• Title/Summary/Keyword: Semiconductor Testing

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A Study on the/ Correlation Between Board Level Drop Test Experiment and Simulation

  • Kang, Tae-Min;Lee, Dae-Woong;Hwang, You-Kyung;Chung, Qwan-Ho;Yoo, Byun-Kwang
    • Journal of the Microelectronics and Packaging Society
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    • v.18 no.2
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    • pp.35-41
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    • 2011
  • Recently, board level solder joint reliability performance of IC packages during drop impact becomes a great concern to semiconductor and electronic product manufacturers. The handheld electronic products are prone to being dropped during their useful service life because of their size and weight. The IC packages are susceptible to solder joint failures, induced by a combination of printed circuit board (PCB) bending and mechanical shock during impact. The board level drop testing is an effective method to characterize the solder joint reliability performance of miniature handheld products. In this paper, applying the JEDEC (JESD22-B111) standard present a finite element modeling of the FBGA. The simulation results revealed that maximum stress was located at the outermost solder ball in the PCB or IC package side, which consisted well with the location of crack initiation observed in the failure analysis after drop reliability tests.

Experimental Investigation of the Electrostatic Discharge(ESD) Damage in Packaged Semiconductor Devices (패키지 반도체소자의 ESD 손상에 대한 실험적 연구)

  • Kim, Sang-Ryull;Kim, Doo-Hyun;Kang, Dong-Kyu
    • Journal of the Korean Society of Safety
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    • v.17 no.4
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    • pp.94-100
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    • 2002
  • As the use of automatic handling equipment for sensitive semiconductor devices is rapidly increased, manufacturers of electronic components and equipments need to be more alert to the problem of electrostatic discharges(ESD). In order to analyze damage characteristics of semiconductor device damaged by ESD, this study adopts a new charged-device model(CDM), field-induced charged model(FCDM) simulator that is suitable for rapid, routine testing of semiconductor devices and provides a fast and inexpensive test that faithfully represents ESD hazards in plants. High voltage applied to the device under test is raised by the field of non-contacting electrodes in the FCDM simulator, which avoids premature device stressing and permits a faster test cycle. Discharge current and time are measured and calculated. The characteristics of electrostatic attenuation of domestic semiconductor devices are investigated to evaluate the ESD phenomena in the semiconductors. Also, the field charging mechanism, the device thresholds and failure modes are investigated and analyzed. The damaged devices obtained in the simulator are analyzed and evaluated by SEM. The results obtained in this paper can be used to prevent semiconductor devices form ESD hazards and be a foundation of research area and industry relevant to ESD phenomena.

A Study of Static Random Access Memory Single Event Effect (SRAM SEE) Test using 100 MeV Proton Accelerator (100 MeV 양성자가속기를 활용한 SRAM SEE(Static Random Access Memory Single Event Effect) 시험 연구)

  • Wooje Han;Eunhye Choi;Kyunghee Kim;Seong-Keun Jeong
    • Journal of Space Technology and Applications
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    • v.3 no.4
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    • pp.333-341
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    • 2023
  • This study aims to develop technology for testing and verifying the space radiation environment of miniature space components using the facilities of the domestic 100 MeV proton accelerator and the Space Component Test Facility at the Space Testing Center. As advancements in space development progress, high-performance satellites increasingly rely on densely integrated circuits, particularly in core components components like memory. The application of semiconductor components in essential devices such as solar panels, optical sensors, and opto-electronics is also on the rise. To apply these technologies in space, it is imperative to undergo space environment testing, with the most critical aspect being the evaluation and testing of space components in high-energy radiation environments. Therefore, the Space Testing Center at the Korea testing laboratory has developed a radiation testing device for memory components and conducted radiation impact assessment tests using it. The investigation was carried out using 100 MeV protons at a low flux level achievable at the Gyeongju Proton Accelerator. Through these tests, single event upsets observed in memory semiconductor components were confirmed.

Temperature Dependence of Resistivity in As Implanted LPCVD Polycrystalline Silicon Films (LPCVD로 제조된 다결정실리콘에 As를 주입한 시료의 비저항에 대한 온도의존성 연구)

  • Ha, Hyoung-Chan;Kim, Chung-Tae;Ko, Chul-Gi;Chun, Hui-Gon;Oh, Kye-Hwan
    • Korean Journal of Materials Research
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    • v.1 no.1
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    • pp.23-28
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    • 1991
  • The resistivity of polycrystalline silicon film deposited by low pressure chemical vapor deposition and doped by arsenic Implantation has been investigated as a function of dopant concentration and testing temperature ranging from $25^{\circ}C$ to $105^{\circ}C$ . The resistivity vs. doping concentration curve had a peak point with highest activation energy with respect to the dependence of the resistivity on temperature. We showed that $O_2$ plasma anneal followed by heat-treatment in $N_2$ ambient was able to recover the resistivity degraded by the plasma deposited passivation layers.

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Four Point Bending Test for Adhesion Testing of Packaging Strictures: A Review

  • Mahan, Kenny;Han, Bongtae
    • Journal of the Microelectronics and Packaging Society
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    • v.21 no.4
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    • pp.33-39
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    • 2014
  • To establish the reliability of a packaging structures, adhesion testing of key interfaces is a critical task. Due to the material mismatch, the interface may be prone to delamination failure due to conditions during the manufacturing of the product or just from the day-to-day use. To assess the reliability of the interface adhesion strength testing can be performed during the design phase of the product. One test method of interest is the four-point bending (4PB) adhesion strength test method. This test method has been implemented in a variety of situations to evaluate the adhesion strength of interfaces in bimaterial structures to the interfaces within thin film multilayer stacks. This article presents a review of the 4PB adhesion strength testing method and key implementations of the technique in regards to semiconductor packaging.

Quality and Productivity Improvement by Clustering Product Database Information in Semiconductor Testing Floor

  • Lim, Ik-Sung;Koo, Il-Sup;Kim, Tae-Sung
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.23 no.60
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    • pp.73-81
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    • 2000
  • The testing processes for VLSI finished devices are considerably complex because they require different types of ATE to be linked together. Due to the interaction effect between two or more linked ATEs, it is difficult to trace down the cause of the unexpected longer ATE setup time and random yields, which frequently occur in the VLSI circuit-testing laboratory. The goal of this paper is to develop and demonstrate the methodology designed to eliminate the possible interaction factors that might affect the random yields and/or unexpected longer setup time as well as increase the productivity. The statistical method such as design of experiment or multivariate analysis cannot be applied to the final testing floor here directly due to the environmental constraints. Expanded product data information (PDI) is constructed by combining product data information and ATE control information. An architecture utilizing expanded PDI is designed, which enables the engineer to conduct statistical approach investigation and reduce the setup time, as well as increase yield.

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Low Cost Endurance Test-pattern Generation for Multi-level Cell Flash Memory

  • Cha, Jaewon;Cho, Keewon;Yu, Seunggeon;Kang, Sungho
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.17 no.1
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    • pp.147-155
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    • 2017
  • A new endurance test-pattern generation on NAND-flash memory is proposed to improve test cost. We mainly focus on the correlation between the data-pattern and the device error-rate during endurance testing. The novelty is the development of testing method using quasi-random pattern based on device architectures in order to increase the test efficiency during time-consuming endurance testing. It has been proven by the experiments using the commercial 32 nm NAND flash-memory. Using the proposed method, the error-rate increases up to 18.6% compared to that of the conventional method which uses pseudo-random pattern. Endurance testing time using the proposed quasi-random pattern is faster than that of using the conventional pseudo-random pattern since it is possible to reach the target error rate quickly using the proposed one. Accordingly, the proposed method provides more low-cost testing solutions compared to the previous pseudo-random testing patterns.

Design and fabrication of the Built-in Testing Circuit for Improving IC Reliability (IC 신뢰성 향상을 위한 내장형 고장검출 회로의 설계 및 제작)

  • Ryu, Jang-Woo;Kim, Hoo-Sung;Yoon, Jee-Young;Hwang, Sang-Joon;Sung, Man-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.5
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    • pp.431-438
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    • 2005
  • In this paper, we propose the built-in current testing circuit for improving reliability As the integrated CMOS circuits in a chip are increased, the testability on design and fabrication should be considered to reduce the cost of testing and to guarantee the reliability In addition, the high degree of integration makes more failures which are different from conventional static failures and introduced by the short between transistor nodes and the bridging fault. The proposed built-in current testing method is useful for detecting not only these failures but also low current level failures and faster than conventional method. In normal mode, the detecting circuit is turned off to eliminate the degradation of CUT(Circuits Under Testing). The differential input stage in detecting circuit prevents the degradation of CUT in test mode. It is expected that this circuit improves the quality of semiconductor products, the reliability and the testability.

An Analysis of Damage Mechanism of Semiconductor Devices by ESD Using Field-induced Charged Device Model (유도대전소자모델(FCDM)을 이용한 ESD에 의한 반도체소자의 손상 메커니즘 해석)

  • 김두현;김상렬
    • Journal of the Korean Society of Safety
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    • v.16 no.2
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    • pp.57-62
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    • 2001
  • In order to analyze the mechanism of semiconductor device damages by ESD, this paper adopts a new charged-device model(CDM), field-induced charged nudel(FCDM), simulator that is suitable for rapid routine testing of semiconductor devices and provides a fast and inexpensive test that faithfully represents ESD hazards in plants. The high voltage applied to the device under test is raised by the fie]d of non-contacting electrodes in the FCDM simulator. which avoids premature device stressing and permits a faster test cycle. Discharge current md time are measured and calculated The FCDM simulator places the device at a huh voltage without transferring charge to it, by using a non-contacting electrode. The only charge transfer in the FCMD simulator happens during the discharge. This paper examine the field charging mechanism, measure device thresholds, and analyze failure modes. The FCDM simulator provides a Int and inexpensive test that faithfully represents factory ESD hazards. The damaged devices obtained in the simulator are analyzed and evaluated by SEM Also the results in this paper can be used for to prevent semiconductor devices from ESD hazards.

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