Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 1997.02a
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- Pages.38-38
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- 1997
MICROSTRUCTURES AND ATOMIC BEHAVIORS OF SEVERAL METAL ELECTRODE SYSTEMS ON SiO_2$ /Si ANNEALED IN $O_2 AND N_2$ AMBIENTS : Pt(POLY-Si, TiN, AND Ti), Ru/POLY-Si, AND Ir/(POLY-Si AND TiN)
- Kim, Cha-Yeon (LG corporate Institute of Technology) ;
- Kwon, Hyun-Ja (LG corporate Institute of Technology) ;
- Kim, Hyun-Ha (LG corporate Institute of Technology) ;
- Lee, Jeong-Soo (LG corporate Institute of Technology) ;
- Jeon, Yoo-Chan (LG Semicon Co, Ltd.) ;
- Whang, Chung-Nam (Department of Physics, Yonsei University)
- Published : 1997.02.01
Abstract
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