalis ZD-3 with A. niger ZD-8). One non-inoculated group was used as the control. Levels of initial and final free gossypol (FG), CP and in vitro CP digestibility were assayed. The results indicated that mixed culture fermentation was far more effective than single strain fermentation, which not only had higher detoxification rate, but also had higher CP content and in vitro digestibility. Experiment 2: CSM substrates were treated according to experimental variables including fermentation period, proportion of CSM in substrate, sodium carbonate, minerals and heat treatment, Then, the treated CSM substrates were inoculated with mixed culture (C. tropicalis ZD-3 with A. niger ZD-8) and incubated at $30^{\circ}C$ for 36 h in a 95% relative humidity chamber. After fermentation ended, FG and CP content of fermented CSM substrate was assayed. The results showed that the appropriate fermentation period was 36 h, and the optimal proportion of CSM in substrate was 70%. Addition of sodium carbonate to CSM substrate was beneficial for fermentative detoxification. Heat treatment could facilitate fermentative detoxification, and supplementation with minerals was instrumental in reducing gossypol levels during mixed culture solid substrate fermentation of CSM.

Influence of Magnetic Field Near the Substrate on Characteristics of ITO Film Deposited by RF Sputtering Method (기판 부근의 자기장이 RF 스퍼터링법으로 증착된 ITO 박막의 특성에 미치는 영향)

  • Kim, Hyun-Soo;Jang, Ho-Won;Kang, Jong-Yoon;Kim, Jin-Sang;Yoon, Suk-Jin;Kim, Chang-Kyo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.7
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    • pp.563-568
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    • 2012
  • Indium tin oxide (ITO) films were prepared using radio frequency (RF) magnetron sputtering method, magnets were equipped near the target in the sputter to bring the plasma near the target. The effect of magnetic field that brings the plasma near the substrate was compared with that of substrate heating. The effect of substrate heating on the grain size of the ITO thin film was larger than that of the magnetic field. However, the grain size of the ITO thin film was larger when the magnetic field was applied near the substrate during the sputtering process than when the substrate was not heated and the magnetic field was not applied. If stronger magnetic field is applied near the substrate during sputtering, it can be expected that the ITO thin film with good electrical conductivity and high transparency is obtained at low substrate temperature. When magnetic field of 90 Gauss was applied near the substrate during sputtering, the mobility of the ITO thin film increased from 15.2 $cm^2/V.s$ to 23.3 $cm^2/V.s$, whereas the sheet resistivity decreased from 7.68 ${\Omega}{\cdot}cm$ to 5.11 ${\Omega}{\cdot}cm$.

Numerical Analysis on the Design Variables and Thickness Deviation Effects on Warpage of Substrate for FCCSP (FCCSP용 기판의 warpage에 미치는 설계인자와 두께편차 영향에 대한 수치적 해석)

  • Cho, Seunghyun;Jung, Hunil;Bae, Onecheol
    • Journal of the Microelectronics and Packaging Society
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    • v.19 no.3
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    • pp.57-62
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    • 2012
  • In this paper, numerical analysis by finite element method, parameter design by the Taguchi method and ANOVA method were used to analyze about effect of design deviations and thickness variations on warpage of FCCSP substrate. Based on the computed results, it was known that core material in substrate was the most determining deviation for reducing warpage. Solder resist, prepreg and circuit layer were insignificant effect on warpage relatively. But these results meant not thickness effect was little importance but mechanical properties of core material were very effective. Warpage decreased as Solder resist and circuit layer thickness decreased but effect of prepreg thickness was conversely. Also, these results showed substrate warpage would be increased to maximum 40% as thickness deviation combination. It meant warpage was affected by thickness tolerance under manufacturing process even if it were met quality requirements. Threfore, it was strongly recommended that substrate thickness deviation should be optimized and controlled precisely to reduce warpage in manufacturing process.

Effect of a Finite Substrate on the Mutual Coupling of a Pair of Microstrip Patch Antennas along the H-plane (유한한 기판 크기가 H-평면상에 배열된 두 개의 패치안테나간의 상호결합에 미치는 영향)

  • Kim, Gun-Su;Kim, Tae-Young;Kim, Boo-Gyoun
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.47 no.10
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    • pp.67-73
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    • 2010
  • In this paper, the effect of a finite substrate on the mutual coupling of a pair of microstrip patch antennas along the H -plane is investigated. The mutual coupling of a pair of microstrip patch antennas can be reduced using the interference effect due to the phase difference by a variety of routes of the surface wave. In the case of the substrate with $\varepsilon_r$=10 and thickness of 3.2 mm, the mutual coupling is reduced by 4.85 dB on the substrate size with the strong mutual coupling, while the mutual coupling is reduced by 34.28 dB on the substrate size with the weak mutual coupling when the distance between the antenna centers is varied from 0.5 $\lambda_0$ to 1.0 $\lambda_0$. In the case of optimization substrate size, the decreasing rate of the mutual coupling with the increase of the distance between the antenna centers is very large. Good agreements between the image method and full wave simulation results are obtained.