• STI Policy Review
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• v.1 no.2
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• pp.19-31
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• 2010

This paper presents the policies Korea adopted to educate and train scientists/researchers and technicians/skilled workers. The Korean policies for the increase of human resources in science and technology that stimulated an upgrading of skills in industry and adapted to technical advancements are identified. An important factor is that the supply and demand mechanism created a virtuous circle so that the science and technology education and training policies were responsive to economic demands. In addition, policies to foster a human resource capacity have enhanced the contribution of human resources in science and technology for innovation and economic growth.

• STI Policy Review
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• v.1 no.2
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• pp.33-50
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• 2010

This study examines three factors - personal, academic features and governmental research environment - that influences the research of creative scientists based on a Systems Model of Creativity and tries to deprive policy implications. First, this study investigates the characteristics of creative scientists' research through a literature review. Next, it analyzes the features of academic characteristics, and creative research environments by the interviews of nine creative scientists in Korea. Lastly, it draws its implications and analyzes the limitations of this research.

• Proceedings of the Korea Technology Innovation Society Conference
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• 2010.11a
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• pp.203-212
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• 2010

Examining the relation between market structure and the value of innovation is important for competition and STI policy. If the value is large in a specific industry structure, government may lead the industry to take that form to enhance innovation. Our simple calibration in the case of linear demand and constant MC results in the conclusion that the incentive for R&D in the case of major and minor innovation in Cournot competition is less than that of merger and cooperative R&D. This emphasizes again "necessary evil" as a monopoly for innovation.

• Proceedings of the Materials Research Society of Korea Conference
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• 2006.11a
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• pp.15.1-15.1
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• 2006

• Proceedings of the Materials Research Society of Korea Conference
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• 2006.11a
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• pp.16.1-16.1
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• 2006

• Proceedings of the Materials Research Society of Korea Conference
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• 2006.05a
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• pp.17.2-17.2
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• 2006

• Journal of the Korea Society for Simulation
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• v.23 no.3
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• pp.27-32
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• 2014

In this paper, We are going to propose the novel structure with improved behavior than the conventional vertical structure for VLSI CMOS circuits. For this, the proposed structure is the moat shape for STI. We want to analysis the characteristics of simulations about the electron concentration distribution, oxide layer shape of hot electron stress, potential flux and electric field flux, electric field fo themal damage and current-voltage characteristics in devices. Physically based models are the ambient and stress bias conditions of TCAD tool. As a analysis results, shallow trench structure were trended to be electric functions of passive as device dimensions shrink. The electrical characteristics influence of proposed STI structures on the transistor applications become stronger the potential difference electric field and saturation threshold voltage, are decreased the stress effects of active region. The fabricated device of based on analysis results data were the almost same characteristics of simulation results data.

• The Bulletin of The Korean Astronomical Society
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• v.35 no.1
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• pp.53.1-53.1
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• 2010

$Y^2$(Yonsei-Yale) Isochrones은 Yale의 항성 진화 계산을 이용한 정밀한 등연령곡선으로 구상성단의 연구에 널리 사용되고 있다. 이번 연구에서는 $Y^2$-Isochrones를 Kurucz 모형을 이용한 색변환을 통해서 SDSS로 널리 알려진 ugriz 필터 체계에 대해 적용하고 실제 관측 결과와 비교함으로써 타당성을 검증하고자 한다. 우선 ugriz 필터의 등연령곡선을 제공하는 BaSTI와 DSEP, Padova 모델간의 비교를 통해 $Y^2$-Isochorones이 MSTO에서 g-r값이 다른 모델에 비해 0.05정도 큼을 확인하였다. 또한 CFHT 3.6m 망원경의 가시광 카메라 MegaCam으로부터 얻은 중원소 함량이 낮은 다섯 개의 구상성단 M15, M30, M53, NGC 5053, NGC 5466에 대한 g, r, i 필터의 색등급도에 각각의 등연령곡선을 적용하여 모델에 따른 구상성단의 특성을 분석하였다. $Y^2$-isochrones를 이용한 (g-r, r) CMD의 분석 결과, BaSTI와 DSEP 모델에 비해 0.1~0.3만큼 거리지수가 크고, 성단의 나이는 1~3Gyr 정도 어리게 측정됨을 확인할 수 있었다. 더불어 SDSS 관측으로부터 얻어진 구상성단에 대한 색등급도와 비교 분석과정을 수행하여, 다른 망원경에서의 사용가능 여부를 확인하였다. 이 연구를 통하여 각 모델에 따른 등연령곡선의 차이를 확인하고, 현재 여러 망원경에서 사용되고, 앞으로 여러 대형망원경에서 사용될 ugriz 필터 체계에 $Y^2$-Isochrones를 적용할 수 있는 타당성을 제시하고자 한다.

• Korean Journal of Materials Research
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• v.28 no.1
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• pp.6-11
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• 2018

There are various manufacturing processes for pure $SiO_2$ that is used as abrasives, chemicals, filters, and glasses, and in metallurgy and optical industries. In the optical fiber industry, to produce $SiO_2$ preform, $SiCl_4$ is utilized as a raw material. However, the combustion reaction of $SiCl_4$ has caused critical environmental issues, such as ozone deficiency by chlorine compounds, the greenhouse effect by carbon dioxide and corrosive gas such as hydrochloric acid. Thus, finding an alternative source that does not have those environmental issues is important for the future. Octamethylcyclotetrasiloxane (OMCTS or D4) as a chlorine free source is recently promising candidate for the $SiO_2$ preform formation. In this study, we first conducted a vaporizer design to vaporize the OMCTS. The vaporizer for the OMCTS vaporization was produced on the basis of the results of the vaporizer design. The size of the primary particle of the $SiO_2$ formed by OMCTS was less than 100 nm. X-ray diffraction patterns of the $SiO_2$ indicated an amorphous phase. Fourier-transform infrared spectroscopy analysis revealed the Si-O-Si bond without the -OH group.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11b
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• pp.185-188
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• 2001

Chemical mechanical polishing(CMP) process is widely used for global planarization of inter-metal dielectric (IMD) layer and inter-layer dielectric (ILD) for deep sub-micron technology. However, as the IMD and ILD layer gets thinner, defects such as micro-scratch lead to severe circuit failure, which affect yield. In this paper, for the improvement of CMP process, deionized water (DIW) pressure, purified $N_2 \; (PN_2)$ gas, slurry filter and high spray bar were installed. Our experimental results show that DIW pressure and $PN_2$ gas factors were not related with removal rate, but edge hot-spot of patterned wafer had a serious relation. Also, the filter installation in CMP polisher could reduce defects after CMP process, it is shown that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. However, the slurry filter is impossible to prevent defect-causing particles perfectly. Thus, we suggest that it is necessary to install the high spray bar of de-ionized water (DIW) with high pressure, to overcome the weak-point of slurry filter. Finally, we could expect the improvements of throughput, yield and stability in the ULSI fabrication process.