• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.05a
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• pp.162-162
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• 2015

본 연구는 환경 및 인체에 유해한 포르말린을 사용하지 않은 무전해 동 도금액을 개발한 후 도금액을 전자파 차폐 섬유도금에 적용하기 위해 도금 조건에 따른 특성을 파악하였다. 본 연구에서는 무전해 동 도금액의 온도, pH, Bath loading, 도금시간을 변화시켜 도금액의 도금속도 및 도금피막의 형상을 관찰하였으며, 전자파 차폐를 위한 섬유에 개발된 도금액을 적용하고자 현재 상용 전처리 공정을 통해 도금실험을 수행하였다. 여러 도금조건을 변화하여 실험한 결과 $50^{\circ}C$의 도금액 온도, 12.8~13.5의 pH 조건에서 현재 사용 중인 포르말린 도금액과 유사하거나 더 우수한 도금속도를 나타내었으며 현재 사용중인 도금액의 대체가 가능할 것으로 판단되었다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2003.05a
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• pp.61-61
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• 2003

It is important to know SIze distribution of defects In electroplated trivalent chrome layers because it significantly influences on performance of the layers. Most of the nano-scale defects are able to be introduced by hydrogen evolution during the plating. Little information is available on the nano-size defects. In this study, SANS was applied to determine the size distribution of nano-scale defects in the trivalent chrome layers prepared in a formate bath. The defect size and distribution was dependent upon plating conditions such as current density and applied voltage. SANS is one of useful techniques to determine the nano-scale defect in the electroplated layers.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.10a
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• pp.155-155
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• 2009

The copper plating was deposited by pulse reverse current (PRC) method with additives. The all specimens were first immersted in 10% H2SO4 for 10 minutes, and then were rinsed with deionized water. The current densities of forward pulse were 400mA/$cm^2$, and those of reverse pulse were 1900mA/$cm^2$ and 100mA/$cm^2$. Results are compared for different additives for pulse plating conditions. When it added in Only CH4N2S (TU) or only C10H13NO3S (SVH), the effect of surface side growth of Cu was not different. But when it added in TU and SVH, surface side growth of Cu decreased. Polarization curves were measured from OCP to -0.7 V at a rate of 1mV/sec. Each specimen was observed under the PHENOM to see surface morphology.

• Journal of the Microelectronics and Packaging Society
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• v.23 no.3
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• pp.69-75
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• 2016

This study investigated the effect of heat treatment conditions not only on the Cr surface crack propagation behaviors but also on the Ni/Cr interfacial reaction characteristics in electroless Ni/electroplated Cr double coating layers on Cu substrate. Clear band layer of Ni-Cr solid solutions were developed at Ni/Cr interface after heat treatment at $750^{\circ}C$ for 6 h. Channeling cracks formed in Cr layer after 1 step heat treatment, that is, heat treatment after Ni/Cr plating, while little channeling cracks formed after 2 step heat treatment, that is, same heat treatments after Ni and Cr plating, respectively, due to residual stress relaxation due to crystallization of Ni layer before Cr plating.

• Journal of the Korean institute of surface engineering
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• v.51 no.6
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• pp.400-404
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• 2018

A metal 3D printer has been developed on its own to electrodeposit the localized area. Nozzles were used to selectively laminate the electrolytic plating method. To analyze the factors affecting the deposition, the stack height, thickness and surface roughness were experimentally analyzed according to the current density and the temperature of the electrolyte. Electrolytic temperature and current are electrodeposited when the deposition conditions are dominant over the etching conditions, but the thickness is kept constant. On the contrary, when the etching conditions are dominant, the electrodeposited shape is rather the etched. As a result, the uniformity of surface quality and electrodeposition rate could be improved by conducting experiments under constant conditions of electrolyte temperature and current density.

• Journal of the Microelectronics and Packaging Society
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• v.29 no.1
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• pp.49-54
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• 2022

The copper plating process used to fabricate the submicron damascene pattern of Cu wiring for Si wafer was applied to the plating of a PCB pattern of several tens of microns in size using the same organic additives and current density conditions. In this case, the non-uniformity of the plating thickness inside the pattern was observed. In order to quantitatively analyze the cause, a numerical calculation considering the solution flow and electric field was carried out. The calculation confirmed that the depletion of Cu²⁺ ions in the solution occurred relatively earlier at the bottom corner than the upper part of the pattern due to the plating of the sidewall and the bottom at the corner of the pattern bottom. The diffusion coefficient of Cu²⁺ ions is 2.65 10^-10 m²/s, which means that Cu²⁺ ions move at 16.3 ㎛ per second on average. In the cases of small damascene patterns, the velocity of Cu²⁺ ions is high enough to supply sufficient ions to the inside of the patterns, while sufficient time is required to replenish the exhausted copper ions in the case of a PCB pattern having a size of several tens of microns. Therefore, it is found that the thickness uniformity can be improved by reducing the current density to supply sufficient copper ions to the target area.

• Membrane Journal
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• v.32 no.6
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• pp.456-464
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• 2022

Hydrogen permeation performance was analyzed by manufacturing Pd and Pd-Cu membranes through electroless plating. As a support for the Pd and Pd-Cu membranes, α-Al₂O₃ ceramic hollow fiber were used. Pd-Cu membrane was manufactured through sequential electroless plating, and then annealing was performed at 500°C, for 18 h in a hydrogen atmosphere to make Pd and Cu alloy. After annealing, the Pd-Cu membrane confirmed that the alloy was formed through EDS (Energy Dispersive X-ray Spectroscopy) and XRD (X-ray Diffraction) analysis. In addition, the thickness of the Pd and Pd-Cu plating layers were measured to be about 3.21 and 3.72 µm, respectively, through SEM (Scanning Electron Microscope) analysis. Hydrogen permeation performance was tested for hydrogen permeation in the range of 350~450°C and 1~4 bar in hydrogen single gas and mixed gas (H₂, N₂). In a single hydrogen gas, Pd and Pd-Cu membranes have flux of up to 54.42 and 67.17 ml/cm²⋅ min at 450 °C and 4 bar. In the mixed gas, it was confirmed that the separation factors of 1308 and 453 were obtained under the conditions of 450 °C and 4 bar.

• Journal of Powder Materials
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• v.15 no.3
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• pp.221-226
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• 2008

Silver coated copper composite powders were prepared by electroless plating method by controlling the activation and deposition process variables such as feeding rate of silver ions solution, concentration of reductant and molar ratio of activation solution $(NH_4OH/(NH_4)_2SO_4)$ at room temperature. The characteristics of the product were verified by using a scanning electron microscopy (SEM), X-ray diffraction (XRD) and atomic absorption (A.A.). It is noted that completely cleansing the copper oxide layers and protecting the copper particles surface from hydrolysis were important to obtain high quality Ag-Cu composite powders. The optimum conditions of Ag-Cu composite powder synthesis were $NH_4OH/(NH_4)_2SO_4$ molar ratio 4, concentration of reductant 15g/l and feeding rate of silver ions solution 2 ml/min.

• Journal of Environmental Science International
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• v.18 no.2
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• pp.205-213
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• 2009

A laboratory experiment was conducted to investigate nitrogen removal from plating wastewater by a soil reactor. A combination of soil, waste oyster shell and activated sludge were used as a loading media in a soil reactor. The addition of 20% waste oyster shell and activated sludge to the soil accelerated nitrification (88.6% ${NH_4}^{+}-N$ removal efficiency) and denitrification (84.3% ${NO_3}^{-}-N$ removal) in the soil reactor, respectively. In continuous removal, the influent ${NH_4}^{+}-N$ was mostly converted to nitrate nitrogen in the nitrification soil reactor and only a small amount of ${NH_4}^{+}-N$ was found in the effluent. When methanol was added as a carbon source to the denitrification soil reactor, the average removal efficiency of ${NO_3}^{-}-N$ significantly increased. The ${NO_3}^{-}-N$ removal by methanol addition in the denitrification soil reactor was mainly due to denitrification. The phosphorus was removed by the waste oyster shell media in the nitrification soil reactor. Moreover, the phosphorus removal in the denitrification soil reactor was achieved by synthesis of bacteria and the denitrification under anaerobic conditions. The approximate number of nitrifiers and denitrifiers was $3.3{\times}10^5\;MPN/g$ soil at a depth of $1{\sim}10\;cm$ and $3.3{\times}10^6\;MPN/g$ soil at a depth of $10{\sim}20\;cm$, respectively, in the soil reactor mixed with a waste oyster shell media and activated sludge.

• Polymer(Korea)
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• v.24 no.5
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• pp.721-727
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• 2000

The electrolytic plating of a metallic nickel on carbon fiber surfaces was carried out to improve mechanical interfacial properties of carbon fiber/epoxy resin composites. The surface characteristics of carbon fibers and the mechanical interfacial properties of final composites were characterized by X-ray photoelectron spectroscopy (XPS) and interlaminar shear strength (ILSS), respectively. It was found that the electrolytic Ni-plating conditions significantly affected the degree of adhesion at interfaces between carbon fibers and epoxy resin matrix in a composite system. Especially, the increase of O,$_{1s}$/$C_{1s}$ ratio, production of NiO groups, and formation of metallic nickel on the nickel-plated carbon fiber surfaces led to an increase of the ILSS of the composites. Also, the ILSS of the composites was greatly correlated with the $O_{1s}$/$C_{1s}$ ratio of the carbon fibers treated in this work.is work.