• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.132-132
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• 2009

A 2D-simulation using a quantum model of silicon nanowire (SiNW) field-effect transistors (FETs) have been performed by the effective mass theory. We have investigated very close for real device analysis, so we used to the non-equilibrium Green's function (NEGF) and the density gradient of quantum model. We investigated I-V characteristics curve and C-V characteristics curve of the channel thickness from 5nm to 200nm. As a result of simulation, even higher drain current in SiNW using a quantum model was observed than in SiNW using a non-quantum model. The reason of higher drain current can be explained by the quantum confinement effect.

• JSTS:Journal of Semiconductor Technology and Science
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• v.14 no.4
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• pp.451-456
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• 2014

A compact model of a depletion-mode silicon-nanowire (Si-NW) pH sensor is proposed. This drain current model is obtained from the Pao-Sah integral and the continuous charge-based model, which is derived by applying the parabolic potential approximation to the Poisson's equation in the cylindrical coordinate system. The threshold-voltage shift in the drain-current model is obtained by solving the nonlinear Poisson-Boltzmann equation for the electrolyte. The simulation results obtained from the proposed drain-current model for the Si-NW field-effect transistor (SiNWFET) agree well with those of the three-dimensional (3D) device simulation, and those from the Si-NW pH sensor model also agree with the experimental data.

• Transactions on Electrical and Electronic Materials
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• v.14 no.3
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• pp.139-142
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• 2013

Silicon nanowire (SiNW) silicon-oxide-nitride-oxide-silicon (SONOS) flash memory devices were fabricated and their electrical characteristics were analyzed. Compared to planar SONOS devices, these SiNW SONOS devices have good program/erase (P/E) characteristics and a large threshold voltage ($V_T$) shift of 2.5 V in 1ms using a gate pulse of +14 V. The devices also show excellent immunity to short channel effects (SCEs) due to enhanced gate controllability, which becomes more apparent as the nanowire width decreases. This is attributed to the fully depleted mode operation as the nanowire becomes narrower. 3D TCAD simulations of both devices show that the electric field of the junction area is significantly reduced in the SiNW structure.

• Korean Journal of Materials Research
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• v.15 no.3
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• pp.189-194
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• 2005

[ $SiO_2$ ] nanowires were synthesized using the catalyst evaporation method. Grown nanowires had different shapes by kind of used metal catalyst. Mean diameters of grown $SiO_2$ nanowire were about 30 nm. The kind of catalysts affected microstructure of grown $SiO_2$ nanowire because of its typical growth reactions through the liquid state metal catalysts. Optical property were measured by photoluminescence spectroscopy. Relatively broad peak was obtained and mean peak positioned at 450 nm.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2012.10a
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• pp.822-824
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• 2012

21세기는 유전자, 질병검사를 통해 질병 예방, 예후 관리, 재택 및 원격 진료 시스템을 구축하여 초고감도, 실시간으로 환자의 건강 상태를 모니터링 하고, 진단, 처방할 수 있는 IT/BT/NT를 결합한 유비쿼터스 의료 시스템이 대두할 것으로 기대되고 있다. 유비쿼터스 의료 시스템의 핵심적인 역할을 할 것으로 기대되는 바이오센서는 측정 기술로서 획기적인 발전을 거듭하고 있으며 생물학, 화학, 의학, 전자, 물리, 컴퓨터, 기계 공학 등 최첨단 학문의 관련 기술이 복합적으로 융합되면서 실용화에 필요한 요소 기술들이 접목되고 점점 소형화, 시스템화 되어 가고 있는 추세이다. 특히 SiNW(silicon nanowire) 바이오센서 같은 경우 양쪽의 전극이 소스와 드레인 역할을 하고 SiNW receptor가 검출대상과 결합하면 게이트 역할을 하게 된다. 불순물의 농도에 따라 전기적 특성이 결정되는데 검출하고자하는 대상이 receptor와 결합하게 되면 마치 MOS에서 게이트에 전압을 인가한 동작과 같은 역할을 하게 되어 소소와 드레인 사이에 채널이 형성되고 하나의 저항처럼 동작하게 된다. 본 논문에서는 기존의 MOS를 이용하여 현재 전자소자나 바이오센서 등 많은 분야에서 응용되고 있는 SiNW 바이오센서의 기능과 유사하게 피드백 회로를 통해 구현하였다. 피드백 회로의 정상 작동 확인과 SiNW 바이오센서의 역할을 대체한 MOS 소자의 정상 작동을 확인을 위해 블루투스 통신을 이용하여 모니터에 전압 값을 표시한다.

• Korean Journal of Materials Research
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• v.19 no.3
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• pp.137-141
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• 2009

Density functional theory was utilized to investigate the growth of an indium nanowire on a Si (001) buckled surface. A site between the edge of two Si dimers is most favorable when the first In atom is adsorbed on the surface at an adsorption energy level of 2.26 eV. The energy barriers for migration from other sites to the most favorable site are low. When the second In atom is adsorbed next to the first In atom to form an In dimer perpendicular to the Si dimer row, the adsorption energy is the highest among all adsorption sites. The third In atom prefers either of the sites next to the In dimer along the In dimer direction. The fourth In atom exhibited the same tendency showed by the second atom. The second and fourth In adsorption energy levels are higher than the first and third levels as the In atoms consume the third valence electron by forming In dimers. Therefore, the In nanowire grows perpendicular to the Si dimer row on the Si (001) surface, as it satisfies the bonding of the three valence electrons of the In atoms.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2018.10a
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• pp.381-382
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• 2018

Subthreshold swings (SSs) and on-currents of four types of junctionless nanowire tunnel field-effect transistor(JLNW-TFET) are observed. Ge-Si structure for the source-channel junction has the highest drive current among Si-Si, Si-Ge, and Ge-Ge junction, and the drive current increases up to 1000 times compared to others. Minimum SS of Si-Si junction is reduced by up to 5 times more than others.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.04b
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• pp.95-95
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• 2009

Single-crystalline Bi nanowires have motivated many researchers to investigate novel quasi-one-dimensional phenomena such as the wire-boundary scattering effect and quantum confinement effects due to their electron effective mass (~0.001 me). Single crystalline Bi nanowires were found to grow on as-sputtered films after thermal annealing at $270^{\circ}C$. This was facilitated by relaxation of stress between the film and the thermally oxidized Si substrate that originated from a mismatch of the thermal expansion. However, the method is known to produce relatively lower density of nanowires than that of other nanowire growth methods for device applications. In order to increase density of nanowire, we propose a method for enhancing compressive stress which is a driving force for nanowire growth. In this work, we report that the compressive stress can be controlled by modifying a substrate structure. A combination of photolithography and a reactive ion etching technique was used to fabricate patterns on a Si substrate. It was found that the nanowire density of a Bi film grown on $100{\mu}m{\times}100{\mu}m$ pattern Si substrate increased over seven times higher than that of a Bi sample grown on a normal substrate. Our results show that density of nanowire can be enhanced by sidewall effect in optimized proper pattern sizes for the Bi nanowire growth.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.114-114
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• 2003

SiC is promising materials because of its typical properties. So, SiC nanowires and rods were fabricated using various methods. Among theses methods, CVD was a effective method to growth SiC nanowire on the Si for using optical and electrical devices. SiC nanowires were synthesized by CVD using single precursors on Si substrate. To growth SiC nanowire, various metal used to catalyst. Catalyst affects rnicrostructures and growth conditions. Electric and optical properties were varied with kind of catalyst. Difference of these characteristics was due to the reactivity of catalyst and stability of growth process

• The Transactions of The Korean Institute of Electrical Engineers
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• v.60 no.1
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• pp.105-108
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• 2011

Newly-developed fabrication of a p-n heterojunction diode constructed with a p-Si nanowire (NW) and an n-ZnO nanoparticle (NP) thin-film by the dielectrophoresis (DEP) technique is demonstrated in this study. With the bias of 20 Vp-p at the input frequency of 1 MHz, the most efficient assembly of the n-ZnO NPs is shown for the fabrication of the p-n heterojunction diode with a p-Si NW. The p-n heterojunction diode fabricated in this study represents current rectifying characteristics with the turn on voltage of 1.1 V. The diode can be applied to the fabrication of optoelectrical devices such as photodetectors, light-emitting diodes (LEDs), or solar cells based on the high conductivity of the NW and the high surface to volume ratio of the NP thin film.