• 제목/요약/키워드: Oxide Semiconductor

검색결과 1,419건 처리시간 0.027초

고이동도 산화물 반도체 박막 트랜지스터 구현을 위한 구동전류 향상 (A Review : Improvement of Operation Current for Realization of High Mobility Oxide Semiconductor Thin-film Transistors)

  • 장경수;;김태용;강승민;이소진;;;이윤정;이준신
    • 한국전기전자재료학회논문지
    • /
    • 제28권6호
    • /
    • pp.351-359
    • /
    • 2015
  • Next-generation displays should be transparent and flexible as well as having high resolution and frame number. The main factor for active matrix organic light emitting diode and next-generation displays is the development of TFTs (thin-film transistors) with high mobility and large area uniformity. The TFTs used for transparent displays are mainly oxide TFT that has oxide semiconductor as channel layer. Zinc-oxide based substances such as indium-gallium-zinc-oxide has attracted attention in the display industry. In this paper, the mobility improvement of low cost oxide TFT is studied for fast operating next-generation displays by overcoming disadvantages of amorphous silicon TFT that has low mobility and poly silicon TFT that requires expensive equipment for complex process and doping process.

폐슬러지를 이용한 SiC 합성에 관한 열역학적 고찰 (Thermodynamic Consideration for SiC synthesis by Using Sludged Silicon Powder)

  • 최미령;김영철
    • 반도체디스플레이기술학회지
    • /
    • 제2권1호
    • /
    • pp.21-24
    • /
    • 2003
  • Sludged silicon powders that are generated during silicon ingot slicing process have potential usage as silicon source in fabricating silicon carbide powders by adding carbon. A thermodynamic calculation is performed to consider a plausible formation condition for the silicon carbide powders. A thin silicon oxide layer around silicon powder is sufficient to supply equilibrium oxygen partial pressure at the formation temperature($1400^{\circ}C$) of the silicon carbide in the Si-C-O ternary system. Formation of silicon carbide by using the sludged silicon powders is more efficient than by using silicon oxide powders.

  • PDF

산화물반도체 트랜지스터의 전기적인 특성 (Semiconductor Engineering)

  • 오데레사
    • 한국정보통신학회:학술대회논문집
    • /
    • 한국정보통신학회 2013년도 추계학술대회
    • /
    • pp.390-392
    • /
    • 2013
  • 본 논문에서는 투명디스플레이를 구현하기 위해 가장 주목받는 ZnO 계열의 산화물반도체의 특성에 대하여 관찰하였다. 알에프 마그네트론 스퍼터링에 의해 증착된 산화물 반도체의 광학적 특성으로부터 전기적인 신호 동작특성의 상호관계를 알아보았다. 박막내의 결합 혹은 불순물이 증가할수록 PL 특성은 장파장 특성이 우세하게 나타났다. SiOC 박막위에서는 에너지 밴드갭이 증가하면서 단파장 특성이 우세하게 나타났다. 트랜지스터의 특성은 기판의 의존도가 높게 나타났다.

  • PDF

TiO2-Nb2O5 반도체 산화물을 이용한 염료 감응 태양전지 특성개선연구 (A Study on the Characteristics of TiO2-Nb2O5 Semiconductor Oxides Using Dye-Sensitized Solar Cell)

  • 김해마로;이돈규
    • 전기전자학회논문지
    • /
    • 제23권2호
    • /
    • pp.538-542
    • /
    • 2019
  • 광 전환 효율에 관여하는 $TiO_2$와 같은 반도체 산화물은 염료 감응 태양전지(Dye-sensitized solar cell, DSSC)의 주요 요소이며, 효율을 개선하기 위해 서로 다른 반도체 산화물을 혼합하여 Pastes를 제조해 사용하는 연구가 이루어지고 있다. 본 연구에서는 $TiO_2-Nb_2O_5$ 혼합 반도체 산화물을 제조하여 염료 감응 태양전지의 특성을 분석하였다. 혼합 반도체 산화물이 광 전환 효율에 미치는 전기적인 특성을 분석하기 위해서 $Nb_2O_5$을 서로 다른 비율로 첨가하여 태양전지를 제작하였다. 이에 $Nb_2O_5$가 첨가됨에 따라 전해질과의 접촉에 의한 재결합 현상보다 전도성이 겅화되어 태양전지의 단락 전류, 개방전압, 변환 효율 등이 개선되는 것을 확인하였다.

미스트 화학기상증착법을 이용한 c면, a면, m면, r면 사파이어 기판 위의 산화갈륨 박막 성장 연구 (Growth of Gallium Oxide Thin Film on c-, a-, m-, r-Plane Sapphire Substrates Using Mist Chemical Vapor Deposition System )

  • 성기려;조성호;김경호;신윤지;정성민;김태규;배시영
    • 한국전기전자재료학회논문지
    • /
    • 제36권1호
    • /
    • pp.74-80
    • /
    • 2023
  • Gallium oxide (Ga2O3) thin films were grown on c-, a-, m-, r-plane sapphire substrates using a mist chemical vapor deposition system. Various growth temperature range of 400~600℃ was applied for Ga2O3 thin film deposition. Then, several structural properties were characterized such as film thickness, crystal phase, lattice orientation, surface roughness, and optical bandgap. Under the certain growth temperature of 500℃, all grown Ga2O3 featured rhombohedral crystal structures and well-aligned preferred orientation to sapphire substrate. The films grown on c-and r-plane sapphire substrates, showed low surface roughness and large optical bandgap compared to those on a-and m-plane substrates. Therefore, various sapphire orientation can be potentially applicable for future Ga2O3-based electronics applications.

Facilitation of the four-mask process by the double-layered Ti/Si barrier metal for oxide semiconductor TFTs

  • Hino, Aya;Maeda, Takeaki;Morita, Shinya;Kugimiya, Toshihiro
    • Journal of Information Display
    • /
    • 제13권2호
    • /
    • pp.61-66
    • /
    • 2012
  • The double-layered Ti/Si barrier metal is demonstrated for the source/drain Cu interconnections in oxide semiconductor thin-film transistors (TFTs). The transmission electromicroscopy and ion mass spectroscopy analyses revealed that the double-layered barrier structure suppresses the interfacial reaction and the interdiffusion at the interface after thermal annealing at $350^{\circ}C$. The underlying Si layer was found to be very useful for the etch stopper during wet etching for the Cu/Ti layers. The oxide TFTs with a double-layered Ti/Si barrier metal possess excellent TFT characteristics. It is concluded that the present barrier structure facilitates the back-channel-etch-type TFT process in the mass production line, where the four- or five-mask process is used.

Improvement on the Stability of Amorphous Indium Gallium Zinc Oxide Thin Film Transistors Using Amorphous Oxide Multilayer Source/Drain Electrodes

  • Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
    • /
    • 제17권3호
    • /
    • pp.143-145
    • /
    • 2016
  • In order to find suitable source and drain (S/D) electrodes for amorphous InGaZnO thin film transistors (a-IGZO TFTs), the specific contact resistance of interface between the channel layers and various S/D electrodes, such as Ti/Au, a-IZO and multilayer of a-IGZO/Ag/a-IGZO, was investigated using the transmission line model. The a-IGZO TFTs with a-IGZO/Ag/a-IGZO of S/D electrodes had good performance and low contact resistance due to the homo-junction with channel layer. The stability was measured with different electrodes by a positive bias stress test. The result shows the a-IGZO TFTs with a-IGZO/Ag/a-IGZO electrodes were more stable than other devices.

Charge Trapping Mechanism in Amorphous Si-In-Zn-O Thin-Film Transistors During Positive Bias Stress

  • Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
    • /
    • 제17권6호
    • /
    • pp.380-382
    • /
    • 2016
  • The mechanism for instability under PBS (positive bias stress) in amorphous SIZO (Si-In-Zn-O) thin-film transistors was investigated by analyzing the charge trapping mechanism. It was found that the bulk traps in the SIZO channel layer and the channel/dielectric interfacial traps are not created during the PBS duration. This result suggests that charge trapping in gate dielectric, and/or in oxide semiconductor bulk, and/or at the channel/dielectric interface is a more dominant mechanism than the creation of defects in the SIZO-TFTs.

A review of zinc oxide photoanode films for dye-sensitized solar cells based on zinc oxide nanostructures

  • Tyona, M.D.;Osuji, R.U.;Ezema, F.I.
    • Advances in nano research
    • /
    • 제1권1호
    • /
    • pp.43-58
    • /
    • 2013
  • Zinc oxide (ZnO) is a unique semiconductor material that exhibits numerous useful properties for dye-sensitized solar cells (DSSCs) and other applications. Various thin-film growth techniques have been used to produce nanowires, nanorods, nanotubes, nanotips, nanosheets, nanobelts and terapods of ZnO. These unique nanostructures unambiguously demonstrate that ZnO probably has the richest family of nanostructures among all materials, both in structures and in properties. The nanostructures could have novel applications in solar cells, optoelectronics, sensors, transducers and biomedical sciences. This article reviews the various nanostructures of ZnO grown by various techniques and their application in DSSCs. The application of ZnO nanowires, nanorods in DSSCs became outstanding, providing a direct pathway to the anode for photo-generated electrons thereby suppressing carrier recombination. This is a novel characteristic which increases the efficiency of ZnO based dye-sensitized solar cells.