• 제목/요약/키워드: Plasma display panels

검색결과 157건 처리시간 0.031초

Preparation of Novel Magnesium Precursors and MgO Thin Films Growth by Atomic Layer Deposition (ALD)

  • Kim, Hyo-Suk;park, Bo Keun;Kim, Chang Gyoun;Son, Seung Uk;Chung, Taek-Mo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.364.2-364.2
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    • 2014
  • Magnesium oxide (MgO) thin films have attracted great scientific and technological interest in recent decades. Because of its distinguished properties such as a wide band gap (7.2 eV), a low dielectric constant (9.8), a low refractive index, an excellent chemical, and thermal stability (melting point=$2900^{\circ}C$), it is widely used as inorganic material in diverse areas such as fire resistant construction materials, optical materials, protective layers in plasma display panels, buffer layers of multilayer electronic/photonic devices, and perovskite ferroelectric thin films. Precursor used in the ALD requires volatility, stability, and low deposition temperature. Precursors using a heteroleptic ligands with different reactivity have advantage of selective reaction of the heteroleptic ligands on substrate during ALD process. In this study, we have synethesized new heteroleptic magnesium precursors ${\beta}$-diketonate and aminoalkoxide which have been widely used for the development of precursor because of the excellent volatility, chelating effects by increasing the coordination number of the metal, and advantages to synthesize a single precursor. A newly-synthesized Mg(II) precursor was adopted for growing MgO thin films using ALD.

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PDP 보호막용 MgO 박막의 저전압 특성에 미치는 알카리토금속산화물 첨가 효과 (Effect of Alkaline Earth Metal Oxides addition on the Low-voltage Characteristics of MgO Films as a Protective layer for AC PDPs)

  • 조진희;김락환;김정열;이유기;김희재;박종완
    • 한국재료학회지
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    • 제9권5호
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    • pp.441-445
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    • 1999
  • Alkaline earth metal oxides were added to the conventional MgO films as a protective layer for dielectric materials to have lower firing voltage(Vf) of the plasma display panel(PDP). Panels with various protective layers of MgO-alkaline earth metal oxides were prepared on glass by using e-beam evaporation and its effect on firing voltage characteristics were investigated. (Ba-Mg)O films had poor voltage characteristics because of higher activation energy of BaO. But, (Sr-Mg)O, (Ca-Mg)O and (Ca-Sr-Mg) O had better voltage characteristics than the conventional MgO. A mixture film of (Mg-Ca-Sr)O show the lowest firing voltage which is less than that of MgO by 20V. The chemical composition to have lowest firing voltage is MgO:SrO:CaO ratio of 6:2:2. The mixture of MgO-Alkaline earth metal oxides films showed good transmittance properties within the visual range.

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High Efficiency Alternating Current Driver for Capacitive Loads Using a Current-Balance Transformer

  • Baek, Jong-Bok;Cho, Bo-Hyung;Park, Joung-Hu
    • Journal of Power Electronics
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    • 제11권1호
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    • pp.97-104
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    • 2011
  • This paper proposes a new alternating current driving method for highly capacitive loads such as plasma display panels or piezoelectric actuators, etc. In the proposed scheme, a current balance transformer, which has two windings with the same turn-ratio, provides not only a resonance inductance for energy recovery but also a current balance among all of the switching devices of the driver for current stress reduction. The smaller conduction loss than conventional circuits occurs due to the dual conduction paths which are parallel each other in the current balance transformer. Also, the leakage inductances of the transformer are utilized as resonant inductors for energy recovery by the series resonance to the capacitive load. Furthermore, the resonance contributes to the small switching losses of the switching devices by soft-switching operation. To confirm the validity of the proposed circuit, prototype hardware with a 12-inch mercury-free flat fluorescent lamp is implemented. The experimental results are compared with a conventional energy-recovery circuit from the perspective of luminance performances.

스마트폰 곡면 강화유리의 불량품 검사장치 설계 (Design for a Defective Product Inspection Device for the Curved Glass used in Smart-phones)

  • 김한솔;이경준;정동연;이연형;박재현;김갑순
    • 제어로봇시스템학회논문지
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    • 제21권8호
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    • pp.794-800
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    • 2015
  • This paper describes the design for a defective product inspection device for the curved glass used in smart-phone. Cameras are used as inspection devices to find cracks in LCDs (Liquid Crystal Displays), PDPs (Plasma Display Panels), etc. The devices used to inspect the curved glass used in smart-phone consist of a camera, two back-light apparatus, an inspection apparatus main body, and an image processing program. Camera image calibration was performed to smooth an image taken with the camera, and as a result, the average error was less than 0.12 pixels. And the image of a smart-phone's curved glass taken with the camera was processed using the produced program. As a result, the program could correctly extract the cracks on the curved glass. Thus, it is thought that the designed inspection device can successful detect cracks in curved tempered glass.

불평형 마그네트론 스파터링에 의해 형성된 MgO 박막의 micro 방전에 미치는 bias 전압의 영향에 관한 연구 (Effect of Bias Voltage on the Micro Discharge Characteristic of MgO Thin Film Prepared by Unbalanced Magnetron Sputtering)

  • 김영기;김인성;정주영;조정수;박정후
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2000년도 하계학술대회 논문집 C
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    • pp.2032-2034
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    • 2000
  • The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface slew discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the do bias voltage of -10V showed lower discharge voltage and lower erosion rate by ion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process.

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Fe2O3 첨가에 따른 AC PDP 보호막용 MgO 박막의 광학적.전기적 특성 (Effects of Fe2O3 Addition on Optical and Electrical Properties of MgO Films as a Protective Layer for AC PDPs)

  • 김창일;정영훈;이영진;백종후;최은하;정석;김정석
    • 한국전기전자재료학회논문지
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    • 제22권9호
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    • pp.760-765
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    • 2009
  • The effects of $Fe_2O_3$ addition on optical and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. Doped MgO films prepared by the e-beam evaporation have a higher ${\gamma}$ (secondary electron emission coefficient) than pure MgO protective layer. Roughness increased with amount of $Fe_2O_3$ up to 100 ppm and then decreased further addition. These results showed that discharge properties and optical properties of MgO protective layers seemed to be closely related with microstructure factors such as roughness. Good optical and electrical properties of ${\gamma}$ of 0.120, surface roughness of 14.1 nm and optical transmittance of 94.55% were obtained for the MgO + 100 ppm $Fe_2O_3$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

Gd2O3 첨가에 따른 AC PDP 보호막용 MgO 박막의 광학적.전기적 특성 (Effects of Gd2O3 Addition on Optical and Electrical Properties of MgO Films as a Protective Layer for AC PDPs)

  • 김창일;임은경;박용준;이영진;백종후;최은하;정석;김정석
    • 한국전기전자재료학회논문지
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    • 제20권7호
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    • pp.620-625
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    • 2007
  • The effects of $Gd_2O_3$ addition and sintering condition on optical and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. Doped MgO films prepared by the e-beam evaporation have a higher ${\Upsilon}$ (secondary electron emission coefficient) than pure MgO protective layer. Relative density and grain size increased with amount of $Gd_2O_3$ up to 100 ppm and then decreased further addition. These results showed that discharge properties and optical properties of MgO protective layers seemed to be closely related with microstructure factors such as relative density and grain size. Good optical and electrical properties of ${\Upsilon}$ of 0.138, surface roughness of 5.77 nm and optical transmittance of 95.76 % were obtained for the MgO+100 ppm $Gd_2O_3$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

Spatiotemporal Behavior of Excited Xenon Atom Density in Accordance with Xenon Mole Fraction to Neon and Helium in Alternating Current Plasma Display Panels by Laser Absorption Spectroscopy

  • Kim, Yong-Hee;Hong, Young-June;Oh, Phil-Yong;Cho, Guang-Sup;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.415-415
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    • 2010
  • 면방전 구조의 AC-PDP는 페닝 혼합 기체 중에서 Xe 플라스마에서 발생되는 VUV (Vacuum Ultra Violet) 에 의해 들뜬 형광체로부터 가시광이 발생된다. Xe 여기종은 828 nm의 공명준위를 거쳐 147 nm의 진공자외선을 방출하며 823 nm의 준안정준위에서 분자선을 거쳐 173 nm의 진공 자외선을 낸다. 이러한 Xe 여기종의 밀도를 측정하기 위해서는 828 nm와 823 nm의 레이저를 외부에서 인위적으로 조사하여 측정하면 IR (Infrared)의 흡수전과 흡수후의 빛의 세기로 Xe 여기종의 밀도 및 분포를 계산할 수 있다. 본 실험에서는 823 nm에 초점을 두었으며 LAS (Laser Absorption Spectroscopy) 기법을 통하여 He-Ne-Xe(15%, 20 %, 30%) 400Torr의 3종 기체의 Xe 함량에 따른 시공간의 Xe($1s_5$) 여기종 밀도 분포와 방전효율을 관측하였다. 최근 3전극 면방전형 AC-PDP 효율 향상을 위해 3종 기체의 Xe함량비의 방전기체에 대한 연구가 수행되고 있다. 이러한 기초 데이터는 혼합기체 조건에 따른 면방전 구조의 3전극 AC-PDP의 발광 효율을 개선하는 데 유용한 자료로 활용될 것이다.

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Influence of Sustain Voltage on Wall Charge and Wall Voltage Characteristics in AC-PDPs

  • Kim, T.Y.;Cho, T.S.;Kim, S.S.;Cho, D.S.;Kim, J.G.;Ahn, J.C.;Jung, Y.H.;Lim, J.Y.;Jung, J.M.;Ko, J.J.;Kim, D.I.;Lee, C.W.;Seo, Y.;Cho, G.S.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.119-120
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    • 2000
  • Influences of sustain voltage on wall charges and wall voltages are experimentally investigated in surface AC plasma display panels(AC-PDPs), in which electrode gap and width are $80\;{\mu}m$ and $270\;{\mu}m$, respectively. The filling gas is Ne-Xe gas mixture, and total pressures 300 Torr. Also it is found that the more amount of Xe mixing ratio makes the less wall charge and voltage for sustain voltage ranged from 140 V to 222 V. The response time has been delayed by adding a small amount of Xe to Ne in comparison with that without Xe. It is also found that the wall charge and voltage are reduced by adding a small amount of Xe to Ne in comparison with those without Xe.

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Effect of Additives on the Refractive Index of B2O3-SiO2-Al2O3 Glasses for Photolithographic Process in Electronic Micro Devices

  • Won, Ju-Yeon;Hwang, Seong-Jin;Lee, Jung-Ki;Kim, Hyung-Sun
    • 한국재료학회지
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    • 제20권7호
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    • pp.370-373
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    • 2010
  • In fabricating plasma display panels, the photolithographic process is used to form patterns of barrier ribs with high accuracy and high aspect ratio. It is important in the photolithographic process to control the refractive index of the photosensitive paste. The composition of this paste for photolithography is based on the $B_2O_3-SiO_2-Al_2O_3$ glass system, including additives of alkali oxides and rare earth oxides. In this work, we investigated the density, structure and refractive index of glasses based on the $B_2O_3-SiO_2-Al_2O_3$ system with the addition of $Li_2O$, $K_2O$, $Na_2O$, CaO, SrO, and MgO. The refractive index of the glasses containing K2O, Na2O and CaO was similar to that of the [BO3] fraction while that of the SrO, MgO and Li2O containing glasses were not correlated with the coordination fraction. The coordination number of the boron atoms was measured by MAS NMR. The refractive index increased with a decrease of molar volume due to the increase in the number of non-bridging oxygen atoms and the polarizability. The lowest refractive index (1.485) in this study was that of the $B_2O_3-SiO_2-Al_2O_3-K_2O$ glass system due to the larger ionic radius of $K^+$. Based on our results, it has been determined that the refractive index of the $B_2O_3-SiO_2-Al_2O_3$ system should be controlled by the addition of alkali oxides and alkali earth oxides for proper formation of the photosensitive paste.