• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
• /
• pp.116-119
• /
• 2003

Self-patterning of thin films using photosensitive sol solution has advantages such as simple manufacturing process compared to photoresist/dry etching process. In this study, ferroelectric $Sr_{0.9}Bi_{2.1}Ta_2O_9$(SBT) and $La_{0.5}Sr_{0.5}CoO_3$(LSCO)thin films have been prepared by spin coating method using photosensitive sol solution. $Sr(OC_2H5)_2$, $Bi(TMHD)_3$ and $Ta(OC_2H)_5)_5$ were used as starting materials for SBT solution and $La(OCH_2CH_2OCH_3)_3$, $Sr(OC_2H_5)_2$, $CO(OCH_2CH_2OCH_3)_2$ were used for LSCO solution. Solubility difference by UV irradiation on LSCO thin film allows to obtain a fine patterning due to M-O-M bond formation. The lowest resistivity($4{\times}10^{-3}{\Omega}cm$) of LSCO thin films was obtained by annealing at $740^{\circ}C$.

• 한국진공학회지
• /
• 제19권6호
• /
• pp.483-488
• /
• 2010

스핀코팅 방법을 이용하여 다양한 농도의 전구체로 ZnO 나노 섬유질 박막(ZnO nano-fibrous thin films)을 성장하였고, 그에 따른 표면 및 광학적 특성 변화를 scanning electron microscopy (SEM)와 photoluminescence (PL)을 이용하여 측정하였다. 전구체 농도가 0.4 mol (M) 이하 일 때는 성장률이 낮아 ZnO 핵생성만이 되었고, 0.6 M 이상일 때 ZnO 박막은 나노섬유질 구조가 되었다. 전구체 농도가 더욱 증가함에 따라 ZnO 나노 섬유질의 굵기가 굵어졌고 ZnO 박막의 두께도 단계적으로 두꺼워졌다. 전구체 농도가 증가함에 따라 ZnO 나노 섬유질 박막의 photoluminescence (PL)의 근밴드가장자리 광방출(near-band-edge emission) 피크 세기와 full-width at half-maximu (FWHM)이 증가하였고, 깊은 준위 광방출(deep-level mission) 피크는 적색편이(red-shift)하였다.

• 한국결정성장학회지
• /
• 제24권3호
• /
• pp.99-105
• /
• 2014

$LiCoO_2$는 박막전지의 양극재료로써 많은 관심을 받고 있는 물질이다. 본 연구에서는 졸-겔 스핀코팅공정과 열처리 과정을 거쳐 Au 금속 지지체 위에 $LiCoO_2$ 박막을 합성하였으며, 열처리 온도와 열처리 시간에 따른 $LiCoO_2$ 박막의 전기 화학적 성질을 고찰하였다. 합성된 박막의 물리화학적 성질은 X-선회절분석기(XRD), 전자현미경(SEM)과 원자간력현미경(AFM)에 의해 조사하였으며 전기화학적 특성분석을 위하여 galvanostatic법을 이용하여 충 방전 사이클 특성도 조사하였다. X-선 회절 결과로부터 $550^{\circ}C$와 $750^{\circ}C$ 지지체 위에 성장된 박막은 각각 스피넬구조와 층상 암염구조를 갖는다. $750^{\circ}C$에서 10분과 30분 열처리한 시료의 RMS 조도와 입자의 크기는 큰 차이를 보이지 않았으나, 120분 열처리한 시료는 RMS 조도의 증가, 입자크기의 증가 그리고 세공이 관찰되었다. $750^{\circ}C$에서 10분, 30분, 120분 열처리한 $LiCoO_2$ 박막의 방전용량은 각각 54.5, 56.8, $51.8{\mu}Ah/cm^2{\mu}m$이고 50회의 충 방전 후의 방전용량 복원률은 97.25, 76.69, 77.19 %이다.

• 한국산학기술학회논문지
• /
• 제21권4호
• /
• pp.20-25
• /
• 2020

나노과학과 나노기술의 발전에 따라 선택적 패턴 성장을 위한 기술이 주목을 받고 있다. 실리카(Silica) 나노입자는 바이오 라벨링, 바이오 이미징 및 바이오 센싱에 사용되고 있는 유망한 나노소재이다. 본 연구에서는 실리카 나노입자를 수정된 스토버 방법(Stöber Method)인 졸겔(Sol-Gel) 공정으로 합성하였다. 또한 기판의 표면을 미세접촉프린팅 기술로 발수 처리하여 실리카 나노입자를 선택적으로 패턴 성장시켰다. 합성된 실리카 나노입자의 크기와 선택적으로 패턴 성장된 실리카 나노입자의 표면형상을 전계방출 주사전자현미경(Field Emission Scanning Electron Microscopy, FE-SEM)으로 조사하였고, 기판의 표면 기능화에 따른 기판의 접촉각 특성을 조사하였다. 그 결과 OTS 용액으로 발수 처리된 기판에서는 실리카 나노입자를 스핀 코팅하였을 때, 실리카 나노입자를 관찰할 수 없었으나, KOH 용액으로 친수 처리된 기판에서는 실리카 나노입자가 잘 코팅되는 것을 확인하였다. 또한 미세접촉프린팅 기술로 발수 처리한 기판영역 외에서만 실리카 나노입자가 선택적으로 패턴 성장하는 것을 FE-SEM으로 확인하였다. 이러한 실리카 나노입자의 패턴성장 특성을 염료가 도핑 된 실리카 나노입자에 적용한다면, 실리카 나노입자의 패턴 성장 기술은 바이오 이미징 및 바이오 센싱 분야에 유용하게 활용될 것으로 기대된다.

• 한국전기전자재료학회논문지
• /
• 제37권2호
• /
• pp.164-168
• /
• 2024

(La_0.7Sr_0.3)(Mn_1-xFe_x)O₃ (LSMFO) (x = 0.03, 0.06, 0.09, 0.12) precursor solution are prepared by sol-gel method. LSMFO thin films are fabricated by the spin-coating method on Pt/Ti/SiO₂/Si substrate, and the sintering temperature and time are 800℃ and 1 hr, respectively. The average thickness of the 6-times coated LSMFO films is about 181 to 190 nm and average grain size is about 18 to 20 nm. As the amount of Fe added in the LSMFO thin film increased, the resistivity decreased, and the TCR and B_25/65-value increased. Electrical resistivity, TCR and B_25/65-value of the (La_0.7Sr_0.3)(Mn_0.88Fe_0.12)O₃ thin film are 0.0136 mΩ-cm, 0.358%/℃, and 328 K at room temperature, respectively. The resistivity properties of LSMFO thin films matched well with Mott's VRH model.

• Transactions on Electrical and Electronic Materials
• /
• 제13권2호
• /
• pp.64-68
• /
• 2012

We have successfully demonstrated a bandgap alteration of transparent zinc oxide (ZnO) thin film with Mg dopant by using sol-gel spin coating technique. By increasing the dopant from 0 to 30 atomic percent (at.%), a decrement value in the cutoff is observed, where the absorption edge shifts continuously to the shorter wavelength side, towards 300 nm. This resulted in a significant bandgap increment from 3.28 to 3.57 eV. However, the transmittance of the thin film at 350-800 nm gradually downgraded, from 93 to 80 % which is most probably due to the grain size that becomes bigger, and it also affected the electrical properties. The decrement from 45 to 0.05 mA at +10 V was observed in the I-V characteristics, concluding the significant relationship; where higher optical bandgap materials will exhibit lower conductivity. These findings may be useful in optoelectronics devices.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
• /
• pp.242-242
• /
• 2012

Transparent oxide semiconductors are increasingly becoming one of good candidates for high efficient channel materials of thin film transistors (TFTs) in large-area display industries. Compare to the conventional hydrogenated amorphous silicon channel layers, solution processed ZnO-TFTs can be simply fabricated at low temperature by just using a spin coating method without vacuum deposition, thus providing low manufacturing cost. Furthermore, solution based oxide TFT exhibits excellent transparency and enables to apply flexible devices. For this reason, this process has been attracting much attention as one fabrication method for oxide channel layer in thin-film transistors (TFTs). But, poor electrical characteristic of these solution based oxide materials still remains one of issuable problems due to oxygen vacancy formed by breaking weak chemical bonds during fabrication. These electrical properties are expected due to the generation of a large number of conducting carriers, resulting in huge electron scattering effect. Therefore, we study a novel technique to effectively improve the electron mobility by applying environmental annealing treatments with various gases to the solution based Li-doped ZnO TFTs. This technique was systematically designed to vary a different lithium ratio in order to confirm the electrical tendency of Li-doped ZnO TFTs. The observations of Scanning Electron Microscopy, Atomic Force Microscopy, and X-ray Photoelectron Spectroscopy were performed to investigate structural properties and elemental composition of our samples. In addition, I-V characteristics were carried out by using Keithley 4,200-Semiconductor Characterization System (4,200-SCS) with 4-probe system.

• 한국안광학회지
• /
• 제3권1호
• /
• pp.237-242
• /
• 1998

$80SiO_2-20TiO_2$(mol%)의 무색투명한 비정질 박막을 현미경용 슬라이드 유리판과 사파이어 위에 tetraethyl orthosilicate와 titanium trichloride의 전구체 용액을 사용하여 스핀코팅방법으로 제조하였다. 코팅 후 $750^{\circ}C$에서 열처리된 박막은 높은 투과율과 낮은 반사율을 보였다. 슬라이드 유리판에 코팅한 $SiO_2-TiO_2$ 박막의 경우에 나트륨이온과 산소 간의 강한 상호작용에 의하여 고온과 높은 습도에서도 안정성이 우수하였다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2002년도 하계학술대회 논문집
• /
• pp.305-309
• /
• 2002

We have successfully fabricated a Metal-Ferroelectric-Insulator-Semiconductor (MFIS) structure using Bi$\sub$4-x/La$\sub$x/Ti$_3$O$\sub$12/ (BLT) ferroelectric thin film and SiO$_2$/Nitride/SiO$_2$ (ONO) stacked buffer layers for single transistor type ferroelectric nonvolatile memory applications. BLT films were deposited on 15 nm-thick ONO buffer layer by sol-gel spin-coating. The dielectric constant and the leakage current density of prepared ONO film were measured to be 5.6 and 1.0 x 10$\^$-8/ A/$\textrm{cm}^2$ at 2MV/cm, respectively, It was interesting to note that the crystallographic orientations of BLT thin films were strongly effected by pre-bake temperatures. X-ray diffraction patterns showed that (117) crystallites were mainly detected in the BLT film if pre-baked below 400$^{\circ}C$. Whereas, for the films pre-baked above 500$^{\circ}C$, the crystallites with preferred c-axis orientation were mainly detected. From the C-V measurement of the MFIS capacitor with c-axis oriented BLT films, the memory window of 0.6 V was obtained at a voltage sweep of ${\pm}$8 V, which evidently reflects the ferroelectric memory effect of a BLT/ONO/Si structure.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2000년도 영호남학술대회 논문집
• /
• pp.34-38
• /
• 2000

Recently, the ceramics of high permittivity are applied to DRAM and FRAM. In this study, (Ba, Sr)$TiO_3$ (BST) ceramics thin films were prepared by Sol-Gel method. BST solution was made and spin-coated on Pt/$SiO_2$/Si substrate at 4000 [rpm] for 10 seconds. Coated specimens were dried at $150[^{\circ}C]$ for 5 minutes. Coating process was repeated 3 times and then sintered at $750[^{\circ}C]$ for 30 minutes. Each specimen was analyzed structure and electrical characteristics by Fractal Process. Thickness of BST ceramics thin films are about $2000{\AA}$. Dielectric constant and loss of thin films was little decreased at 1[KHz] - 1[MHz]. Dielectric constant and loss to frequency were 250 and 0.02 in BST3. The property of leakage current as the realation between the current and the voltage was that change of the leakage current was stable when the applied voltage was 0~3[V].