Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2014.02a
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- Pages.364.2-364.2
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- 2014
Preparation of Novel Magnesium Precursors and MgO Thin Films Growth by Atomic Layer Deposition (ALD)
- Kim, Hyo-Suk (Thin Film Materials Research Group, Korea Research Institute of Chemical Technology) ;
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park, Bo Keun
(Thin Film Materials Research Group, Korea Research Institute of Chemical Technology) ;
- Kim, Chang Gyoun (Thin Film Materials Research Group, Korea Research Institute of Chemical Technology) ;
- Son, Seung Uk (Department of Chemistry and Department of Energy Science, Sungkyunkwan University) ;
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Chung, Taek-Mo
(Thin Film Materials Research Group, Korea Research Institute of Chemical Technology)
- Published : 2014.02.10
Abstract
Magnesium oxide (MgO) thin films have attracted great scientific and technological interest in recent decades. Because of its distinguished properties such as a wide band gap (7.2 eV), a low dielectric constant (9.8), a low refractive index, an excellent chemical, and thermal stability (melting point=