• Title/Summary/Keyword: RF integrated circuits

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Preparation of Zr0.7Sn0.3TiO4 Thin Films by Metal Organic Decomposition and Their Dielectric Properties (금속유기분해법을 사용한 Zr0.7Sn0.3TiO4 박막 제조 및 유전특성)

  • Sun, Ho-Jung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.4
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    • pp.311-316
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    • 2010
  • $Zr_{0.7}Sn_{0.3}TiO_4$ (ZST) thin films were fabricated by metal-organic decomposition, and their dielectric properties were investigated in order to evaluate their potential use in passive capacitors for rf and analog/mixed signal integrated circuits. The ZST thin film annealed at the temperature of $800^{\circ}C$ showed a dielectric constant of 27.3 and a dielectric loss of 0.011. The capacitor using the ZST film had quadratic and linear voltage coefficient of capacitance (VCC) of -65 ppm/$V^2$ and -35 ppm/V at 100 kHz, respectively. It also exhibited a good temperature coefficient of capacitance (TCC) value of -32 ppm/$^{\circ}C$ at 100 kHz.

Wideband Low-Reflection Transmission Lines for Bare Chip on Multilayer PCB

  • Ramzan, Rashad;Fritzin, Jonas;Dabrowski, Jerzy;Svensson, Christer
    • ETRI Journal
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    • v.33 no.3
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    • pp.335-343
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    • 2011
  • The pad pitch of modern radio frequency integrated circuits is in the order of few tens of micrometers. Connecting a large number of high-speed I/Os to the outside world with good signal fidelity at low cost is an extremely challenging task. To cope with this requirement, we need reflection-free transmission lines from an on-chip pad to on-board SMA connectors. Such a transmission line is very hard to design due to the difference in on-chip and on-board feature size and the requirement for extremely large bandwidth. In this paper, we propose the use of narrow tracks close to chip and wide tracks away from the chip. This narrow-to-wide transition in width results in impedance discontinuity. A step change in substrate thickness is utilized to cancel the effect of the width discontinuity, thus achieving a reflection-free microstrip. To verify the concept, several microstrips were designed on multilayer FR4 PCB without any additional manufacturing steps. The TDR measurements reveal that the impedance variation is less than 3 ${\Omega}$ for a 50 ${\Omega}$ microstrip and S11 better than -9 dB for the frequency range 1 GHz to 6 GHz when the width changes from 165 ${\mu}m$ to 940 ${\mu}m$, and substrate thickness changes from 100 ${\mu}m$ to 500 ${\mu}m$.

Design of a Wide-Band, Low-Noise CMOS VCO for DTV Tuner Applications (DTV 튜너 응용을 위한 광대역 저잡음 CMOS VCO 설계)

  • Kim, Y.J.;Yu, J.B.;Ko, S.O.;Kim, K.H.;Yu, C.G.
    • Proceedings of the KIEE Conference
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    • 2007.10a
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    • pp.195-196
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    • 2007
  • Since the digital TV signal band is very wide ($54{\sim}806MHz$), the VCO used in the frequency synthesizer must also have a wide frequency tuning range. Multiple LC VCOs have been used to cover such wide frequency band. However, the chip area increases due to the increased number of integrated inductors. In this paper, a scheme is proposed to cover the full band using only one VCO. The RF VCO block designed using a 0.18um CMOS process consists of a wideband LC VCO, five divide-by-2 circuits and several buffers. The simulation results show that the designed circuit has a phase noise at 10kHz better than -87dBc/Hz throughout the signal band and consumes 10mA from a 1.8V supply.

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CMOS Symmetric High-Q 2-Port Active Inductor (높은 Q-지수를 갖는 대칭 구조의 CMOS 2 단자 능동 인덕터)

  • Koo, Jageon;Jeong, Seungho;Jeong, Yongchae
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.27 no.10
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    • pp.877-882
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    • 2016
  • In this paper, a novel CMOS high Q factor 2-port active inductor has been proposed. The proposed circuit is designed by cascading basic gyrator-C structural active inductors and attaching the feedback LC resonance circuit. This LC resonator can compensate parasitic capacitance of transistor and can improve Q factor over wide frequency range. The proposed circuit was fabricated and simulated using 65 nm Samsung RF CMOS process. The fabricated circuit shows inductance of above 2 nH and Q factor higher than 40 in the frequency range of 1~6 GHz.

Electromagnetic Susceptibility Analysis of Phase Noise in VCOs (위상 잡음 이론을 적용한 전압 제어 발진기의 전자파 내성 분석)

  • Hwang, Jisoo;Kim, SoYoung
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.26 no.5
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    • pp.492-498
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    • 2015
  • As the integration of circuit components increases steadily, various EMS(Electromagnetic Susceptibility) problems have emerged from integrated circuits and electrical systems. The electromagnetic susceptibility of VCOs(Voltage Controlled Oscillator) is especially critical in RF systems. Therefore, in this paper, through the phase noise theory that models electrical oscillators as linear time variant systems, the EMS characteristics of representative VCO -ring VCO and LC VCO- with 1.2 GHz of reference oscillating frequency are analyzed under the existence of the electromagnetic noise coupled in power supply. An simulation algorithm is developed to extract impulse response function based on the phase noise theory. When there is no supply noise, the magnitude of the jitter of two oscillators were similar to around 2.1 ps, but in presence of supply noise, the jitter was significantly lower in LC VCOs than ring VCOs.

A Survey on the Works of Analog and Interface Technologies for Smart Phone System Integrated Circuits (스마트폰 시스템반도체를 위한 아날로그 및 인터페이스 기술과 이슈 분석)

  • Moon, San-Gook
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2011.05a
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    • pp.668-670
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    • 2011
  • The Next-generation IT technology has been evolving from single technique to another which has merged, converging characteristics. The government categorized the 5 essential technologies to secure competitiveness in designing system semiconductors as smart motor vehicle info-tainment platform, smart TV multimedia system, smart phone analog interface technique, smart convergence digital communication and RF techniques, and advanced power management for smart devices. Also, it designated smart phone, smart TV, smart motor vehicle, and smart pad as the key industries. Such core techniques will become the key technologies of semiconductor design to secure the competitiveness of the next generation smart devices and the techniques can be transferred to fab-less design companies. In this contribution, we analyze the issues and the problems of the smart phone analog and interface techniques.

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Analysis of Quality factor and Effective inductance of Inductor for RF Integrated Circuits in 90nm CMOS Technology (RFIC 설계에 응용 가능한 90nm 공정 기반 인덕터의 Quality factor 및 Effective inductance 분석)

  • Jang, Seong-Yong;Shin, Jong-Kwan;Kwon, Hyuk-Min;Kwon, Sung-Kyu;Sung, Seung-Yong;Hwang, Sun-Man;Jang, Jae-Hyung;Lee, Ga-Won;Lee, Hi-Deok
    • Journal of the Institute of Electronics and Information Engineers
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    • v.50 no.5
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    • pp.128-133
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    • 2013
  • In this paper, octagonal inductors for RFIC designs was fabricated with 90nm CMOS Technology to compare its quality factor and the effective inductance as functions of radius and number of turn. The quality factor decreases as the inner radius and the number of metal turned increase. However, the effective inductance increases with the increasing the inner radius and the number of metal turned. Therefore, the inductor structure should be decided according to the relative importance of Q-factor and inductance.

A Dual frequency Monopole Antenna using CPW Feed Line (코프래너 급전 이중 주파수 모노폴 안테나)

  • Kim, Joon-Il;Choi, Soon-Shin;Jee, Yong
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.42 no.8 s.338
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    • pp.47-54
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    • 2005
  • The design method for a dual frequency antenna using CPW feed lines is presented. The antenna structures can be simplified by CPW feed lines and easily designed on integrated circuits. The presented antenna has two resonant frequency ranges and each respective resonant frequency is determined by its own length of monopole antenna. We used an impedance matching method by using a monopole coupling related to the ground of CPW feed lines As a result, the resonant frequencies were 5.25[GHz] and 23.5[GHz] and their bandwidths $35.2\%,\;and\;41.3\%$, respectively, and also, the separation of the two frequencies $370\;%$. We presented an analytical designing method to implement a dual frequency monopole antenna and showed simple antenna structures having two frequency ranges for RFIC Integrations.

Development of SiGe Heterostructure Epitaxial Growth and Device Fabrication Technology using Reduced Pressure Chemical Vapor Deposition (저압화학증착을 이용한 실리콘-게르마늄 이종접합구조의 에피성장과 소자제작 기술 개발)

  • Shim, K.H;Kim, S.H;Song, Y.J;Lee, N.E;Lim, J.W;Kang, J.Y
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.4
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    • pp.285-296
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    • 2005
  • Reduced pressure chemical vapor deposition technology has been used to study SiGe heterostructure epitaxy and device issues, including SiGe relaxed buffers, proper control of Ge component and crystalline defects, two dimensional delta doping, and their influence on electrical properties of devices. From experiments, 2D profiles of B and P presented FWHM of 5 nm and 20 nm, respectively, and doses in 5×10/sup 11/ ∼ 3×10/sup 14/ ㎝/sup -2/ range. The results could be employed to fabricate SiGe/Si heterostructure field effect transistors with both Schottky contact and MOS structure for gate electrodes. I-V characteristics of 2D P-doped HFETs revealed normal behavior except the detrimental effect of crystalline defects created at SiGe/Si interfaces due to stress relaxation. On the contrary, sharp B-doping technology resulted in significant improvement in DC performance by 20-30 % in transconductance and short channel effect of SiGe HMOS. High peak concentration and mobility in 2D-doped SiGe heterostructures accompanied by remarkable improvements of electrical property illustrate feasible use for nano-sale FETs and integrated circuits for radio frequency wireless communication in particular.

Analysis of Matching Characteristics of MIM Capacitors with Al2O3/HfO2/Al2O3 (MIM 구조를 갖는 Al2O3/HfO2/Al2O3 캐패시터의 정합특성 분석)

  • Jang, Jae-Hyung;Kwon, Hyuk-Min;Jung, Yi-Jung;Kwak, Ho-Young;Kwon, Sung-Gyu;Lee, Hwan-Hee;Go, Sung-Yong;Lee, Weon-Mook;Lee, Song-Jae;Lee, Hi-Deok
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.1
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    • pp.1-5
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    • 2012
  • In this paper, matching characteristic of MIM (metal-insulator-metal) capacitor with $Al_2O_3/HfO_2/Al_2O_3$ (AHA) structure is analyzed. The floating gate capacitance measurement technique (FGMT) was used for analysis of matching characteristic of the MIM capacitors in depth. It was shown that matching coefficient of AHA MIM capacitor is 0.331%${\mu}m$ which is appropriate for application to analog/RF integrated circuits. It was also shown that the matching coefficient has a more strong dependence on the width than length of MIM capacitor.