• Title/Summary/Keyword: PZT Thin Films

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Studies on the Deformation in the Hysteresis Loop of $Pb(Zr,Ti)O_3$ Ferroelectric Thin Films ($Pb(Zr,Ti)O_3$ 강유전체 박막 이력곡선의 변형에 관한 연구)

  • Lee, Eun-Gu;Lee, Jong-Guk;Lee, Jae-Gap;Kim, Seon-Jae
    • Korean Journal of Materials Research
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    • v.10 no.5
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    • pp.360-363
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    • 2000
  • Deformation in the hysteresis loop of $Pb(Zr,Ti)O_3$ (PZT) thin films with various Zr/Ti ratios has been studied by varying the top electrode preparation method and the annealing temperature. Pt/PZT/Pt capacitors was found to be positively poled due to dc plasma potential generated during reactive ion etch (RIE) of Rt. Internal field is formed by space charges trapped at domain boundaries. Aging phenomenon such as constriction in the middle of the hysteresis loop was observed in the PZT film with top electrode deposited by sputtering. Top electrode annealing restores the hysteresis loop by removing the space charges. As Zr/Ti ratio decrease, voltage shift increases and an-nealing temperature at which internal field disappears also increases.

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Fatigue Characteristics of PZT Thin Films Deposited by ECR-PECVD

  • Chung, Su-Ock;Lee, Won-Jong
    • Transactions on Electrical and Electronic Materials
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    • v.6 no.4
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    • pp.177-185
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    • 2005
  • Fatigue characteristics of lead zirconate titanate (PZT) films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) were investigated. The fatigue characteristics were investigated with respect to PZT film thickness, domain structure, fatigue pulse height, temperature, electrode materials and electrode configurations. The used top and bottom electrode materials were Pt and $RuO_2$. In the fatigue characteristics with fatigue pulse height and PZT film thickness, the fatigue rates are independent of the applied fatigue pulse height at the electric field regions to saturate the P-E hysteresis and polarization $(P^*,\;P^A)$ characteristics. The unipolar and bipolar fatigue characteristics of PZT capacitors with four different electrode configurations $(Pt//Pt,\;Pt//RuO_2,\;RuO_2//Pt,\;and\;RuO_2//RuO_2)$ were also investigated. The polarization-shifts during the unipolar fatigue and the temperature dependence of fatigue rate suggest that the migration of charged defects should not be expected in our CVD-PZT films. It seems that the polarization degradations are attributed to the formation of charged defects only at the Pt/PZT interface during the domain switching. The charged defects pin the domain wall at the vicinity of Pt/PZT interface. When the top and bottom electrode configurations are of asymmetric $(Pt//RuO_2,\;RuO_2//Pt)$, the internal fields can be generated by the difference of charged defect densities between top and bottom interfaces.

Preparation of Ferroelectric PZT thin films by Sol-Gel processing (Sol-Gel법에 의한 강유전체 PZT 박막의 제작)

  • Lee, B.S.;You, D.H.;Shin, T.H.;Cho, K.S.;Yuk, J.H.;Kim, Y.H.;Kim, H.G.;Ji, S.H.;Lee, D.C.
    • Proceedings of the KIEE Conference
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    • 2000.07c
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    • pp.1685-1686
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    • 2000
  • Crack-free and homogeneous com ceramic and epitaxial lead zirconate titanat ferroelectric thin films with perovskite structure been prepared by sol-gel processing. Ti-isoprop and lead acetate trihydrate and zirconium-pro are used raw materials. EAcAc is used as a cat 2-Methoky ethanol is used as a solvent annealing temperatures of the thin films are 0$^{\circ}C$.

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Effect of Dry Process on Dielectric Properties of PZT Thin Films Prepared by Sol-Gel Process

  • Bae, Min-Ho;Lim, Kee-Joe;Kim, Hyun-Hoo;No, Kwang-soo
    • Transactions on Electrical and Electronic Materials
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    • v.3 no.1
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    • pp.42-45
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    • 2002
  • Properties of lead zirconate titanate ferroelectric thin films prepared by rapid thermal annealing/direct insertion thermal annealing were investigated. The remnant polarization (Pr), saturation polarization (Ps), and coercive force (Ec) of typical samples annealed by rapid thermal annealing (RTA) are about 13.7 $\mu$ C/cm$^2$, 27.1 $\mu$C/cm$^2$, and 55.6 kV/cm, respectively. The dielectric constant of the sample is about 786, the dielectric loss tangent is about 2.4% at 1 kHz. Furthermore, ferroelectric, conduction, and piezoelectric properties of the thin films annealed by RTA process and the direct insertion thermal annealing (DITA) process were compared. The influence of temperature in the dry process on the above properties was also investigated.

LTCC기판상에 성장시킨 PZT박막의 열처리 특성연구

  • Lee, Gyeong-Cheon;Hwang, Hyeon-Seok;U, Hyeong-Gwan;Lee, Tae-Yong;Heo, Won-Yeong;Sim, Deung;Song, Jun-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.117-117
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    • 2009
  • Recently, low temperature co-fired ceramic (LTCC) technology has gained a remarkable application potential in sensors, actuators and microsystems fields. In this study, we investigated the effects of annealing treatment on the electrical properties of $Pb(ZrTi)O_3$ (PZT) thin films deposited on LTCC substrate. The LTCC substrates with thickness of 400 ${\mu}m$ were fabricated by laminating 12 green tapes which consist of alumina and glass particle in an organic binder. The PZT thin films were deposited on Au/LTCC substrates by RF magnetron sputtering method. Then, the change of the crystallization of the films was investigated under various annealing temperatures. The results showed that the crystallization of the films were enhanced as increasing annealing temperatures. The film, annealed at $700^{\circ}C$, 3min, was well crystallized in the ferovskite structure. The structural variation of the films were analyzed by using X-Ray diffraction (XRD) and field emmision scanning electron microscopy (FESEM).

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Effect of Prefiring Time on Epitaxy and crystallinity of Pb(Zr, Ti)O$_3$ Thin Films in Low Temperature Pyrolysis (저온도포열분해에 의해 제조된 Pb(Zr, Ti)O$_3$ 박막의 에피탁시와 결정화도에 미치는 전열처리 시간의 영향)

  • 황규석;이형민;김병훈
    • Journal of the Korean Ceramic Society
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    • v.35 no.9
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    • pp.969-973
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    • 1998
  • Pb(Zr, Ti)O3 (PZT) (Zr:Ti= 52: 48) thin films were prepared on MgO(100) substrates by dipping-py-rolysis process using metal naphthenates as starting materials. Thin films were fabricated by spin coating technique and the precursor films were prefired at 20$0^{\circ}C$ in air for 0.5, 1, 2, 3, and 24 h followed by final heat treatment at 75$0^{\circ}C$ for 30min. Film prefired for 24 h lost orientational properties and pole figure analysis showed the lost of the epitaxial relationship between the films and substrate while highly a/c-axis oriented thin films were obtained for the samples prefired for 1, 2, and 3h.

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Comparison of retention characteristics of ferroelectric capacitors with $Pb(Zr, Ti)O_3$ films deposited by various methods for high-density non-volatile memory.

  • Sangmin Shin;Mirko Hofmann;Lee, Yong-Kyun;Koo, June-Mo;Cho, Choong-Rae;Lee, June-Key;Park, Youngsoo;Lee, Kyu-Mann;Song, Yoon-Jong
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.3 no.3
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    • pp.132-138
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    • 2003
  • We investigated the polarization retention characteristics of ferroelectric capacitors with $Pb(Zr,Ti)O_3$ (PZT) thin films which were fabricated by different deposition methods. In thermally-accelerated retention tests, PZT films which were prepared by a chemical solution deposition (CSD) method showed rapid decay of retained polarization charges as the thickness of the films decreased down to 100 nm, while the films which were grown by metal organic chemical vapor deposition (MOCVD) retained relatively large non-volatile charges at the corresponding thickness. We concluded that in the CSD-grown films, the thicker interfacial passive layer compared with the MOCVD-grown films had an unfavorable effect on retention behavior. We observed the existence of such interfacial layers by extrapolation of the total capacitance with thickness of the films and the capacitance of these layers was larger in MOCVD-grown films than in CSD-grown films. Due to incomplete compensation of surface polarization charges by the free charges in the metal electrodes, the interfacial field activated the space charges inside the interfacial layers and deposited them at the boundary between the ferroelectric layer and the interfacial layer. Such space charges built up an internal field inside the films, which interfered with domain wall motion, so that retention property at last became degraded. We observed less imprint which was a result of less internal field in MOCVD-grown films while large imprint was observed in CSD-grown films.

Fabrication and Characteristic Analysis of Piezoelectric Micro-Transformer (초소형 마이크로 압전변압기 제작 및 특성 분석)

  • Kim Seong-Kon;Seo Young-Ho;Choi Doo-Sun;Whang Kyung-Hyun
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.469-470
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    • 2006
  • Piezoelectric transformers based on lead zirconate titanate(PZT) have been received considerable interest because of their wide potential applications in transformer, oscillator, resonance sensor, actuator, acoustic transducer, as well as active slider for hard disk drives. However, for the applications which need a small power supply such as thin and flat displays, micro-robot, micro-system, it is especially necessary to integrate the passive components because they typically need more than 2/3 of the space of the conventional circuit. So, we have fabricated the piezoelectric micro-transformer to supply energy for micro-systems using PZT thin films and MEMS technologies.

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A Study on the Dielectric Properties of Ferroelectric Materials (강유전체의 유전율 특성에 관한 연구)

  • Cho, Ik-Hyun;Park, Young;Jeong, Kyu-Won;Jung, Se-Min;Yi, Jun-Sin;Song, Jun-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.11a
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    • pp.287-290
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    • 1998
  • It was investigated that the dielectric properties of ferroelectric materials using PZT-5A and PZT thin films. PZT-5A was 20mm diameters, 0.71mm, 0.51mm and 0.41mm thickness respectively and having c-axis preferred orientation. Electrodes(Al) were deposited by evaporation method. PZT thin film was deposited on Pt/SiO$_2$/Si substrate by RF magnetron sputtering method, and annealed at 750$^{\circ}C$ with RTA. Dielectric constants were measured automatically by computer measuring system. Dielectric constants were changed rapidly from 817 to 888 in 0.41mm thickness PZT-5A, 823 to 890 in 0.51mm and 822 to 839 in 0.71mm as the electric field grown. In the case of PZT thin film, dielectric constants were changed from 724 to 1173 in 4500${\AA}$ thickness, 721 to 1204 in 5500${\AA}$ thickness and 811 to 1407 in 7000${\AA}$ thickness.

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Fabrication of PZT Film by a Single-Step Spin Coating Process

  • Oh, Seung-Min;Kang, Min-Gyu;Do, Young-Ho;Kang, Chong-Yun;Nahm, Sahn;Yoon, Seok-Jin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.193-193
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    • 2011
  • To obtain ceramic films, the sol-gel coating technique has been broadly used with heat treatment, but crack formation tend to occur during heat treatment in thick sol-gel films. We prepared PZT thin films by sol-gel method with single-step spin coating process. The PZT solution have been synthesized using lead acetate ($Pb(CH_3COO)_2$), zirconium acetylacetonate ($Zr(OC_3H_7^n)_4$), and titanium diisopropoxide bis(acetylacetonate) 75wt% in isopropanol ($Ti(OC_3H_7^i)_2(OC_3H_7^n)_2$) as starting materials and n-propanol was selected as a solvent. The poly(vynilpyrrolidone) (PVP) was added with 0, 0.25, 0.5, 0.75, and 1 molar ratios to control viscosity of solution. We investigated influence of the viscosity on thickness, microstructure, and electrical properties of final PZT films. Thermo-gravimetric analysis and differential scanning calorimeter (TGA/DSC) was carried out from room temperature to $800^{\circ}C$ in order to measure pyrolysis temperature. Structural characteristics were analyzed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Ferroelectric and dielectric properties were measured by RT66A (Radiant) and impedance analyzer (Agilent), respectively. The thicknesses of PZT films depended on incorporation of an excess amount of PVP. Finally, we obtained PZT films of good quality without crack formation via single-step spin coating.

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