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The Effect of Sputtering Conditions on the Electrochromic Properties of Titanium Oxide Thin Films  

Lee, Kil-Dong (Dept. of Physics, Kyonggi. University)
Publication Information
Journal of the Korean Solar Energy Society / v.26, no.4, 2006 , pp. 55-61 More about this Journal
Abstract
Titanium oxide ($TiO_2$) films are deposited on the indium tin oxide (ITO) substrate in an $Ar/O_2$ atmosphere by using reactive RF (Radio Frequency) magnetron sputtering technique, and Electrochromic properties and durability of $TiO_2$ films deposited at different preparation conditions are investigated by using UV-VIS spectrophotometer and cyclic voltammetry Li+ interalation/deintercalation in $TiO_2$ films shows that the electrochromic properties and durability of as-deposited films strongly depend on gas pressure $TiO_2$ films formed in our sputtering conditions are found to remain transparent, irrespective of their Li+ ion contents. The optimum sputtering conditions for film as passive counter electrode in electrochromic devices are working pressure of $1.0\;{\times}\;10^{-2}\;torr$ and oxygen flow raes of $10{\sim}15\;sccm$, respectively.
Keywords
Titanium oxide films; Magnetron sputtering; Electrochromic properties; Optimum sputtering conditions; Counter electrode;
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Times Cited By KSCI : 1  (Citation Analysis)
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