• 한국자기학회:학술대회 개요집
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• 한국자기학회 2013년도 자성 및 자성재료 국제학술대회
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• pp.89-89
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• 2013

Rare earth (RE) - transition metal based high energy density magnets are of immense significance in various engineering applications. $Nd_2Fe_{14}B$ magnets possess the highest energy product and are widely used in whole industries. Simultaneously, composite alloys that are cheap, cost effective and strong commercially available have drawn great attention, because rare-earth metals are costly, less abundant and strategic shortage. We designed rare-earth free alloys and fabrication process and developed novel route to prepare $Nd_2Fe_{14}B$ powders by wet process employing spray drying and reduction-diffusion (R-D) without the use of high purity metals as raw material. MnAl-base permanent magnetic powders are potentially important material for rare-earth free magnets. We have prepared the nano-sized MnAl powders by plasma arc discharge and micron-sized MnAl powders by gas atomization. They showed good magnetic property, compared with that from conventional processes. $Nd_2Fe_{14}B$ powders with high coercivity of more than 10 kOe were successfully synthesized by adjusting R-D step, followed by precise washing system. It is considered that this process can be applied for the recycling of RE-elements extracted from ewaste including motors.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2006년도 하계종합학술대회
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• pp.569-570
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• 2006

Effects of the evaporation rate of MgO films using electron beam were investigated on the MgO properties and the discharge characteristics of the plasma display panel (PDP). The evaporation rate was changed from $3{\AA}$/sec to $15{\AA}$/sec at a substrate temperature of $300^{\circ}C$. MgO properties such as crystal orientation, surface roughness, contact angle, and film structure were inspected using XPS, AFM, drop shape analysis and SEM. We also studied the relation between MgO properties and PDP discharging characteristics. The minimum firing voltage and maximum efficacy were obtained at evaporation rate of $5{\AA}$/sec. In the MgO film deposited at $5{\AA}$/sec, (200) orientation was most intensive and surface roughness was minimum.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.687-690
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• 2009

It has been recently reported that nano-sized MgO single crystal powders emit ultraviolet by stimulation of electrons under vacuum condition. Therefore, in this study, nano-crystalline MgO powders were applied to a xenon plasma flat fluorescent lamp for LCD backlight to improve emission efficiency of the lamp by help of extra ultraviolet from nano-MgO. For comparison with nano-crystalline MgO powders, MgO nano-thin film was applied directly on phosphors inside a lamp panel through e-beam evaporation The luminance and efficiency of FFL with an addition of MgO nano-crystal powders on phosphors were improved by around 20%. Application of MgO thin film to phosphors worsened the emission characteristics of FFLs, even rather than FFL without MgO. The reason came from insufficient stimulation of phosphors by UV, crystallinity of MgO, and low secondary electron coefficient.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 하계학술대회 논문집 C
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• pp.2050-2052
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• 2000

In this paper, the effect of $O_2$ concentration on NO removal and $NO_2$ generation by corona discharge from simulated flue gas was measured and estimated for the wire-plate reactor. $NO_2$ removal rate was 0$\sim$30[%] under about 3.4[%] of oxygen concentration, however, it was difficult to remove NOx over 3.4[%] of oxygen concentration. It may be due to generate $NO_2$ from $N_2$ and $O_2$ molecules and converse NO to $NO_2$ by 0 and $O_3$. Magnetic field applied to electric field in plasma was very effective for NOx removal under 2[%] of $O_2$ concentration.

• 한국전기전자재료학회논문지
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• 제22권9호
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• pp.760-765
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• 2009

The effects of $Fe_2O_3$ addition on optical and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. Doped MgO films prepared by the e-beam evaporation have a higher ${\gamma}$ (secondary electron emission coefficient) than pure MgO protective layer. Roughness increased with amount of $Fe_2O_3$ up to 100 ppm and then decreased further addition. These results showed that discharge properties and optical properties of MgO protective layers seemed to be closely related with microstructure factors such as roughness. Good optical and electrical properties of ${\gamma}$ of 0.120, surface roughness of 14.1 nm and optical transmittance of 94.55% were obtained for the MgO + 100 ppm $Fe_2O_3$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

• 한국진공학회지
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• 제7권4호
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• pp.410-414
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• 1998

본 연구에서는 플라즈마 중합 반응의 기판 재질과 전극 위치에 대한 의존성을 규명 하기 위해서 Ar방전의 발광 분석을 행하였으며 제작된 박막의 가교성을 확인하기 위해서 전자빔 노광을 시켜보았다. 기판의 재질이 도체 및 절연체인 양자의 경우를 비교해 보면 전 자는 후자에 비해서 전체적으로 발광 스펙트럼의 피이크 강도가 크게 나타났으며, 준안정상 태에 대한 피이크와 이온에 대한 피이크를 검토한 결과, 기판이 절연물일 때는 전극의 위치 를 멀게 할수록 이온의 피이크 강도가 극단까지 떨어짐을 알 수 있었다. 제작된 중합스티렌 박막을 통하여 발광 스펙트럼의 변화에 따라서 막의 가교성 변화가 생기는 것을 알 수 있었 으며 이 막을 전자빔에 노광하였을 때, 기판이 절연물인 경우에는 패턴을 제작하는 것이 가 능하였다.

• Transactions on Electrical and Electronic Materials
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• 제5권1호
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• pp.11-14
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• 2004

An rf triode magnetron sputtering system is designed and installed its construction in vacuum chamber. In order to calibrate the rf triode magnetron sputtering for thin films deposition processes, the effects of different glow discharge conditions were investigated in terms of the deposition rate measurements. The basic parameters for calibrating experiment in this sputtering system are rf power input, gas pressure, plasma current, and target-to-substrate distance. Because a knowledge of the deposition rate is necessary to control film thickness and to evaluate optimal conditions which are an important consideration in preparing better thin films, the deposition rates of copper as a testing material under the various sputtering conditions are investigated. Furthermore, a triode sputtering system designed in our team is simulated by the SIMION program. As a result, it is sure that the simulation of electron trajectories in the sputtering system is confined directly above the target surface by the force of E${\times}$B field. Finally, some teats with the above 4 different sputtering conditions demonstrate that the deposition rate of rf triode magnetron sputtering is relatively higher than that of the conventional sputtering system. This means that the higher deposition rate is probably caused by a high ion density in the triode and magnetron system. The erosion area of target surface bombarded by Ar ion is sputtered widely on the whole target except on both magnet sides. Therefore, the designed rf triode magnetron sputtering is a powerful deposition system.

• 한국전기전자재료학회논문지
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• 제17권7호
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• pp.738-746
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• 2004

Recently zinc oxide(ZnO) has emerged as one of the most promising transparent conducting films with a strong demand of low cost and high performance optoelectronic devices, ZnO film has many advantages such as high chemical and mechanical stabilities, and abundance in nature. In this paper, in order to obtain the excellent transparent conducting film with low resistivity and high optical transmittance for Plasma Display Pannel(PDP), aluminium doped zinc oxide films were deposited on Corning glass substrate by dc magnetron sputtering method. The effects of the discharge power and doping amounts of $Al_2$$O_3$ on the electrical and optical properties were investigated experimentally. Particularly in order to lower the electrical resistivity, positive and negative bias voltages were applied on the substrate, and the effect of bias voltage on the electrical properties of ZnO:Al thin film were also studied and discussed. Films with lowest resistivity of $4.3 \times 10 ^{-4} \Omega-cm$ and good transmittance of 91.46 % have been achieved for the films deposited at 1 mtorr, $400^{\circ}C$, 40 W, Al content of 2 wt% with a substrate bias of +30 V for about 800 nm in film thickness.

• 한국전기전자재료학회논문지
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• 제20권7호
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• pp.620-625
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• 2007

The effects of $Gd_2O_3$ addition and sintering condition on optical and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. Doped MgO films prepared by the e-beam evaporation have a higher ${\Upsilon}$ (secondary electron emission coefficient) than pure MgO protective layer. Relative density and grain size increased with amount of $Gd_2O_3$ up to 100 ppm and then decreased further addition. These results showed that discharge properties and optical properties of MgO protective layers seemed to be closely related with microstructure factors such as relative density and grain size. Good optical and electrical properties of ${\Upsilon}$ of 0.138, surface roughness of 5.77 nm and optical transmittance of 95.76 % were obtained for the MgO+100 ppm $Gd_2O_3$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2007년도 제38회 하계학술대회
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• pp.1406-1407
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• 2007

본 논문에서 제안한 ac-PDP(Plasma display panel) 셀구조는 Long gap의 전극 사이에 보조 전극을 삽입한 구조이다. 일반적으로, long gap 구조를 가진 PDP cell은 높은 방전 개시 전압을 가지므로, Long gap 전극 사이에 보조전극을 삽입하여 방전 개시 전압을 낮춤과 동시에 휘도 상승, 소비 전력의 감소효과로 발광효율의 향상을 가져왔다. 제안한 구조의 구동을 위하여 asymmetric mode와 long gap mode라는 2가지 파형을 가지고 실험하였다. 두 파형은 공통적으로 기존의 ADS(Address and Display period Separated)파형을 Y(Scan), Z(Common), A(Address) 전극에 인가하였으며, 보조적극에는 Z(Common) 전극의 파형을 수정한 형태로 인가하였다. Asymmetric mode는 보조전극에 Z(Common) 전극에 인가되는 파형과 같은 형태의 파형을 인가하여 Long gap의 구조를 가지지만 Short gap에서 방전이 가능하도록 설계하였고, long gap mode는 보조전극에 인가되는 Z(Common) 파형 중 sustain pulse를 초기 3개만을 주어 Short gap에서 방전을 개시함과 동시에 priming 입자를 생성하고, 나머지 sustain 구간에서는 floating시켜 이미 생성된 priming 입자를 long gap에서 구동을 가능하도록 하였다.