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http://dx.doi.org/10.5762/KAIS.2020.21.4.20

Selective Pattern Growth of Silica Nanoparticles by Surface Functionalization of Substrates  

Kim, Ki-Chul (Department of Advanced Chemical Engineering, Mokwon University)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.21, no.4, 2020 , pp. 20-25 More about this Journal
Abstract
As nanoscience and nanotechnology advance, techniques for selective pattern growth have attracted significant attention. Silica nanoparticles (NPs) are used as a promising nanomaterials for bio-labeling, bio-imaging, and bio-sensing. In this study, silica NPs were synthesized by a sol-gel process using a modified Stöber method. In addition, the selective pattern growth of silica NPs was achieved by the surface functionalization of the substrate using a micro-contact printing technique of a hydrophobic treatment. The particle size of the as-synthesized silica NPs and morphology of selective pattern growth of silica NPs were characterized by FE-SEM. The contact angle by surface functionalization of the substrate was investigated using a contact angle analyzer. As a result, silica NPs were not observed on the hydrophobic surface of the OTS solution treatment, which was coated by spin coating. In contrast, the silica NPs were well coated on the hydrophilic surface after the KOH solution treatment. FE-SEM confirmed the selective pattern growth of silica NPs on a hydrophilic surface, which was functionalized using the micro-contact printing technique. If the characteristics of the selective pattern growth of silica NPs can be applied to dye-doped silica NPs, they will find applications in the bio imaging, and bio sensing fields.
Keywords
Sol-Gel Process; Silica Nanoparticle; Selective Pattern Growth; $St{\ddot{o}}ber$ Method; Micro-contact Printing;
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