• 전자공학회논문지A
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• 제32A권12호
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• pp.101-107
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• 1995

To improve the leakage current, we developed two step sputtering method where PZT thin film in first deposited at room temperature followed by 600.deg. C deposition. The method used an amorphous PZT layer deposited at room temperature to keep a stable interface during sputtering at high temperature. PZT thin films were deposited on Pt/Ti/SiO$_{2}$/Si substrate at room temperature and 600.deg. C sequentially. The effect of the layer deposited at room temperature was investigated with regard to I-V characteristics and P-E hysteresis loop. In the case of the sample with the layer deposited at room temperature, both leakage current and dielectric constant were decreased. The thicker the layer deposited at room temperature was, the lower dielectric constant was. However, leakage current was indepenent of the variation of the thickness ratio. The sample with 200$\AA$ of the layer deposited at room temperature showed the most promising results in both dielectric constant and leakage current.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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• pp.93-96
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• 2002

In this study, PZT thin films were fabricated using sol-gel processing onto Si/$SiO_2$/Ti/Pt substrates. PZT sol with different Zr/Ti ratio(20/80, 30/70, 40/60, 52/48) were prepared, respectively. The films were fabricated by using the spin-coating method on substrates. The films were heat treated at $450^{\circ}C$, $650^{\circ}C$ by rapid thermal annealing(RTA). The preferred orientation of the PZT thin films were observed by X-ray diffraction(XRD), and Scanning electron microscopy(SEM). All of the resulting PZT thin films were crystallized with perovskite phase. The fine crystallinity of the films were fabricated. Also, we found that the ferroelectric properties from the dielectric constant of the PZT thin films were over 600 degrees, P-E hysteresis constant. And the leakage current densities of films were lower than $10^{-8}A/cm^2$. It is concluded that the PZT thin films by sol-gel process to be convinced of application for ferroelectric memory device.

• E2M - 전기 전자와 첨단 소재
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• 제9권10호
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• pp.1053-1059
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• 1996

The pulse-echo response of the piezoceramics PZT-polymer 3-3 type composite transducers with various PVA additions were investigated. The PZT powder was prepared by the molten salt synthesis method. The porous PZT specimens will be used as a filler to make 3-3 type comosite were prepared from a mixture of PZT and polyvinylalcohol(PVA) sphere by utilizing BURPS(Bumout Plastic Sphere) technique. It was shown that the transmitting and receiving sensitivity of 3-3 type piezoelectric composite transducers could be improved than that of solid PZT transducers. The reason is that 3-3 type piezoelectric composite have low dielectric constant, density and acoustic impedance. The distance between transducer and reflector was in good agreement with the distance calculated from the longitudinal velocity of the specimens and receiving time observed pulse-echo responses on the ultrasonic transducer analyzer.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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• pp.1418-1419
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• 2006

PZT(80/20) powder was prepared by a sol-gel method and PZT thick films were fabricated by the screen-printing method on the alumina substrates. The coating and drying procedure was repeated 4 times. And then the PZT(20/80) precursor solution was spin-coated on the multilayered thick films. A concentration of a coating solution was 0.5 mol/L and the number of coating was repeated from 0 to 6. The porosity of the thick films was decreased with increasing the number of coatings and the PZT thick films with 6-times coated showed the dense microstructure and thickness of about 60-65 ${\mu}m$. All PZT thick films showed the typical XRD patterns of a typical perovskite polycrystalline structure. The relative dielectric constant and the dielectric loss of the PZT-6 thick film were 275 and 3.5, respectively. And the PZT-6 film shows the remanent polarization of 22.1 $C/cm^2$ and coercive field of 13.7 kV/cm.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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• pp.51-54
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• 2003

Tb-doped lead zirconate titanate($Pb_{1.1}(Zr_{0.6}Ti_{0.4})O_3$; PZT) thin films on $Pt(111)/Ti/SiO_2/Si(100)$ substrates prepared by a sol-gel method. Films have a Zr/Ti ratio of 60:40 and perovskite phase structure. The effect on the structural and electrical properties of films measured according to Tb content. Dielectric and ferroelectric properties of PZT thin films were altered significantly by Tb-doping. The PZT thin film with higher dielectric constant and improved leakage current characteristic was obtained by adding 0.3 mol% Tb. At 100 kHz, the dielectric constant and the dielectric loss of the 0.3 mol% Tb-doped PZT thin film were 1611 and 0.24, respectively The remanent polarization(2Pr) of the 0.3 mol% Tb-doped PZT thin film was $61.4\;{\mu}C/cm^2$ and the coercive field was 61.9 kV/cm. Tb-doped PZT thin films showed improved fatigue characteristics comparing to the undoped PZT thin film.

• 마이크로전자및패키징학회지
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• 제22권4호
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• pp.83-89
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• 2015

본 논문에서는 졸-침투와 직접-패턴 공정을 이용하여 향상된 압전 후막의 전기적 특성과 우수한 패터닝 특성을 동시에 만족할 수 있는 제작 방법을 제시한다. 저온(< $850^{\circ}C$) 공정 후 후막의 고밀도 및 직접-패턴의 목적을 달성하기 위해서, 감광성 티탄산 지르콘산 연 ($Pb(Zr,Ti)O_3$, PZT) 졸을 스크린인쇄된 PZT 후막 내부로 침투시켰다. 직접-패턴된 PZT막은 포토크롬마스크와 UV 조사에 의해서 일정한 간격으로 인쇄된 후막 위에 성공적으로 형성되었다. 스크린인쇄된 후막은 분말형태의 기공성 구조를 갖고 있어 조사된 UV빛이 산란되기 때문에, 감광성 졸-침투 공정을 할 때 PZT 후막의 특성을 증가시키기 위한 공정의 최적화가 필요하다. 침투된 감광성 PZT 졸의 농도, 조사된 UV 시간 및 용매 현상 시간을 최적화한 결과, 0.35 M의 PZT 농도, 4 분의 UV 조사시간과 15 초의 용매 현상시간으로 졸-침투된 PZT 후막은 $800^{\circ}C$ 소결 온도에서 입자들의 성장에 의해 치밀화 정도가 증가되었다. 또한 PZT후막의 강유전 특성(잔류분극 및 항복 전압)도 향상되었다. 특히 잔류분극값은 스크린인쇄된 후막보다 약 4배정도 증가되었다. 이렇게 제작된 후막은 어레이타입의 압전형 마이크로미터크기의 센서 및 액츄에이터 등에 응용 가능성을 제시할 수 있었다.

• 한국결정성장학회지
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• 제30권5호
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• pp.183-188
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• 2020

에어로졸 증착법에 의해서 상온에서 5~10 ㎛ 두께의 PZN-PZT(0 %, 20 %, 40 %) 복합체의 막을 실리콘/사파이어 기판 위에서 제조하였다. PZN의 농도는 0 %, 20 % 및 40 %까지 첨가하였다. 실리콘기판 및 사파이어 기판 위에서 증착된 막은 전기로에서 700℃ 및 900℃에서 각각 어닐링처리 하였으며 900℃에서 어닐링한 경우의 잔류분극 및 유전 상수 등의 전기적 특성이 700℃에서의 특성보다 우수하였다. 특히 900℃에서 어닐링한 2PZN-8PZT 막의 경우 1200℃에서 소결한 같은 조성의 벌크재에서 얻은 값과 상호 비교하였다. 열처리 온도가 높아짐에 따라 유전상수가 증가하는 경향을 보이는데 이는 후열처리에 따른 막의 결정성의 향상과 입자 성장으로 기인한다.

• 한국결정성장학회지
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• 제25권6호
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• pp.239-244
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• 2015

에어로졸 증착법에 의해 실리콘 기판위에 $10{\sim}20{\mu}m$의 두께를 가진 PZT 후막을 제조한 후 $700^{\circ}C$에서 어닐링처리하였다. PZT 분말에 의해 제조된 막은 임피던스 분석기(impedance analyzer)와 쇼여-타워 서킷(Sawyer-Tower circuit)으로 분석하였다. PZT 분말은 통상적인 고상반응법 및 솔-젤 법으로 준비되었다. 고상반응법으로 만들어진 분말을 사용한 $10{\mu}m$ 두께 PZT 막의 잔류분극, 항전계 및 유전상수는 각각 $20{\mu}C/cm^2$, 30 kV/cm 그리고 1320이었다. 한편 솔-젤 법으로 제조된 분말을 사용한 경우의 유전상수는 635로 비교적 낮은 값을 나타낸다. 이는 어닐링시 생기는 발생하는 유기물에 의한 기공의 존재 때문이다.

• 한국결정성장학회지
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• 제7권2호
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• pp.309-314
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• 1997

Ag-Pd/$Al_2O_3$와 Pt 기판에 스핀온 방법으로 제조된 PZT 후막의 열처리 방법에 따른 전기적 특성을 조사하였다. 전기적 특성을 측정하기 위하여 상부전극으로 은(Ag)을 PZT표면에 충착하였다. 이렇게 만들어진 PZT 후막의 결정구조는 X-ray로 조사하였으며, 유전상수는 HP4284A를 사용하여 1 KHz, 10 mV에서 측정하였다. 또한 유전계수는 Berlincourt 피에조메터를 사용하여 측정하였다. 그 결과 3 wt% PbO가 첨가된 PZT 후막의 전기적 특성은 오히려 감소하였으며, Ag-Pd 전극은 Pt 전극을 대체할 수 있는 가능성이 매우 높았다. 특히 스핀온 방법으로 제조된 PZT 후막을 급속열처리(RTA)를 함으로써 전기적 특성을 크게 향상시킬 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집
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• pp.177-180
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• 2002

Thickness dependence of crystallographic orientation of diol based sol-gel derived PZT(52/48) films on dielectric and piezoelectric properties was investigated The thickness of each layer by one time spinning was about 0.2 $\mu\textrm{m}$, and crack-free films was successfully deposited on 4 inches Pt/Ti/SiO$_2$/Si substrates by 0.5 mol solutions in the range from 0.2 $\mu\textrm{m}$ to 3.8 $\mu\textrm{m}$. Excellent P-E hysteresis curves were achieved without pores or any defects between interlayers. As the thickness increased , the (111) preferred orientation disappeared from 1$\mu\textrm{m}$ to 3 $\mu\textrm{m}$ region, and the orientation of films became random above 3 $\mu\textrm{m}$. Dielectric constants and longitudinal piezoelectric coefficient d$\_$33/, measured by pneumatic method were saturated around the value of about 1400 and 300 pC/N respectively above the thickness of 0.8 7m. A micromachined piezoelectric cantilever have been fabricated using 0.8 $\mu\textrm{m}$ thickness PZT (52/48) films. PZT films were prepared on Si/SiN$\_$x/SiO$_2$/Ta/Pt substrate and fabricated unimorph cantilever consist of a 0.8 fm thick PZT layer on a SiNx elastic supporting layer, which becomes vibration when ac voltage is applied to the piezoelectric layer. The dielectric constant (at 100 kHz) and remanent polarization of PZT films were 1050 and 25 ${\mu}$C/$\textrm{cm}^2$, respectively. Electromechanical characteristics of the micromachined PZT cantilever in air with 200-600 $\mu\textrm{m}$ lengths are discussed in this presentation.