• Journal of the Semiconductor & Display Technology
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• v.14 no.4
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• pp.88-91
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• 2015

In this paper, we have designed and fabricated a BPF (Band Pass Filter) for 5.8GHz Microwave Wireless Power Transmission. We $used{\lambda}g/2$ open-circuited stubs in addition to T-shaped transmission lines for the BPF. This BPF removes harmonics caused by diodes of RF-DC converter, and thus the RF-DC converter converts more RF power to the DC. The performance of the BPF was measured and shown through direct comparison of voltages converted by the doubler as a RF-DC Converter with and without the BPF.

• Proceedings of the Materials Research Society of Korea Conference
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• 2000.11a
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• pp.57-57
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• 2000

• Proceedings of the Materials Research Society of Korea Conference
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• 2000.11a
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• pp.58-58
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• 2000

• Journal of the Korean institute of surface engineering
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• v.40 no.3
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• pp.117-124
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• 2007

The ITO films were deposited on glass substrates by RF-superimposed dc reactive magnetron sputtering and were annealed in $N_2$ vacuum furnace with temperatures in the range of $403K{\sim}573K$ for 30 minutes. Electrical, optical and structural properties of ITO films were examined with varying annealing temperatures from 403 K to 573 K. The resistivity of as-deposited ITO films was $5.4{\times}10^{-4}{\Omega}cm$ at the sputter conditions of applied RF/DC power of 200/200 W, $O_{2}$ flow of 0.2 seem and Ar flow of 0.2 seem. As a result of annealing in the temperature range of $403K{\sim}573K$, the crystallization occurred at 423 K that is lower than the crystallization temperature caused by a conventional sputtering method. And the resistivity decreased from $5.4{\times}10^{-4}{\Omega}cm\;to\;2.3{\times}10^{-4}{\Omega}cm$, the carrier concentration and mobility of ITO films increased from $4.9{\times}10^{20}/cm^3\;to\;6.4{\times}10^{20}/cm^3$, from $20.4cm^2/Vsec\;to\;41.0cm^2/Vsec$, respectively. The transmittance of ITO films in visible became higher than 90% when annealed in the temperature range of $423K{\sim}573K$. High quality ITO thin films made by RF-superimposed dc reactive magnetron sputtering and annealing in $N_2$ vacuum furnace will be applied to transparent conductive oxides of the advanced flat panel display.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.48-48
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• 2007

P-type transparent conducting $CuGaO_2$ thin films have been prepared by DC/RF sputtering using Quartz(0001) and sapphire(0001) substrates. The target was fabricated by heating a stoichiometric mixture of CuO and $Ga_2O_3$ at 1373K for 12h under $N_2$ atmosphere. The film were deposited under mixture gas of Ar and $O_2(Ar:O_2=4:1)$ during 10~30min. and the as-deposited films were annealed at 1123K and $N_2$ atmosphere. Room temperature conductivity and the activation energy of the sintered body in the temperature range of 223K ~ 423K were 0 004S/cm, 1.9eV, respectively. XRD revealed that all of the as-deposited films were amorphous. Heating of the films deposited on Quartz substrates above 1123K resulted in crystallization with a second phase of $CuSiO_3$, which was assumed owing to reaction with Quartz substrate. The single phase of $CuGaO_2$ was obtained at the film deposited on the sapphire substrates. The transmittance after annealing of DC- and RF-sputtered films were 55~75% at 550nm. From the transmittance and reflectance measurement. the direct band gap of the DC/RF-sputtered films were 3.63eV and 3.57eV. and there was little difference between DC and RF sputtered films.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.24 no.4
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• pp.384-393
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• 2013

In this paper, a design of planar microwave bias-tee using lumped elements was presented. The bias-tee is composed of 2 blocks; DC block and RF choke. For this design of the bias-tee, a wideband capacitor was used for DC block. For a RF choke, a series connection of inductors which have different SRFs is used for a RF choke. In the RF choke, a series connection of resistor and capacitor was added in shunt to eliminate a loss from a series resonance. The designed bias-tee was implemented by using 1608 SMT chip components. The fabricated bias-tee was measured using Anritsu 3680K fixture which enables to remove an effect of a connector. The fabricated bias-tee presented -15 dB of return loss and -1.5 dB insertion loss at 10 MHz~18 GHz.

• Proceedings of the KIEE Conference
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• 1999.07g
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• pp.3256-3258
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• 1999

Recently contactless ID system has emerged as new ID industry. It's called RF-ID. RF-ID is divided into active RF-ID and passive RF-ID. The passive RF-ID operates without battery and so has no limitation in its operating range and life time. But it needs the RF-OC conversion circuit. It also can be applied to batteryless sensor for many application. This paper presents the study of the RF-OC conversion circuit for batteryless system in high frequency and confirms it by simulation and experiment.

• KSII Transactions on Internet and Information Systems (TIIS)
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• v.11 no.10
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• pp.5116-5131
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• 2017

This paper studies the radio frequency to direct current (RF-DC) conversion efficiency of rectennas applicable to wireless power transfer systems, where multiple receive antennas are arranged in serial, parallel or cascaded form. To begin with, a 2.45 GHz dual-diode rectifier is designed and its equivalent linear model is applied to analyze its output voltage and current. Then, using Advanced Design System (ADS), it is shown that the rectifying efficiency is as large as 66.2% in case the input power is 15.4 dBm. On the other hand, to boost the DC output, three composite rectennas are designed by inter-connecting two dual-diode rectifiers in serial, parallel and cascade forms; and their output voltage and current are investigated using their respective equivalent linear models. Simulation and experimental results demonstrate that all composite rectennas have almost the same RF-DC conversion efficiency as the dual-diode rectifier, yet the output of voltage or current can be significantly increased; in particular, the cascade rectenna obtains the highest rectifying efficiency.

• Journal of the Korean institute of surface engineering
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• v.52 no.6
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• pp.342-349
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• 2019

Titanium nitride(TiN) thin films have been deposited on PEN(Polyethylene naphthalate) substrate by reactive RF(13.56 MHz) magnetron sputtering in a 25% N₂/Ar mixed gas atmosphere. The pulsed DC bias voltage of -50V on substrates was applied with a frequency of 350 kHz, and duty ratio of 40%(1.1 ㎲). The effects of pulsed DC substrate bias voltage on the crystallinity, color, electrical properties of TiN_x films have been investigated using XRD, SEM, XPS and measurement of the electrical properties such as electrical conductivity, carrier concentration, mobility. The deposition rates of TiN_x films was decreased with application of the pulsed DC substrate bias voltage. The TiN_x films deposited without and with pulsed bias of -50V to substrate exhibits gray and gold colors, respectively. XPS depth profiling revealed that the introduction of the substrate bias voltage resulted in decreasing oxygen concentration in TiN_x films, and increasing the electrical conductivities, carrier concentration, and mobility to about 10 times, 5 times, and 2 times degree, respectively.

• Journal of the Korean institute of surface engineering
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• v.45 no.3
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• pp.117-122
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• 2012

ZTO/GZO double layered films were prepared on unheated non-alkali glass substrates. ZTO films were deposited by RF/DC hybrid magnetron co-sputtering using ZnO (RF) target and $SnO_2$ (DC) targets, and then GZO films were deposited by DC magnetron sputtering using an GZO ($Ga_2O_3$:5.57 wt%) target. These films were post-annealed at temperature of 200, $300^{\circ}C$ in air and vacuum ambient for 30 min. In the case of post-annealing in air, ZTO/GZO double layer showed relatively low resistivity change, compared to GZO single layer. Furthermore, ZTO/GZO double layer revealed low WVTR, compared to GZO single layer. Therefore, it can be confirmed that ZTO film doing a role with barrier for water or oxygen diffusion.