• Title/Summary/Keyword: Reverse read scheme

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Programming Characteristics of the multi-bit devices based on SONOS structure (SONOS 구조를 갖는 멀티 비트 소자의 프로그래밍 특성)

  • An, Ho-Myoung;Kim, Joo-Yeon;Seo, Kwang-Yell
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.80-83
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    • 2003
  • In this paper, the programming characteristics of the multi-bit devices based on SONOS structure are investigated. Our devices have been fabricated by $0.35\;{\mu}m$ complementary metal-oxide-semiconductor (CMOS) process with LOCOS isolation. In order to achieve the two-bits per cell operation, charges must be locally trapped in the nitride layer above the channel near the junction. Channel hot electron (CHE) injection for programming can operate in multi-bit using localized trap in nitride film. CHE injection in our devices is achieved with the single power supply of 5 V. To demonstrate CHE injection, substrate current (Isub) and one-shot programming curve were investigated. The multi-bit operation which stores two-bit per cell is investigated with a reverse read scheme. Also, hot hole injection for fast erasing is used. Due to the ultra-thin gate dielectrics, our results show many advantages which are simpler process, better scalability and lower programming voltage compared to any other two-bit storage flash memory. This fabricated structure and programming characteristics are shown to be the most promising for the multi-bit flash memory.

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Leakage-Suppressed SRAM with Dynamic Power Saving Scheme for Future Sub-70-nm CMOS Technology (70-nm 이하 급 초미세 CMOS 공정에서의 누설 전류 및 동적 전류 소비 억제 내장형 SRAM 설계)

  • CHOI Hun-Dae;CHOI Hyun Young;KIM Dong Myeong;KIM Daejeong;MIN Kyeung-Sik
    • Proceedings of the IEEK Conference
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    • 2004.06b
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    • pp.343-346
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    • 2004
  • This paper proposes a leakage-suppressed SRAM with dynamic power saying scheme for the future leakage-dominant sub-70-nm technology. By dynamically controlling the common source-line voltage ($V_{SL}$) of sleep cells, the sub-threshold leakage through these sleep cells can be reduced to be 1/10-1/100 due to the reverse body-bias effect, dram-induced barrier lowering (DIBL) and negative $V_{GS}$ effects. Moreover, the bit-ling leakage which mar introduce a fault during the read operation can be completely eliminated in this new SRAM. The dynamic $V_{SL}$ control can also reduce the bit-line swing during the write so that the dynamic power in write can be reduced. This new SRAM was fabricated in 0.35-${\mu}m$ CMOS process and more than $30\%$ of dynamic power saying is experimentally verified in the measurement. The leakage suppression scheme is expected to be able to reduce more than $90\%$ of total SRAM power in the future leakage-dominant 70-nm process.

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Programming Characteristics of the Multi-bit Devices Based on SONOS Structure (SONOS 구조를 갖는 멀티 비트 소자의 프로그래밍 특성)

  • 김주연
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.9
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    • pp.771-774
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    • 2003
  • In this paper, the programming characteristics of the multi-bit devices based on SONOS structure are investigated. Our devices have been fabricated by 0.35 $\mu\textrm{m}$ complementary metal-oxide-semiconductor (CMOS) process with LOCOS isolation. In order to achieve the multi-bit operation per cell, charges must be locally frapped in the nitride layer above the channel near the source-drain junction. Programming method is selected by Channel Hot Electron (CUE) injection which is available for localized trap in nitride film. To demonstrate CHE injection, substrate current (Isub) and one-shot programming curve are investigated. The multi-bit operation which stores two-bit per cell is investigated. Also, Hot Hole(HH) injection for fast erasing is used. The fabricated SONOS devices have ultra-thinner gate dielectrics and then have lower programming voltage, simpler process and better scalability compared to any other multi-bit storage Flash memory. Our programming characteristics are shown to be the most promising for the multi-bit flash memory.

Extracting Scheme of Compiler Information using Convolutional Neural Networks in Stripped Binaries (스트립 바이너리에서 합성곱 신경망을 이용한 컴파일러 정보 추출 기법)

  • Lee, Jungsoo;Choi, Hyunwoong;Heo, Junyeong
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.21 no.4
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    • pp.25-29
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    • 2021
  • The strip binary is a binary from which debug symbol information has been deleted, and therefore it is difficult to analyze the binary through techniques such as reverse engineering. Traditional binary analysis tools rely on debug symbolic information to analyze binaries, making it difficult to detect or analyze malicious code with features of these strip binaries. In order to solve this problem, the need for a technology capable of effectively extracting the information of the strip binary has emerged. In this paper, focusing on the fact that the byte code of the binary file is generated very differently depending on compiler version, optimazer level, etc. For effective compiler version extraction, the entire byte code is read and imaged as the target of the stripped binaries and this is applied to the convolution neural network. Finally, we achieve an accuracy of 93.5%, and we provide an opportunity to analyze stripped binary more effectively than before.

Switching and Leakage-Power Suppressed SRAM for Leakage-Dominant Deep-Submicron CMOS Technologies (초미세 CMOS 공정에서의 스위칭 및 누설전력 억제 SRAM 설계)

  • Choi Hoon-Dae;Min Kyeong-Sik
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.43 no.3 s.345
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    • pp.21-32
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    • 2006
  • A new SRAM circuit with row-by-row activation and low-swing write schemes is proposed to reduce switching power of active cells as well as leakage one of sleep cells in this paper. By driving source line of sleep cells by $V_{SSH}$ which is higher than $V_{SS}$, the leakage current can be reduced to 1/100 due to the cooperation of the reverse body-bias. Drain Induced Barrier Lowering (DIBL), and negative $V_{GS}$ effects. Moreover, the bit line leakage which may introduce a fault during the read operation can be eliminated in this new SRAM. Swing voltage on highly capacitive bit lines is reduced to $V_{DD}-to-V_{SSH}$ from the conventional $V_{DD}-to-V_{SS}$ during the write operation, greatly saving the bit line switching power. Combining the row-by-row activation scheme with the low-swing write does not require the additional area penalty. By the SPICE simulation with the Berkeley Predictive Technology Modes, 93% of leakage power and 43% of switching one are estimated to be saved in future leakage-dominant 70-un process. A test chip has been fabricated using $0.35-{\mu}m$ CMOS process to verify the effectiveness and feasibility of the new SRAM, where the switching power is measured to be 30% less than the conventional SRAM when the I/O bit width is only 8. The stored data is confirmed to be retained without loss until the retention voltage is reduced to 1.1V which is mainly due to the metal shield. The switching power will be expected to be more significant with increasing the I/O bit width.