• Title/Summary/Keyword: Process memory

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Quasi-nonvolatile Memory Characteristics of Silicon Nanosheet Feedback Field-effect Transistors (실리콘 나노시트 피드백 전계효과 트랜지스터의 준비휘발성 메모리 특성 연구)

  • Seungho Ryu;Hyojoo Heo;Kyoungah Cho;Sangsig Kim
    • Journal of IKEEE
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    • v.27 no.4
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    • pp.386-390
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    • 2023
  • In this study, we examined the quasi-nonvolatile memory characteristics of silicon nanosheet (SiNS) feedback field-effect transistors (FBFETs) fabricated using a complementary metal-oxide-semiconductor process. The SiNS channel layers fabricated by photoresist overexposure method had a width of approximately 180 nm and a height of 70 nm. The SiNS FBFETs operated in a positive feedback loop mechanism and exhibited an extremely low subthreshold swing of 1.1 mV/dec and a high ON/OFF current ratio of 2.4×107. Moreover, SiNS FBFETs represented long retention time of 50 seconds, indicating the quasi-nonvolatile memory characteristics.

A Study on Width of Dummy Switch for performance improvement in Current Memory (Current Memory의 성능 개선을 위한 Dummy Switch의 Width에 관한 연구)

  • Jo, Ha-Na;Hong, Sun-Yang;Jeon, Seong-Yong;Kim, Seong-Gwon
    • Proceedings of the Korean Institute of Intelligent Systems Conference
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    • 2007.04a
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    • pp.485-488
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    • 2007
  • 최근 Analog Sampled-Data 신호처리를 위하여 주목되고 있는 SI(Switched-Current) circuit은 저전력 동작을 하는 장점이 있지만, 반면에 SI circuit에서의 기본 회로인 Current Memory는 Charge Injection에 의한 Clock Feedthrough이라는 치명적인 단점을 갖고 있다. 따라서 본 논문에서는 Current Memory의 문제점인 Clock Feedthrough의 일반적인 해결방안으로 Dummy Switch의 연결을 검토하였고, Austria Mikro Systeme(AMS)에서 $0.35{\mu}m$ CMOS process BSIM3 Model로 제작하기 위하여 Current Memory의 Switch MOS와 Dummy Switch MOS의 적절한 Width을 정의하여야 하므로, 그 값을 도출하였다. Simulation 결과, Switch의 Width는 $2{\mu}m$, Dummy Switch의 Width는 $2.35{\mu}m$로 정의될 수 있음을 확인하였다.

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Design of a Datapath Synthesis System for Minimization of Multiport Memory Cost (메모리 비용 최소화를 위한 데이타패스 합성 시스템의 설계)

  • 이해동;황선영
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.32A no.10
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    • pp.81-92
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    • 1995
  • In this paper, we present a high-level synthesis system that generates area-efficient RT-level datapaths with multiport memories. The proposed scheduling algorithm assigns an operation to a specific control step such that maximal sharing of functional units can be achieved with minimal number of memory ports, while satisfying given constraints. We propose a measure of multiport memory cost, MAV (Multiple Access Variable) which is defined as a variable accessed at several control steps , and overall memory cost is reduced by equally distributing the MAVs throughout all the control steps. Experimental results show the effectiveness of the proposed algorithm. When compared with previous approaches for several benchmarks available from literature, the proposed algorithm generates the datapaths with less memory modules and interconnection structures by reflecting the memory cost in the scheduling process.

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A study on the High Integrated 1TC SONOS Flash Memory (고집적화된 1TC SONOS 플래시 메모리에 관한 연구)

  • 김주연;이상배;한태현;안호명;서광열
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.26-31
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    • 2002
  • To realize a high integrated Flash memory utilizing SONOS memory devices, the NOR type 1TC(one Transistor Cell) SONOS Flash arrays are fabricated and characterized. This SONOS Flash arrays with common source lines are designed and fabricated by conventional 0.35$\mu\textrm{m}$ CMOS process. The thickness of ONO for memory cell is tunnel oxide of 34${\AA}$, nitride of 73${\AA}$ and blocking oxide of 34${\AA}$. To investigate operating characteristics, CHEI(Channel Hot Electron Injection) method and Bit line erase method are selected as the write operation and the erase method, respectively. The disturbance characteristics according to the write/erase/read cycling are also examined. The degradation characteristics are investigated and then the reliability of SONOS flash memory is guaranteed.

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Memory Device for the Next Generation(Nano-Floating Gate Memory) (차세대 메모리 개발 동향(나노 플로팅 게이트 메모리))

  • Kil, Sang-Cheol;Kim, Hjun-Suk;Kim, Sang-Sig
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.199-202
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    • 2004
  • NFGM(Nano-Floating Gate Memory) is a very prospective candidate memory for the next generation with MRAM, PRAM, PoRAM. Among these memory devices for the next generation, NFGM has a lot of merits such as a simple low cost fabrication process, improved retention time, lower operating voltages, high speed program/erase time and so on. Therefore, many intensive researches for NFGM have been performed to improve device performance and reliability, which depends on the ability to control particle size, size distribution, crystallity, areal particle density and tunneling oxide quality. In this paper, we investigate the researches for NFGM up to recently.

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A study on characteristics of crystallization according to changes of top structure with phase change memory cell of $Ge_2Sb_2Te_5$ ($Ge_2Sb_2Te_5$ 상변화 소자의 상부구조 변화에 따른 결정화 특성 연구)

  • Lee, Jae-Min;Shin, Kyung;Choi, Hyuck;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.80-81
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    • 2005
  • Chalcogenide phase change memory has high performance to be next generation memory, because it is a nonvolatile memory processing high programming speed, low programming voltage, high sensing margin, low consumption and long cycle duration. We have developed a sample of PRAM with thermal protected layer. We have investigated the phase transition behaviors in function of process factor including thermal protect layer. As a result, we have observed that set voltage and duration of protect layer are more improved than no protect layer.

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A Study on the High Integrated 1TC SONOS flash Memory (고집적화된 1TC SONOS 플래시 메모리에 관한 연구)

  • 김주연;김병철;서광열
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.5
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    • pp.372-377
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    • 2003
  • To realize a high integrated flash memory utilizing SONOS memory devices, the NOR type ITC(one Transistor Cell) SONOS flash arrays are fabricated and characterized. This SONOS flash arrays with the common source lines are designed and fabricated by conventional 0.35$\mu\textrm{m}$ CMOS process. The thickness of ONO for memory cells is tunnel oxide of 34${\AA}$, nitride of 73${\AA}$ and blocking oxide of 34${\AA}$ . To investigate operating characteristics, CHEI(Channel Hot Electron Injection) method and bit line method are selected as the program and 4he erase operation, respectively. The disturbance characteristics ,according to the program/erase/read cycling are also examined. The degradation characteristics are investigated and then the reliability of SONOS flash memory is guaranteed.

A Study on Improvement of Low-power Memory Architecture in IoT/edge Computing (IoT/에지 컴퓨팅에서 저전력 메모리 아키텍처의 개선 연구)

  • Cho, Doosan
    • Journal of the Korean Society of Industry Convergence
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    • v.24 no.1
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    • pp.69-77
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    • 2021
  • The widely used low-cost design methodology for IoT devices is very popular. In such a networked device, memory is composed of flash memory, SRAM, DRAM, etc., and because it processes a large amount of data, memory design is an important factor for system performance. Therefore, each device selects optimized design factors such as function, performance and cost according to market demand. The design of a memory architecture available for low-cost IoT devices is very limited with the configuration of SRAM, flash memory, and DRAM. In order to process as much data as possible in the same space, an architecture that supports parallel processing units is usually provided. Such parallel architecture is a design method that provides high performance at low cost. However, it needs precise software techniques for instruction and data mapping on the parallel architecture. This paper proposes an instruction/data mapping method to support optimized parallel processing performance. The proposed method optimizes system performance by actively using hardware and software parallelism.

Trends in Compute Express Link(CXL) Technology (CXL 인터커넥트 기술 연구개발 동향)

  • S.Y. Kim;H.Y. Ahn;Y.M. Park;W.J. Han
    • Electronics and Telecommunications Trends
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    • v.38 no.5
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    • pp.23-33
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    • 2023
  • With the widespread demand from data-intensive tasks such as machine learning and large-scale databases, the amount of data processed in modern computing systems is increasing exponentially. Such data-intensive tasks require large amounts of memory to rapidly process and analyze massive data. However, existing computing system architectures face challenges when building large-scale memory owing to various structural issues such as CPU specifications. Moreover, large-scale memory may cause problems including memory overprovisioning. The Compute Express Link (CXL) allows computing nodes to use large amounts of memory while mitigating related problems. Hence, CXL is attracting great attention in industry and academia. We describe the overarching concepts underlying CXL and explore recent research trends in this technology.

Effects of a Memory Training Program Using Efficacy Sources on Memory Improvement in Elderly People. (노인의 효능자원을 이용한 기억훈련프로그램의 효과)

  • Kim, Jeong-Hwa
    • Journal of Korean Academy of Nursing
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    • v.30 no.5
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    • pp.1170-1180
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    • 2000
  • This study was a quasi-experimental study to confirm the effects of a memory training program using efficacy sources. The purpose was to develop an effective memory training program for elderly people and to identify the effects of the memory training program. This study was carried out between February 24 and July 18, 1999 and the subjects of the study were 102 elderly people who were participants at a welfare institute in Seoul. The experimental group (51) and the control group (51) were assigned by means of participation order. The control group was matched to the experimental group and was selected considering age, sex, and religion. The experimental group participated in the memory training program. The memory training program was based on the literature of Fogler & Stern (1994), Wang & Lee (1990), Lee (1991) and Lee (1993). The memory training program was given twice a week for two weeks with each program lasting two hours. Task centered memory self-efficacy was measured using the Memory Self-Efficacy Scale developed by Berry & Dennehey (1989) and Meta Memory was measured by the MIA developed by Dixon et al. (1988) Memory performance was measured by the word list developed by Cho Sung Won (1995) and the face recognition task (Face Recognition Task developed for this study). Data were analyzed by SPSS PC and the results are described below. 1. The experimental group which participated in the Memory Training Program showed higher task centered memory self-efficacy scores as compared to the control group (t=4.354, P=.0001). 2. The experimental group which participated in the Memory Training Program showed higher metamemory scores as compared to the control group (t=4.733, P=.0001). 3. The experimental group which participated in the Memory Training Program showed higher memory performance scores as compared to the control group (t=7.500, P=.0001). The memory performance involved an immediate word recall task, a delayed word recall task, a word recognition task, and the face recognition task. 4. In the experimental group, there was significant correlation between the task centered memory self-efficacy scores and the metamemory scores (r=.382, P=.006), but the correlation between the task centered memory self-efficacy scores and the memory performance scores and between the metamemory scores and the memory performance scores were not significant. The results showed that task centered memory self-efficacy, meta memory and memory performance improved following the Memory Training Program including the memory process, changes in memory with aging, and appropriate use of memory strategies. Memory Training Program is an effective nursing intervention for improving memory in elderly people and, also, in people with complaints of memory loss.

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