• BMB Reports
• /
• v.46 no.8
• /
• pp.391-397
• /
• 2013

The ATP-inhibited Plant Mitochondrial $K^+$ Channel ($PmitoK_{ATP}$) was discovered about fifteen years ago in Durum Wheat Mitochondria (DWM). $PmitoK_{ATP}$ catalyses the electrophoretic $K^+$ uniport through the inner mitochondrial membrane; moreover, the co-operation between $PmitoK_{ATP}$ and $K^+/H^+$ antiporter allows such a great operation of a $K^+$ cycle to collapse mitochondrial membrane potential (${\Delta}{\Psi}$) and ${\Delta}pH$, thus impairing protonmotive force (${\Delta}p$). A possible physiological role of such ${\Delta}{\Psi}$ control is the restriction of harmful reactive oxygen species (ROS) production under environmental/oxidative stress conditions. Interestingly, DWM lacking ${\Delta}p$ were found to be nevertheless fully coupled and able to regularly accomplish ATP synthesis; this unexpected behaviour makes necessary to recast in some way the classical chemiosmotic model. In the whole, $PmitoK_{ATP}$ may oppose to large scale ROS production by lowering ${\Delta}{\Psi}$ under environmental/oxidative stress, but, when stress is moderate, this occurs without impairing ATP synthesis in a crucial moment for cell and mitochondrial bioenergetics.

• Tribology and Lubricants
• /
• v.30 no.2
• /
• pp.116-123
• /
• 2014

The objective of this study is to model and simulate the nonlinear lubrication performance of the sliding part between the piston and cylinder wall in a hydrostatic swash-plate-type axial piston pump. A numerical algorithm is developed that facilitates simultaneous calculation of the rotating body motion and fluid film pressure to observe the fluid film geometry and power loss. It is assumed that solid asperity contact, so-called mixed lubrication in this study, invariably occurs in the swash-plate-type axial piston pump, which produces a higher lateral moment on the pistons than other types of hydrostatic machines. Two comparative mixed lubrication models, rigid and elastic, are used to determine the reaction force and sliding friction. The rigid model does not allow any elastic deformation in the partial lubrication area. The patch shapes, reactive forces, and virtual local elastic deformation in the partial lubrication area are obtained in the elastic contact model using a simple Hertz contact theory. The calculation results show that a higher reaction force and friction loss are obtained in the rigid model, indicating that solid deformation is a significant factor on the lubrication characteristics of the reciprocating piston part.

• Applied Chemistry for Engineering
• /
• v.30 no.5
• /
• pp.597-605
• /
• 2019

In order to improve the adhesion of water-based adhesive, gemini type nonionic reactive surfactants were synthesized and applied to water-based adhesives. The surfactants were synthesized by using maleic acid and polyoxyethylene cetyl ether having different length of ethylene oxide and confirmed by FT-IR and $^1H-NMR$. Their appearance was light yellow wax. The cloud point of the compound was more than $78^{\circ}C$. The measured critical micelle concentration (c.m.c) was $1.0{\times}10^{-4}{\sim}7.0{\times}10^{-4}mol/L$ and surface tension at c.m.c was 25.9~32.0 mN/m. As the number of ethylene oxide increased, the emulsifying power was improved. The foaming height of each compound by Ross-Miles method was 1.4~4.5 cm. The synthesized surfactants was then used as an emulsifier in emulsion polymerization of water-based adhesives and its physical properties were evaluated. The solid contents of prepared adhesives was 59%. The average particle size and initial tackiness of the prepared adhesives were 164~297 nm and ball no. of 20~32, respectively. The peel strength was $1.8{\sim}2.1kg_f/mm$. The retention rate of adhesives viscosity was evaluated to 99% during 30 days. Therefore, synthesized gemini type nonionic reactive surfactants are expected to be applied as an emulsifier for the high adhesive force.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.08a
• /
• pp.369-369
• /
• 2012

The present work deals with selective deposition of copper on fluoropolymers patterned silicon (111) surfaces. The pattern of fluoropolymer was fabricated by nanoimprint lithography (NIL) and plasma reactive ion etching (RIE) was used to remove the residuals layers. Copper was electrochemically deposited in bare Si regions which were not covered with fluoropolymers. The patterns of fluoropolymers and copper have been investigated by scanning electron microscopy (SEM). In this work, we used two deposition methods. One is galvanic displacement method and another is electrodeposition. Selective deposition works in both cases and it shows applicability to other materials. By optimization of the deposition conditions can be achieved therefore this process represents a simple approach for a direct high resolution patterning of silicon surfaces.

• Bulletin of the Korean Chemical Society
• /
• v.31 no.2
• /
• pp.397-400
• /
• 2010

Zirconium oxide thin films deposited on the p-type Si(100) substrates by radio-frequency (RF) reactive magnetron sputtering with different plasma gas ratios have been studied by using spectroscopic ellipsometry (SE), atomic force microscopy (AFM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The deposition of the films was monitored by the oxygen gas ratio which has been increased from 0 to 80%. We found that the thickness and roughness of the zirconium oxide thin films are relatively constant. The XRD revealed that the deposited thin films have polycrystalline phases, Zr(101) and monoclinic $ZrO_2$ ($\bar{1}31$). The XPS result showed that the oxidation states of zirconium suboxides were changed to zirconia form with increasing $O_2$ gas ratio.

• Journal of the Semiconductor & Display Technology
• /
• v.12 no.1
• /
• pp.53-59
• /
• 2013

Chip mounter which is used to pick chips from the pre-specified position and place them on the target location of PCB is an essential device in semiconductor and LCD industries. Quick and high precision positioning is the key technology needed to increase productivity of chip mounters. As increasing acceleration and deceleration of placing motion, structural vibration induced from inertial reactive force and flexibility of mounter structure becomes a serious problem degrading positioning accuracy. Motivated from these, this paper proposed a new control design algorithm which combines a mounter structure acceleration feedforward compensation and an extended sliding mode control for fine positioning and suppression of structural vibration, simultaneously. The feasibility of the proposed control design was verified along with some simulation results.

• Proceedings of the KIEE Conference
• /
• 1999.07c
• /
• pp.1496-1498
• /
• 1999

The line charging is becoming larger due to the expansion of underground cable and extra high voltage lines. It causes reactive power surplus at light load condition which may force generators to operate reluctantly in the under excited mode. This paper proposes the pratical criteria and methodolgy for the shunt reactor planning while suppressing generator's under excited operation.

• Journal of the Korean Chemical Society
• /
• v.58 no.6
• /
• pp.524-527
• /
• 2014

We report a simple yet efficient method to assemble large-scale aligned graphene nanoribbons (GNRs) with a width as small as 30 nm. The $V_2O_5$ nanowires (NWs) were aligned on a graphene surface via spraying a solution of the $V_2O_5$ NWs, and the graphene was selectively etched by the reactive ion etching method using the $V_2O_5$ NWs as a shadow mask. This process allowed us to prepare large scale patterns of the aligned GNRs on a $SiO_2$ substrate. The orientation of the aligned and randomly oriented GNRs was compared by the atomic force microscope (AFM) images. We achieved the highly aligned GNRs along the flow direction of the $V_2O_5$ NWs solution. Furthermore, we successfully fabricated a field effect-transistor with the aligned GNRs and measured its electrical properties. Since our method enable to prepare the aligned GNRs over a large area, it should open up new way for the various applications.

• Journal of Sensor Science and Technology
• /
• v.16 no.4
• /
• pp.301-306
• /
• 2007

AlN thin film for SAW filter application was deposited on (100) silicon wafers by reactive magnetron sputtering method. The structural characteristics were dependent on the deposition conditions such as sputtering pressure, RF power, substrate temperature, and nitrogen partial pressure. Scanning Electron Microscope (SEM), X-ray Diffraction (XRD), Electron Probe MicroAnalyzer (EPMA) and Atomic Force Microscope (AFM) have been used to find out structural properties and preferred orientation of AlN thin films. Insertion loss of SAW devices was 28.51 dB and out of band rejection was about 24 dB.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.459-459
• /
• 2011

Graphene has many fascinating material properties such as high electron mobility, high optical transparency, excellent thermal conductivity, superior Young's modulus, etc. Several studies have recently found that single-layer graphene is chemically more reactive than few-layer graphene when supported on silicon dioxide substrates with sub-nm roughness. In this study, we have investigated the influence of substrates on chemical reactivity of graphene. Morphology and thermal oxidation behavior of graphene on atomically flat mica substrates were studied by atomic force microscopy (AFM) and Raman spectroscopy compared to graphene on SiO2/Si substrates. Notably, oxidation of single-layer graphene proceeds more slowly on mica than SiO2/Si. Detailed analysis led to a conclusion that deformation along the out-of-plane direction enhances reactivity of graphene.