• Journal of Sensor Science and Technology
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• v.6 no.3
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• pp.188-193
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• 1997

The lanthanum-modified lead titanate (PLT) thin films on (100) cleaved MgO single crystal substrate have been prepared by RF magnetron sputtering method using PbO-rich target with varing La contents. The substrate temperature, working pressure, $Ar/O_{2}$, and RF power density of PLT thin films were $580^{\circ}C$ 10mTorr, 10/1, and $1.7W/cm^{2}$, respectively. In these conditions, the c-axis growth and tetragonality of the PLT thin films decreased for addition of La content and the PLT thin films showed diffuse phase transition from high temperature XRD patterns. The infrared sensor was fabricated. The remanent polarization was above $1.71{\mu}C/cm^{2}$ and the pyroelectric voltage was above 500mV with 10:1 signal to noise ratio.

• Electrical & Electronic Materials
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• v.10 no.9
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• pp.930-937
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• 1997

Polycrystalline CdTe thin films have been studied for photovoltaic application because of their high absorption coefficient and optimal band energy(1.45 eV) for solar energy conversion. In this study CdTe thin films were deposited on CdS(chemical bath deposition)/ITO(indium tin oxide) substrate by rf-magnetron sputtering under various conditions. Structural optical and electrical properties are investigated with XRD UV-Visible spectrophotometer SEM and solar simulator respectively. The fabricated CdTe/CdS solar cell exhibited open circuit voltage( $V_{oc}$ ) of 610 mV short circuit current density( $J_{sc}$ ) of 17.2 mA/c $m^2$and conversion efficiency of about 5% at optimal sputtering conditions.

• Transactions on Electrical and Electronic Materials
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• v.7 no.5
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• pp.257-261
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• 2006

Nano-structured carbon nitride $(CN_x)$ films were prepared by reactive RF magnetron sputtering with a DC bias at various deposition conditions, and the physical and electrical properties were investigated. FTIR spectrum indicated an ${alpha}C_3N_4$ peak in the films. The carbon nitride film deposited on Si substrate had a nano-structured surface morphology. The grain size was about 20 nm and the deposition rate was $1.7{\mu}m/hr$. When the $N_2/Ar$ ratio was 3/7, the level of nitrogen incorporation was 34.3 at%. The film had a low dielectric constant. The metal-insulator-semiconductor (MIS) capacitors that the carbon nitride was deposited as insulators, exhibited a typical C-V characteristics.

• Journal of the Korean Ceramic Society
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• v.34 no.12
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• pp.1227-1234
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• 1997

ZnO thin films were prepared by rf-magnetron sputter at various conditions. Crystallinity, microstructure, chemical composition, and optical composition, and optical properties of the films were investigated as functions of substrate temperature (R. T.-50$0^{\circ}C$) an sputter gas (O2/Ar=0-50%). ZnO thin films grown at 50$0^{\circ}C$ with sputter gas of pure argon as well as at R. T. with sputter gas of a mixture of argon & oxygen(O2/Ar=2%) exhibit a strong tendency of (002) preferred orientation, compared with a considerable random orientation at the other conditions. The thin films with (002) preferred orientation has a chemical stoichiometry of Zn/O-1.01, a band gap of 3.3eV, and a packing density of 98% respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1998.11a
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• pp.243-246
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• 1998

(Ba, Sr)TiO$_3$[BST] thin films were fabricated on Pt/SiO$_2$/Si substrate by RF sputtering technique. The structural, dielectric and electrical properties of BST thin films were investigated with Ar/O$_2$ ratio. Dielectric constant and dielectric loss of the BST thin film were about 1020 and 2.0[%], respectively. (at RF power 80W, post annealing temperature $650^{\circ}C$, deposition pressure of 5mTorr and Ar/O$_2$=80/20). For the BST(Ar/O$_2$=80/20) thin film with Polarization switching cycles of 10$^{10}$ , remanent polarization and coercive field were 0.084[$\mu$C/cm$^2$], 1.954[kV/cm], respectively.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.23 no.5
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• pp.224-229
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• 2013

Vanadium oxide thin films were deposited on $c-Al_2O_3$ (001) substrate by in-situ RF magnetron sputtering. Oxygen partial pressure was adjusted to prepare thermochromic $VO_2$ phase. X-ray diffraction patterns and scanning electron microscopy convincingly showed that plate-like $V_2O_5$ grains were changed into round-shape $VO_2$ grains as oxygen partial pressure decreased. After the optimized deposition conditions were fixed, the effect of substrate temperature and orientation on the optical properties of $VO_2$ thin films was analyzed.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.51 no.7
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• pp.316-321
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• 2002

In this Paper, the channel characteristics of the medium voltage(22.9kV) power line to analysis the broadband power line communication in the frequency range up to 30MHz was measured. With the sideband electrical coupler in the operating frequency range from DC to 30MHz, we measured characteristic impedance, noise and attenuation of the medium voltage power line, and then characteristic impedance was measured at the state of unloaded medium voltage power line by Scattering parameter method of Vector Network Analyzer. As a measurement result, Channel impedance shows 100~380$\Omega$ at the less than 15MHz and 70~230$\Omega$ at the more than 15 MHz. Noise characteristics of power line shows -75dBm at 20MHz and Narrowband interference noise was from 3 MHz to 7MHz.

• Journal of the Korean Society of Safety
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• v.19 no.1
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• pp.72-76
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• 2004

The $Sr_{0.7}Bi_{2.6}Ta_2O_9$(SBT)thin films are deposited on pt-coated electrode(Pt/$TiO_2/SiO_2/Si$) using a RF magnetron sputtering method. The electrical properties of SBT capacitors with annealing conditions were studied. In the XRD pattern, the SBT thin films in all annealing temperatures had (105) orientation. In the SEM images, Bi-layered perovskite phase was crystallized at $750^{\circ}C$,/TEX> and grains largely grew in oxygen annealing atmosphere. The maximum renanent polarization and the coercive electric field with annealing conditions are 12.40C/$cm^2$ and 30kV/cm, respectively. The dielectric constant and leakage current density with Pt electrode is 340 and 2.13${\times}10^{-10}A/cm^2$, respectively.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.10
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• pp.808-813
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• 2009

Indium nitride thin films were deposited by the radio-frequency reactive magnetron sputtering method. The indium target was sputtered by the mixture flow ratio of $N_2$ to Ar, 9:1. The effects of growth temperature on the structural, optical, and electrical properties of the films were investigated. With increasing the growth temperature, the crystallinity of the films was improved, and the crystalline size was increased. The energy bandgap for the film grown at $25^{\circ}C$ was 3.63 eV, and the bandgap showed an increasing tendency on the growth temperature. The carrier concentration, Hall mobility and electrical resistivity of the films depended significantly on the growth temperature and the maximum Hall mobility of $32.3\;cm^2$/Vsec was observed for the film grown at $400^{\circ}C$.

• Journal of the Korean Ceramic Society
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• v.38 no.12
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• pp.1155-1161
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• 2001

Yittrium Iron Garnet(YIG) has been used as an important material in the circulator/isolator which is used in RF communication system, mobile phone, adn satellite broadcasting, etc. In this study, we investigated the microstructural and magnetic properties of YIG ferrites with the sintering temperature and additives. We fabricated the YIG ferrites substituted with Ca, In, V by the traditional ceramic sintering method at 1250$\^{C}$, 1275$\^{C}$, 1300$\^{C}$ and 1325$\^{C}$. Powders were granulated by using a spray dryer. Crystallographic and microstructural properties were measured by using XRD and SEM. Magnetic properties were measured by using a VSM for saturation magnetization (4$\pi$M$\_$s/) and FMR (Ferromagnetic Resonance) experiment for ferromagnetic resonance line width (△H). The YIG ferrite, Y$\_$1.6/Ca$\_$1.4/Fe$_4$V$\_$0.7/In$\_$0.3/O$\_$12/, sintered at 1300$\^{C}$, showed higher saturation magnetization and lower ferromagnetic resonance line width than any other sintering temperatures.