한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 1995년도 제9회 학술발표회 논문개요집
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- Pages.30-30
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- 1995
Fluorinated Silicon Oxide (SiOF) as a New Inter-metal Dielectric
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Kang, Seung-youl
(Semiconductor Technology Division, Electronics and Telecommunications Research Institute)
;
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Yu, Byung-Gon
(Semiconductor Technology Division, Electronics and Telecommunications Research Institute)
;
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Jang, Won-Ick
(Semiconductor Technology Division, Electronics and Telecommunications Research Institute)
;
- Baek, Jong-Tae (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
- Yoo, Hyung-Joun (Semiconductor Technology Division, Electronics and Telecommunications Research Institute)
- 발행 : 1995.06.01