• 제목/요약/키워드: S-doping

검색결과 692건 처리시간 0.027초

Iron(III)-p-toluenesulfonate로 합성된 Poly(3,4-ethylenedioxythiophene)의 전하전달현상에 미치는 유기용매의 영향 (Solvent Effects on the Charge Transport Behavior in Poly(3,4-ethylenedioxythiophene) Synthesized with Iron (III) -p-toluenesulfonate)

  • 박창모;김태영;김원중;김윤상;서광석
    • 폴리머
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    • 제29권4호
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    • pp.363-367
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    • 2005
  • Iron(III)p-toluenesulfonate를 개시제로 한 3,4-ethylenedioxyaiophene(EDOT)의 중합과정시 여러 가지 유기용매를 첨가했을 때 poly(3,4-ethylenedioxythiophene)(PEDOT)의 전하이동특성이 어떻게 변하는지에 대해 연구하였다. 첨가한 유기용매의 종류는 MeOH, EtOH등의 알콜류와 Acetone, MEK등의 케톤류였으며, 직류 전기전도도 측정시 280 K에서 전도도는 MeOH를 첨가한 시료가 19.5 S/cm로 가장 높았으며, MEK를 첨가한 시료는 $2.2{\times}10^{-9}$S/cm로 각기 다른 전도도를 나타내었다. 유기용매 첨가에 따른 전기전도도의 변화를 설명하기 위해 X-ray diffraction(XRD)를 통한 PEDOT의 구조적 변화를 관찰하였으며, 알콜류를 첨가했을 경우 결정화도가 증가하는 반면, 케톤류의 유기용매를 첨가했을 경우에는 무정형 구조를 가지는 것을 관찰하였다. 또한 X-ray photoelectron spectoscopyocpy(XPS)를 이용하여 S(2p) 피크를 분석한 결과 케톤류를 첨가한 시료의 경우 다른 시료에 비해 도핑레벨이 매우 낮음을 관찰하였다. 이는 유기용매와 PEDOT의 상대이온인 p-toluenesulfonate와의 상호작용으로 인한 것으로 중합시 유기용매의 첨가에 따라 PEDOT의 도핑효율 및 구조가 변화하고 결과적으로 전기전도도가 변화하는 것을 확인하였다.

CVD로 in-situ 도핑된 다결정 3C-SiC 박막의 전기적 특성 (Electrical characteristics of in-situ doped polycrystalline 3C-SiC thin films grown by CVD)

  • 김강산;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.199-200
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    • 2009
  • This paper describes the electrical properties of polycrystalline (poly) 3C-SiC thin films with different nitrogen doping concentrations. The in-situ-doped poly 3C-SiC thin films were deposited by using atmospheric-pressure chemical vapor deposition (APCVD) at $1200^{\circ}C$ with hexamethyldisilane (HMDS: $Si_2$ $(CH_3)_6)$ as a single precursor and 0 ~ 100 sccm of $N_2$ as the dopant source gas. The peaks of the SiC (111) and the Si-C bonding were observed for the poly 3C-SiC thin films grown on $SiO_2/Si$ substrates by using X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FT-IR) analyses, respectively. The resistivity of the poly 3C-SiC thin films decreased from $8.35\;{\Omega}{\cdot}cm$ for $N_2$ of 0 sccm to $0.014\;{\Omega}{\cdot}cm$ with $N_2$ of 100 sccm. The carrier concentration of the poly 3C-SiC films increased with doping from $3.0819\;{\times}\;10^{17}$ to $2.2994\;{\times}\;10^{19}\;cm^{-3}$, and their electronic mobilities increased from 2.433 to $29.299\;cm^2/V{\cdot}S$.

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유기태양전지와 유기발광다이오드에 적용 In-Mo-O 투명 전극의 특성 연구

  • 신용희;나석인;김장주;김한기
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.535-536
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    • 2013
  • 본 연구에서는 DC/RF co-sputtering공법을 통해 제작한 In-Mo-O 투명 Mo doping 농도 및 열처리 온도에 따른 전기적, 광학적, 구조적 특성을 분석하고, 최적화된 In-Mo-O 투명전극을 유기태양전지(OPVs)와 유기발광다이오드(OLED)에 적용하여 그 가능성을 평가하였다. Mo doping 농도는 co-sputtering 공정 중 MoO3에 인가되는 radio-frequency (RF) power를 변화시켜 조절되었으며, 투명전극의 광학적 특성 및 전기적 특성 향상을 위해 성막 공정 후 급속 열처리 공정을 온도 별로 진행하였다. In-Mo-O 투명 전극은 Mo 도핑 농도에 영향을 받음을 확인할 수 있었고, 최적화된 Mo doping 파워에서 성막한 In-Mo-O 박막은 급속 열처리 공정 후 면저항 24.57 Ohm/square, 투과도 81.57% (400~1,200 nm wavelength)를 나타내었다. Bulk hetero-junction 기반의 고효율 유기태양전지와 유기발광다이오드 적용하기 위해 본 연구에서 제작된 IMO 투명전극의 구조적 특성, 결정성 및 표면특성은 x-ray diffraction (XRD), atomic force microscopy(AFM), field effect scanning electron microscopy (FE-SEM), High-resolution transmission electron microscopy (HRTEM) 분석을 통해 진행하였다. In-Mo-O 투명 전극상에 제작된 OLEDs와 OPV는 reference ITO 전극에 제작된 OLEDs/OPV와 비교할 때 유사하거나 향상된 특성을 나타내었으며 이는 In-Mo-O 박막이 OLED/OPV용 투명 전극으로 적용이 가능함을 말해준다.

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Short Channel Analytical Model for High Electron Mobility Transistor to Obtain Higher Cut-Off Frequency Maintaining the Reliability of the Device

  • Gupta, Ritesh;Aggarwal, Sandeep Kumar;Gupta, Mridula;Gupta, R.S.
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제7권2호
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    • pp.120-131
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    • 2007
  • A comprehensive short channel analytical model has been proposed for High Electron Mobility Transistor (HEMT) to obtain higher cut-off frequency maintaining the reliability of the device. The model has been proposed to consider generalized doping variation in the directions perpendicular to and along the channel. The effect of field plates and different gate-insulator geometry (T-gate, etc) have been considered by dividing the area between gate and the high band gap semiconductor into different regions along the channel having different insulator and metal combinations of different thicknesses and work function with the possibility that metal is in direct contact with the high band gap semiconductor. The variation obtained by gate-insulator geometry and field plates in the field and channel potential can be produced by varying doping concentration, metal work-function and gate-stack structures along the channel. The results so obtained for normal device structure have been compared with previous proposed model and numerical method (finite difference method) to prove the validity of the model.

Analytical Characterization of a Dual-Material Double-Gate Fully-Depleted SOI MOSFET with Pearson-IV type Doping Distribution

  • Kushwaha, Alok;Pandey, Manoj K.;Pandey, Sujata;Gupta, Anil K.
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제7권2호
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    • pp.110-119
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    • 2007
  • A new two-dimensional analytical model for dual-material double-gate fully-depleted SOI MOSFET with Pearson-IV type Doping Distribution is presented. An investigation of electrical MOSFET parameters i.e. drain current, transconductance, channel resistance and device capacitance in DM DG FD SOI MOSFET is carried out with Pearson-IV type doping distribution as it is essential to establish proper profiles to get the optimum performance of the device. These parameters are categorically derived keeping view of potential at the center (${\phi}_c$) of the double gate SOI MOSFET as it is more sensitive than the potential at the surface (${\phi}_s$). The proposed structure is such that the work function of the gate material (both sides) near the source is higher than the one near the drain. This work demonstrates the benefits of high performance proposed structure over their single material gate counterparts. The results predicted by the model are compared with those obtained by 2D device simulator ATLAS to verify the accuracy of the proposed model.

스핀 도핑을 이용한 단결정 실리콘 태양전지 확산 공정 최적화 (Optimizing of Diffusion Condition in Spin on Doping for c-Si Solar Cell)

  • 여인환;박주억;김준희;조해성;임동건
    • 한국전기전자재료학회논문지
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    • 제26권5호
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    • pp.410-414
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    • 2013
  • Rapid thermal processing (RTP) abruptly decreases the time required to perform solar cell processes. RTP were used to form emitter of crystalline silicon solar cells. The emitter sheet resistance is studied as a function of time and temperature. The objective of this study is reduction of doping process time with same performance. Emitter difRapid thermal dfusion was carried out by using a spin on doping and a RTP. iffusion was performed in the temperature range of $700{\sim}750^{\circ}C$ for 1m 30s~15 m. Thermal budgets yielded a $50{\Omega}/sq$ emitter using a P509 source. To reduce process time and get high efficiency, rapid thermal diffusion by IR lamp was employed in air atmosphere at $700^{\circ}C$ for 15 m.

채널도핑강도에 대한 이중게이트 MOSFET의 DIBL분석 (Analysis of Drain Induced Barrier Lowering for Double Gate MOSFET According to Channel Doping Concentration)

  • 정학기
    • 한국정보통신학회논문지
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    • 제16권3호
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    • pp.579-584
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    • 2012
  • 본 연구에서는 이중게이트(Double Gate; DG) MOSFET에서 발생하는 단채널효과 중 하나인 드레인유기장벽 감소(Drain Induced Barrier Lowering; DIBL)에 대하여 분석하고자 한다. 드레인유도장벽감소 현상은 채널의 길이가 짧아질 때 드레인 전압이 소스측 전위장벽에 영향을 미쳐 장벽의 높이를 감소시키는 현상으로써 단채널에서 발생하는 매우 중요한 효과이다. 본 연구에서는 DIBL을 해석하기 위하여 이미 발표된 논문에서 타당성이 입증된 포아송 방정식의 해석학적 전위분포를 이용할 것이다. 이 모델은 특히 전하분포함수에 대하여 가우시안 함수를 사용함으로써 보다 실험값에 가깝게 해석하였으며 소자 파라미터인 채널두께, 산화막두께, 도핑농도 등에 대하여 드레인유도장벽감소의 변화를 관찰하고자 한다.

Achieving Robust N-type Nitrogen-doped Graphene Via a Binary-doping Approach

  • Kim, Hyo Seok;Kim, Han Seul;Kim, Seong Sik;Kim, Yong Hoon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.192.2-192.2
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    • 2014
  • Among various dopant candidates, nitrogen (N) atoms are considered as the most effective dopants to improve the diverse properties of graphene. Unfortunately, recent experimental and theoretical studies have revealed that different N-doped graphene (NGR) conformations can result in both p- and n-type characters depending on the bonding nature of N atoms (substitutional, pyridinic, pyrrolic, and nitrilic). To overcome this obstacle in achieving reliable graphene doping, we have carried out density functional theory calculations and explored the feasibility of converting p-type NGRs into n-type by introducing additional dopant candidates atoms (B, C, O, F, Al, Si, P, S, and Cl). Evaluating the relative formation energies of various binary-doped NGRs and the change in their electronic structure, we conclude that B and P atoms are promising candidates to achieve robust n-type NGRs. The origin of such p- to n-type change is analyzed based on the crystal orbital Hamiltonian population analysis. Implications of our findings in the context of electronic and energy device applications will be also discussed.

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The Study of Mutation Spectrum in Iac / Gene of Transgenic Big Blue$\textregistered$ Cell Line Following Short-Term Exposure to 4-Nitroquinoline N-oxide

  • Youn, Ji-Youn;Kim, Kyung-Ran;Cho, Kyung-Hea;Ryu, Jae-Chun
    • 한국환경독성학회:학술대회논문집
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    • 한국환경독성학회 1996년도 제19회정기학술대회(The 19th Symposium of the Korean Society of Environmental Toxicology)
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    • pp.64-64
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    • 1996
  • Transgenic animal and cell line models which are recently developed in toxicology field combined with molecular biological technique, are powerful tools for studying of mutation in vivo and in vitro, respectively. The Big Blue mutagenesis assay system is one of the most widely used transgenic systems. Especially, for the study of direct acting mutagens, Big Blue cell line is very useful and powerful to evaluate mutagenicity because the mutation frequency and mutationspectrlun showed no distinct differences between cell line and animal. The Big Blue cell lines carry stably integrated copies of lambda shuttle vector containing lac I gene as a mutational target. These lambda shuttle vectors are useful for various mutagenesis related studies in eukaryotic system due to their ability to be exposed mutagen and then transfer a suitable target DNA sequence to it convenient organism for analysis. We tried to assess the mutagenic effect of 4-NQO with Big Blue cell line. After the treatment of 4-NQO, genomic DNA was isolated and lambda shuttle vector was packaged by in Vitro packaging and then these were plated on bacterial host in the presence of X-gal to screen mutation in the lac I. We determined MF as a ratio of blue plaques versus colorless plaques and now undergoing the mutation spectrum of 4-NQO in lac J gene sequence.

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In-situ 도핑된 M/NEMS용 다결정 3C-SiC 박막의 특성 (Characteristics of in-situ doped polycrystalline 3C-SiCthin films for M/NEMS applications)

  • 김강산;정귀상
    • 센서학회지
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    • 제17권5호
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    • pp.325-328
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    • 2008
  • This paper describes the electrical properties of poly (polycrystalline) 3C-SiC thin films with different nitrogen doping concentrations. In-situ doped poly 3C-SiC thin films were deposited by APCVD at $1200^{\circ}C$ using HMDS (hexamethyildisilane: $Si_2(CH_3)_6)$) as Si and C precursor, and $0{\sim}100$ sccm $N_2$ as the dopant source gas. The peak of SiC is appeared in poly 3C-SiC thin films grown on $SiO_2/Si$ substrates in XRD(X-ray diffraction) and FT-IR(Fourier transform infrared spectroscopy) analyses. The resistivity of poly 3C-SiC thin films decreased from $8.35{\Omega}{\cdot}cm$ with $N_2$ of 0 sccm to $0.014{\Omega}{\cdot}cm$ with 100 sccm. The carrier concentration of poly 3C-SiC films increased with doping from $3.0819{\times}10^{17}$ to $2.2994{\times}10^{19}cm^{-3}$ and their electronic mobilities increased from 2.433 to $29.299cm^2/V{\cdot}S$, respectively.