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http://dx.doi.org/10.5695/JKISE.2007.40.3.117

A Study on the Annealed Properties of ITO Thin Film Deposited by RF-superimposed DC Reactive Magnetron Sputtering  

Moon, Jin-Wook (Department of Advanced Materials Engineering, Kyonggi University)
Kim, Dong-Won (Department of Advanced Materials Engineering, Kyonggi University)
Publication Information
Journal of the Korean institute of surface engineering / v.40, no.3, 2007 , pp. 117-124 More about this Journal
Abstract
The ITO films were deposited on glass substrates by RF-superimposed dc reactive magnetron sputtering and were annealed in $N_2$ vacuum furnace with temperatures in the range of $403K{\sim}573K$ for 30 minutes. Electrical, optical and structural properties of ITO films were examined with varying annealing temperatures from 403 K to 573 K. The resistivity of as-deposited ITO films was $5.4{\times}10^{-4}{\Omega}cm$ at the sputter conditions of applied RF/DC power of 200/200 W, $O_{2}$ flow of 0.2 seem and Ar flow of 0.2 seem. As a result of annealing in the temperature range of $403K{\sim}573K$, the crystallization occurred at 423 K that is lower than the crystallization temperature caused by a conventional sputtering method. And the resistivity decreased from $5.4{\times}10^{-4}{\Omega}cm\;to\;2.3{\times}10^{-4}{\Omega}cm$, the carrier concentration and mobility of ITO films increased from $4.9{\times}10^{20}/cm^3\;to\;6.4{\times}10^{20}/cm^3$, from $20.4cm^2/Vsec\;to\;41.0cm^2/Vsec$, respectively. The transmittance of ITO films in visible became higher than 90% when annealed in the temperature range of $423K{\sim}573K$. High quality ITO thin films made by RF-superimposed dc reactive magnetron sputtering and annealing in $N_2$ vacuum furnace will be applied to transparent conductive oxides of the advanced flat panel display.
Keywords
Indium tin oxide; RF-superimposed DC reactive magnetron sputtering; OLED; Resistvity; Mobility; Surface roughness; Transmittance;
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  • Reference
1 Y. Hoshi, H. O. Kato, K. Funatsu, Thin Solid Films, 445 (2003) 245   DOI   ScienceOn
2 J. E. Costellamo, Handbook of Display Technology, Academic Press, New York (1992)
3 J. K. Sheu, Y. K. Su, G. C. Chi, M. J. Jou, C. M. Chang, Appl. Phys. Lett., 72 (1998) 3317   DOI   ScienceOn
4 M. Stowell, J. Muller, M. Ruske, M. Lutz, T. Linz, Thin Solid Films, (2007) doi:10.1016/j.tsf.2006.11.166
5 Y. Hoshi, T. Kiyomura, Thin Solid Films, 411 (2002) 36   DOI   ScienceOn
6 I. Y. Lee, K. A. Lee, 한국광학회지, 11 (2000) 152
7 H. Omoto, A. Takamatsu, T. Kobayashi, Vacuum, 80 (2006) 783   DOI   ScienceOn
8 Y. Hu, X. Diao, C. Wang, W.Hao, T. Wang, Vacuum, 75 (2004) 183   DOI   ScienceOn
9 H. Kim, C. M. Gilmore, J. Appl. Phys., 86 (1999) 6451   DOI
10 L. A. Ryabova, V. S. Salun, I. A. Serbinov, Thin Solid Films, 92 (1982) 327   DOI   ScienceOn
11 H. Morikawa, H. Sumi, M. Kohyama, Thin Solid Films, 281 (1996) 202   DOI   ScienceOn
12 B. M. Koo, S. J. Jung, Y. H. Han, J. J. Lee, J. H. Joo, 한국표면공학회지, 37 (2004) 146
13 M. Bender, J. Trube, J. Stollenwerk, Appl. Phys A, 69 (1999) 397   DOI   ScienceOn
14 C. G. Granqvist, A. Hultaker, Thin Solid Films, 411 (2002) 1   DOI   ScienceOn
15 K. Zhang, F. Zhu, C. H. A. Huan, A. T. S. Wee, J. Appl. Phys., 86 (1999) 974   DOI
16 S. E. Dyer, O. J. Gregory, P. S. Amons, A. B. Dlot, Thin Solid Films, 288 (1996) 279   DOI   ScienceOn
17 H. C. Lee, Applied Surface Science, 252 (2006) 2647   DOI   ScienceOn
18 I. Hamberg, C. G. Granqvist, J. Appl. Phys., 60 (1986) 123   DOI
19 M. Kamei, Y. Shigesato, S. Takaki, Thin Solid Films, 259 (1995) 38   DOI   ScienceOn
20 L. Bardos, M. Libra, Vacuum, 39 (1989) 33   DOI   ScienceOn
21 K. L. Chopra, S. Major, D. K. Pandya, Thin Solid Films, 102 (1996) 146
22 W. Wang, J. Xu, X. Kiu, Y. Jing, G. Wang, X. Lu, Thin Solid Films, 365 (2000) 116   DOI   ScienceOn
23 Y. H. Tak, K. B. Kim, H. G. Park, K. H. Lee, J. R. Lee, Thin Solid Films, 411 (2002) 12   DOI   ScienceOn
24 M. J. Alam, D. C. Cameron, Thin Solid Films, 420 (2002) 76   DOI   ScienceOn
25 J. C. Manifacier, J. P. Fillard, J. Appl. Phys., 77 (1991) 67
26 S. Muranaka, Y. Bando, T. Takada, Thin Solid Films, 151 (1987) 355   DOI   ScienceOn