1 |
S. Uchiyama, Y. Ishigami, M. Ohta, M. Niigaki, H. Kan, Y. Nakanishi, and T. Yamaguchi, 'Growth of AIN films by magnetron sputtering', Journal of Crystal Growth 189/190, pp. 448-451, 1998
DOI
ScienceOn
|
2 |
W. Y. Chiu, C. H. Wu, H. L. Kao, and S. Jeng, 'The optical properties and applications of AIN thin films prepared by a helicon sputtering system', J Vac. Sci. Technol. A, vol. 20, no. 3, pp. 843-847, 2002
DOI
ScienceOn
|
3 |
H. M. Liaw, W. Cronin, and F. S. Hickernell, 'The SAW characteristics of sputtered aluminum nitride on silicon', IEEE Ultrasonics symposium, pp. 267271, 1993
|
4 |
H. Okano, N. Tanaka, K. Shibata, and S. Nakano, 'Preparation of aluminwn nitride thin films by reactive sputtering and their applications to GHz-band surface acoustic wave devices', Appl. Phys. Lett., vol. 64, no. 2, pp. 166-168, 1994
DOI
ScienceOn
|
5 |
서주원, 이원종, '반응성 RF 마그네트론 스퍼터링법 으로 증착한 AIN박막의 우선배향성 및 표변 탄성파 특성에 관한 연구', 한국재료학회지, 제7권, 제6호, pp. 510-516, 1997
|
6 |
김광택, 이규효, 'TPMS 적용을 위한 가변 정전 용량형 압력센서 개발', 센서학회지, 제14권, 제4호, pp. 286-290, 2005
|
7 |
권성열, '고주파 마그네트론 스퍼터링 방법으로 제작한 ITO 박막의 표면형태 및 전기적 특성', 센서학회지, 제15권, 제1호, pp. 71-75, 2006
과학기술학회마을
DOI
|
8 |
박상현, 강주현, 유광수, 'RF Magnetron Sputtering 법을 이용한 SnO 박막 센서의 제조 및 알콜 감도 특성', 제14권, 제2호, pp. 63-68, 2005
|
9 |
J. A. Thornton, in Thin 1997, pp.1031-1037. Film Processes, eds. J. L. Vossen and W. Kern, Academic Press, New York, 1978
|
10 |
X. H. Xu, H. S. Wu, C. J. Zhang, and Z. H. Jin, 'Morphological properties of AlN piezoelectric thin films deposited by DC reactive magnetron sputtering', Thin Solid films 388, pp. 62-67, 2001
DOI
ScienceOn
|
11 |
O. J. Gregory, A. B. Slot, P. S. Amons, and E. E. crisman, 'High temperature strain gages based on reactively sputtered AlN, thin films', Surface and Coatings Technology 88, pp. 79-89, 1996
|
12 |
A. Pohl, 'Wirelessly interrogable surface transcations on instrumentation and application' IEEE acoustic wave sensors for vehicular measurement', vol. 46, no. 4
|
13 |
C. C. Cheng, Y. C. Chen, H. J. Wang, and W. R. Chen, 'Morphology and structure of aluminum nitride thin films on glass substrate', Jpn. J Appl. Phys., vol.35, pt. 1, no. 3, pp. 1880-1885, 1996
DOI
|