MICROSTRUCTURES AND ATOMIC BEHAVIORS OF SEVERAL METAL ELECTRODE SYSTEMS ON SiO_2$ /Si ANNEALED IN $O_2 AND N_2$ AMBIENTS : Pt(POLY-Si, TiN, AND Ti), Ru/POLY-Si, AND Ir/(POLY-Si AND TiN)
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- Proceedings of the Korean Vacuum Society Conference
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- 1997.02a
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- pp.38-38
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- 1997