• Journal of Digital Convergence
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• v.11 no.4
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• pp.259-266
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• 2013

Binary connected-components labeling, which is widely used in the field of the pattern recognition, has been researched for a long time as one of the basic image processing techniques. Two-scan algorithm has been mainly used in the researches of the connected-components labeling. Recently, for the first scan in the two-scan algorithm, block-based labeling approaches have been used and reported as the fastest methods. In this paper, a new efficient scan mask for connected-components labeling with a block-based labeling approach is proposed. Labeling with the new pixel-based scan mask is more efficient than any other existing method. The results of the experiments show that the proposed method is faster than the existing fastest method.

• Journal of the Korean Graphic Arts Communication Society
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• v.16 no.3
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• pp.81-95
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• 1998

If a image doesn't include sufficient data of output size and resolution, we will scan again the image. Interpolation generates a new pixel by methematical average of processing. In the interpolation method, there are nearest neighbor interpolation, bilinear interpolation and bicubic interpolation etc. This study was carried out for the purpose of researching compatible method to digital scan image caused by only different interpolation methods. Nearest neighbor interpolation show superior effect in the drawing image. Bilinear interpolation show reduction in detail and contrast. Bicubic interpolation show superior effect in the digital photo image USM(Unsharp Mask) application after extension by interpolation show better than extension by interpolation after USM(unsharp mask) application.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.130-133
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• 2003

Vertical Colour Selection (VCS) is an option for slim CRTs with increased sharpness and brightness. The direction of self-convergence of the DY is changed to vertical in order to obtain better spot uniformity, but the line scan direction remains horizontal. Hence, no video conversion is needed, contrary to transposed scan. In this paper we address two issues: First, there is a high risk of moire, since the scan lines and the phosphor stripes are parallel. We propose a feedback mechanism guiding the electron beams towards the middle of the mask slots. As positive side effects, the brightness is improved and the shadow mask can be made of a cheap type of steel. Secondly, VCS deflection coils have to satisfy different requirements than coils in ordinary CRTs. We discuss the design rules for self-convergent VCS coils and present simulation results.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.383-388
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• 2004

In this paper an alternative Active Matrix LCD technology is described with scalable, low cost processing. The Dual Select Diode AMLCD requires 60% lower capital investment in the array process than a-Si TFT arrays and results in 20% lower cost LCD modules. Development at several AMLCD manufacturers is in progress.

• 제어로봇시스템학회:학술대회논문집
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• 2001.10a
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• pp.140.2-140
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• 2001

In this paper, we develop the system which inspects the metal mask using area scan camera and belu type xy-table and introduce its inspection algorithm. Thes whole area of the metal mask is divides into several inspection block and the sixe of a inspection block is decided by FOV(Field of View). To compare with the camera image of each block, the reference image is made by gerber file. The ratation angle of the metal mask is calculated through the linear equation that is substituted two end points of horizontal boundary of a specific hole in a camera image for. To calculate the position error caused by belt type xy-table, hough-transform using the distances among the holes in two images os used. The center of the reference image is moved as much as the calculated position error to be coincide with the camera image ...

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.44 no.2
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• pp.127-138
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• 2007

In this paper, we propose a new X-masking scheme for utilizing logic built-in self-test The new scheme exploits the phase-shifting network which is based on the shift-and-add property of maximum length pseudorandom binary sequences(m-sequences). The phase-shifting network generates mask-patterns to multiple scan chains by appropriately shifting the m-sequence of an LFSR. The number of shifts required to generate each scan chain mask pattern can be dynamically reconfigured during a test session. An iterative simulation procedure to synthesize the phase-shifting network is proposed. Because the number of candidates for phase-shifting that can generate a scan chain mask pattern are very large, the proposed X-masking scheme reduce the hardware overhead efficiently. Experimental results demonstrate that the proposed X-masking technique requires less storage and hardware overhead with the conventional methods.

• Journal of the Institute of Electronics and Information Engineers
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• v.50 no.5
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• pp.287-294
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• 2013

Binary connected-component labeling is widely used in the fields of the image processing and the computer vision. Many kinds of labeling techniques have been developed, and two-scan is known as the fastest method among them. Traditionally pixel-based scan masks have been used for the first stage of the two-scan. Recently, block-based labeling techniques were introduced by C. Grana et. al. and L. He et. al. They are faster than pixel-based labeling methods. In this paper, we propose a new binary connected-component labeling technique with block-based labels and a pixel-based scan mask. The experimental results with various images show that the proposed method is faster than the He's which is known as the fastest method currently. The amount of performance enhancement is averagely from 3.9% to 22.4% according to the sort of the images.

• Journal of the Institute of Electronics Engineers of Korea SC
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• v.40 no.2
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• pp.1-9
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• 2003

We develop an experimental system to inspect a metal mask and, in this paper, introduce its inspection algorithm. This system is composed of an ASC(Area Scan Camera) and a belt type xy-table. The whole area of the metal mask is divided into several inspection blocks. The area of each block is equal to FOV(Field of View). For each block, the camera image is compared to the reference image. The reference image is made by gerber file. The rotation angle of the metal mask is calculated through the linear equation that is substituted two end points of horizontal boundary of a specific hole in a camera image. To calculate the position error caused by the belt type xy-table, HT(Hough-Transform) using distances among the holes in two images is used. The center of the reference image is moved as much as the calculated Position error to be coincided with the camera image. The information of holes in each image, such as centroid, size, width and height, are calculated through labeling. Whether a holes is mado correctly by laser machine or not, is judged by comparing the centroid and the size of hole in each image. Finally, we build the experimental system and apply this algorithm.

• Proceedings of KOSOMES biannual meeting
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• 2005.11a
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• pp.203-208
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• 2005

The CGO (Chip on Glass) to be measured a few micro unit is captured by line scan camera for the accuracy of chip inspection. But it is very sensitive to scan speed and lighting conditions. In this paper, we propose the methods to increase the accuracy of faulty detection by image subtraction. Image subtraction is detected faultiness by subtracting the image of a ' perfect ' COG from trot of the sample under tests. For image subtraction to be successful, the two images must be pre챠sely registered The two images is registered by the area segmentation pattern matching, and the result image get by operating the gradient mask image and the image to practice subtraction. A series of experimentation showed that the proposed algorithm shows substantial improvement over the other image subtraction methods.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.43 no.8 s.350
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• pp.1-5
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• 2006

At-wavelength inspection system of extreme Ultra-violet lithography was developed and the inspection results were compared with the optical mask inspection system by cross correlation experiments. In at-wavelength EUV mask inspection system, a raster scan of focused euv light is used to illuminate euv light to mask blank and specularly and non-specularly reflected euv light are detected by photo diode and microchannel plate. The cross correlation results between at-wavelength inspection tool and optical inspection tool shows strong correlation. Far-field scattering fringe pattern from programmed phase and opqque defect, which were detected by phosphor plate and CCD camera shows that distinct diffraction fringes were observed with fringe spacing dependent on the defect size.