• The Journal of the Korea institute of electronic communication sciences
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• v.16 no.2
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• pp.233-240
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• 2021

For the production of neodymium-doped zinc sulfide thin films in various amounts, zinc sulfide and neodymium were simultaneously deposited using an RF magnetron sputtering equipment to form a thin films, and rapid thermal annealing was performed at 400℃ for 30 minutes as a post-treatment process. The structure, shape, and optical properties of ZnS thin films having various neodymium doping contents (0.35at.%, 1.31at.%, 1.82at.% and 1.90at.%) were studied. The X-ray diffraction pattern was grown to a (111) cubic structure in all thin films. The surface and structural morphology of the thin films due to the neodymium doping content was explained through SEM and AFM images. Only elements of Zn, S, and Nd that do not contain other impurities were identified through EDAX. The transmittance and band gap of the prepared thin films were confirmed using the UV-vis spectrum.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.389-389
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• 2011

Transparent conductive oxide (TCO) 박막은 디스플레이 및 태양전지 등 광범위한 분야에서 적용되고 있으며, 특히 indium tin oxide (ITO)는 낮은 전기적 저항과 우수한 광투과도를 가지고 있어서 이미 많은 분야에 적용되고 있다. 본 연구는 RF와 DC를 혼용한 마그네트론 스퍼터링 공정을 활용하여 ITO 박막 특성 및 이를 활용한 유기태양전지 적용에 관한 것이다. UV-O3 처리된 glass 기판위에 thermal evaporation 방식으로 밀착력을 높이기 위하여 Cr을 5 nm 두께로 증착한 후 Al을 95 nm 증착하였다. 그 위에 스퍼터링 공정으로 ITO 박막을 In2O3:SnO2 target (10wt% SnO2)을 사용하여 1.0 mTorr의 공정압력(Ar:O2=30:1), 50W의 RF power 및 0.11kW의 DC power에서 50~250 nm의 두께로 증착하였다. ITO 박막의 결정구조 및 표면 형상은 x-ray diffraction (XRD) 및 scanning electron microscope (SEM)을 사용하여 분석하였으며, 전기적 특성은 four-point probe법으로 비저항값을 측정하였다. 또한 높은 광변환효율을 가지는 태양전지 제작을 위하여, 다양한 두께의 ITO 박막을 사용하여 ITO/ZnO/P3HT:PCBM/PEDOT/Ag 구조의 유기태양전지를 제작하여 소자 특성을 최적화 하였다.

• Journal of the Korean Magnetics Society
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• v.4 no.3
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• pp.201-207
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• 1994

RF 마그네트론 스퍼터링법으로 제작된 퍼멀로이(NiFe) 박막에 대하여 투입전력, 아르곤 압력, 바이어스 전압등의 스퍼터링 조건이 퍼멀로이 박막의 자기특성에 미치는 영향을 조사하였다. 투입전력에 따른 보자력의 변화는 300~400W에서 낮은 값을 지녔으며 아르곤 압력에 따른 변화는 1~5mTorr에서 낮은 값을 나타내었다. 스퍼터링 조건에 따른 최소의 보자력값은 400 W, 5mTorr 와 300 W, 2mTorr에서 각각 0.10 Oe를 나타내었고 최대의 투자율값은 400 W, 5mTorr에서 2800(1 MHz)을 나타내었다. 또한 저압의 스 퍼터링 압력에서 바이아스를 가할 경우 보자력은 이에 비례해서 오히려 증가하였다. 박막의 Ni 함량의 변화는 아르곤 압력이 증가함에 따라 점차적으로 감소하나 2~10mTorr 범위에서는 다시 증가하는 경향을 보였다. 내부응력은 아르곤 압력이 증가함에 따라 압축응력에서 인장응력으로 변하였으며 5mTorr에서 내 부응력이 거의 사라졌다.

• Journal of Korean Ophthalmic Optics Society
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• v.12 no.3
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• pp.77-81
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• 2007

We sputtered $TiN_x$ (titanium nitride) thin films on silicon substrates using ultra high vacuum RF magnetron sputtering method, and measured spectra of ellipsometry angles ${\Delta}$ and ${\Psi}$ in the photon-energy range of 1.5-5.0 eV using a variable angle spectroscopic ellipsometer. The optical constants, refractive index and extinction coefficient of the $TiN_x$ films were determined via the dispersion parameters extracted from the curve-fitting process based on Drude+Lorentz oscillator dispersion function. The reliability of determined optical constants were verified through the comparison of between simulated reflectance and reflectance spectra measured using a spectrophotometer.

• Journal of the Korean Vacuum Society
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• v.17 no.1
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• pp.23-27
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• 2008

We have investigated the effect of annealing on the structural and optical properties of polycrystalline Ga doped ZnO (GZO) films grown on glass substrates by RF-magnetron sputter at room temperature. The structural and optical properties of as-grown GZO films were characterized and then samples were annealed at $400{\sim}600^{\circ}C$ in $N_2$ ambient for 30, 60 minutes, respectively. The field emission scanning electron microscopy (FE-SEM) and X-ray diffraction (XRD) were used to measure the grain size and the crystalline quality of the films. We found that the crystalline quality was improved and the grain size tends to be increased. The optical properties of GZO thin films were analyzed by UV-VIS-NIR spectrophotometers. It is found that optical properties of thin films are increased by annealing and can be used for transparent electrode application. We believe that the appropriate post-growth heat treatment could be contributed to the improvement of GZO-based devices.

• Journal of the Korean Vacuum Society
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• v.19 no.3
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• pp.224-229
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• 2010

Indium oxide $(In_2O_3)$ thin films have been prepared on glass substrate by using radio-frequency reactive magnetron sputtering with changing the oxygen flow ratio. The substrate temperature was kept at a fixed value of $400^{\circ}C$, and the sputtering gas and reactive gas were supplied with argon and oxygen, respectively. The oxygen partial flow ratio was varied by controlling the amount of oxygen with respect to the total mixed gases, 10%, 20%, 30%, 40%, and 50%. The optical, electrical, and structural properties of the deposited thin films were investigated by using ultraviolet-visible-near infrared spectrophotometer, Hall measurement, and X-ray diffractometer and scanning electron microscopy. The $In_2O_3$ thin film deposited at 20% of oxygen flow ratio showed an average transmittance of 86% in the wavelength range of 430~1,100 nm, an electrical resistivity of $1.1{\times}10^{-1}{\Omega}cm$. The results show that the transparent conducting films with optimum conditions can be achieved by controlling the oxygen flow ratio.

• 한국신재생에너지학회:학술대회논문집
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• 2009.11a
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• pp.390-390
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• 2009

마그네트론 스퍼터링법을 이용하여 n-i-p 구조의 플렉서블 실리콘 박막태양전지용 ZnO/Ag 후면전극을 stainless steel 기판위에 제조하고 증착온도와 Ag 박막의 두께 변화에 따른 광학적 특성변화를 조사하였다. ZnO/Ag 구조의 후면전극은 RF와 DC 마그네트론 스퍼터링으로 Ag 금속 및 ZnO:Al($Al_2O_3$ 2.5%) 세라믹 타겟을 이용하여 각각 제조하였으며 증착온도는 상온 ${\sim}500^{\circ}C$로, Ag 박막두께는 100 ~ 500 nm로 변화시켰다. 증착조건 변화에 따라 제조된 후면전극의 표면거칠기 및 형상변화를 Atomic Force Mircroscope (AFM)와 Scanning electron miroscopy (SEM)으로 분석하였으며 이에 따른 반사도 변화를 UV-visible-nIR spectrometry 측정을 통하여 조사하였다. 증착온도가 증가함에 따라 Ag 박막의 표면 거칠기는 점차로 증가하였으며 증착된 후면전극의 반사도도 함께 증가함을 알 수 있었다. Ag 박막의 두께 변화에 따른 반사도 변화와 n-i-p 구조의 플렉서블 실리콘 박막태양전지에 미치는 영향을 조사하였다.

• Journal of the Korean Solar Energy Society
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• v.26 no.4
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• pp.55-61
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• 2006

Titanium oxide ($TiO_2$) films are deposited on the indium tin oxide (ITO) substrate in an $Ar/O_2$ atmosphere by using reactive RF (Radio Frequency) magnetron sputtering technique, and Electrochromic properties and durability of $TiO_2$ films deposited at different preparation conditions are investigated by using UV-VIS spectrophotometer and cyclic voltammetry Li+ interalation/deintercalation in $TiO_2$ films shows that the electrochromic properties and durability of as-deposited films strongly depend on gas pressure $TiO_2$ films formed in our sputtering conditions are found to remain transparent, irrespective of their Li+ ion contents. The optimum sputtering conditions for film as passive counter electrode in electrochromic devices are working pressure of $1.0\;{\times}\;10^{-2}\;torr$ and oxygen flow raes of $10{\sim}15\;sccm$, respectively.

• Journal of Advanced Marine Engineering and Technology
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• v.37 no.1
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• pp.72-77
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• 2013

The effect of sputtering condition on the structural properties of ZnO thin films grown by RF magnetron sputtering system was investigated for TFT driver circuit. ZnO thin films were grown with ZnO target varying RF power and working pressure. Structural properties were investigated by X-ray diffraction (XRD) and atomic force microscope (AFM). The ZnO thin films have sufficient crystallinity on the 100W RF power. But, the surface roughness of ZnO films was increased as increased RF power. As increased working pressure from 5 mTorr to 15 mTorr, a full width at half maximum (FWHM) of ZnO (002) peak was increased.

• Journal of the Korean Ceramic Society
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• v.40 no.7
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• pp.652-656
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• 2003

The green emitting phosphor, BnGa$_2$O$_4$:Mn thin films with spinel structure were deposited by rf magnetron sputtering at various Ar/O$_2$ ratios. Thin film phosphors were heat-treated in air and $N_2$+vacuum atmosphere, respectively. Effects of Ar/O$_2$ ratios and annealing conditions on the structural and photoluminescence (PL) and cathodeluminescence (CL) properties were investigated. Luminous properties were more improved by inhibiting the films from contacting with oxygen during heat treatment.