• 제목/요약/키워드: Output processes

검색결과 528건 처리시간 0.03초

주성분분석법을 이용한 사면 상태 평가 (Evaluation of Slope Condition using Principal Component Analysis)

  • 정수정;김태형;강기민;이영준
    • 한국지반공학회:학술대회논문집
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    • 한국지반공학회 2010년도 추계 학술발표회
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    • pp.416-422
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    • 2010
  • Estimating condition of geotechnical structures are difficult because of nonlinear time dependency and seasonal effects. Measuring data of structure failure is highly variable in time and space, and a unique approach cannot be defined to model structure movements. Characteristics of movements are obtained by using a statistical method called Principal Component Analysis(PCA). The PCA is a non-parametric method to separate unknown, statistically uncorrelated source processes from observed mixed processes. Instead, since the "best" mathematical relationship is estimated for given data sets of the input and output measured from target systems. As a consequence, this method is advantageous in modeling systems whose geomechanical properties are unknown or difficult to be measured.

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Optimization for the Composition of Assembly Cell in the Optical-Components System

  • Kim, Sok-Ha;Kim, Young-Ho;Seung, Gweon-Jeong;Lee, Man-Hyung;Bea, Jong-Il
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2001년도 ICCAS
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    • pp.133.4-133
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    • 2001
  • In the paper, a Visual factory model for a optical-components manufacturing process is built. The optical-components manufacturing process is composed of 3 operation processes; optical sub assembly process, package assembly process, and fiber assembly process. Each process is managed not a batch mode, which is one of most popular manufacturing styles to produce a great deal of industrial output, but though a modular cell. In the processes, a modular cell has to be processed independently of the other cells. Optimization for the composition of assembly cell in the optical-components system is made by the Visual factory model.

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Advanced Process Control of the Critical Dimension in Photolithography

  • Wu, Chien-Feng;Hung, Chih-Ming;Chen, Juhn-Horng;Lee, An-Chen
    • International Journal of Precision Engineering and Manufacturing
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    • 제9권1호
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    • pp.12-18
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    • 2008
  • This paper describes two run-to-run controllers, a nonlinear multiple exponential-weight moving-average (NMEWMA) controller and a dynamic model-tuning minimum-variance (DMTMV) controller, for photolithography processes. The relationships between the input recipes (exposure dose and focus) and output variables (critical dimensions) were formed using an experimental design method, and the photolithography process model was built using a multiple regression analysis. Both the NMEWMA and DMTMV controllers could update the process model and obtain the optimal recipes for the next run. Quantified improvements were obtained from simulations and real photolithography processes.

선형 회분식 공정을 위한 이차 성능 지수에 의한 모델 기반 반복 학습 제어 (Model-based iterative learning control with quadratic criterion for linear batch processes)

  • 이광순;김원철;이재형
    • 제어로봇시스템학회논문지
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    • 제2권3호
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    • pp.148-157
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    • 1996
  • Availability of input trajectories corresponding to desired output trajectories is often important in designing control systems for batch and other transient processes. In this paper, we propose a predictive control-type model-based iterative learning algorithm which is applicable to finding the nominal input trajectories of a linear time-invariant batch process. Unlike the other existing learning control algorithms, the proposed algorithm can be applied to nonsquare systems and has an ability to adjust noise sensitivity as well as convergence rate. A simple model identification technique with which performance of the proposed learning algorithm can be significantly enhanced is also proposed. Performance of the proposed learning algorithm is demonstrated through numerical simulations.

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Air-Bridge 공정을 이용한 GaAs Power MESFET의 제작 및 특성 연구 (Fabrication and Characteristics of GaAs Power MESFETs Using Air-Bridge Processes)

  • 이일형;김상명;이응호;이진구
    • 전자공학회논문지A
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    • 제32A권12호
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    • pp.136-141
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    • 1995
  • GaAs power MESFETs with 1 .mu.m gate length and an undoped GaAs surface layer on the doped GaAs channel are fabricated using IR(image reversal) and air-birdge processes. And then We have measured and calculated DC and RF characteristics. We have obtained saturation current 107-500 mA (197-255 mA/mm), maximum linear RF output power 111-518.8 mW (204-270 mW/mm), current gain cut-off frequency 7-10 GHz, maximum unilateral transducer power gain 5.7-12.7, and power added efficiencies 37.9-41.2 % from the devices with gate width 0.45-2.2 mm, at 6 GHz.

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유전자 알고리즘을 사용한 퍼지-뉴럴네트워크 구조의 최적모델과 비선형공정시스템으로의 응용 (The Optimal Model of Fuzzy-Neural Network Structure using Genetic Algorithm and Its Application to Nonlinear Process System)

  • 최재호;오성권;안태천;황형수
    • 한국지능시스템학회:학술대회논문집
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    • 한국퍼지및지능시스템학회 1996년도 추계학술대회 학술발표 논문집
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    • pp.302-305
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    • 1996
  • In this paper, an optimal identification method using fuzzy-neural networks is proposed for modeling of nonlinear complex systems. The proposed fuzzy-neural modeling implements system structure and parameter identification using the intelligent schemes together with optimization theory, linguistic fuzzy implication rules, and neural networks(NNs) from input and output data of processes. Inference type for this fuzzy-neural modeling is presented as simplified inference. To obtain optimal model, the learning rates and momentum coefficients of fuzz-neural networks(FNNs) and parameters of membership function are tuned using genetic algorithm(GAs). For the purpose of its application to nonlinear processes, data for route choice of traffic problems and those for activated sludge process of sewage treatment system are used for the purpose of evaluating the performance of the proposed fuzzy-neural network modeling. The show that the proposed method can produce the intelligence model w th higher accuracy than other works achieved previously.

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성능평가에 의한 퍼지제어시스템 동조 (Fuzzy control system tuning by performance evaluation)

  • 정헌;정창규;고낙용;김영동;최한수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 하계학술대회 논문집 B
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    • pp.682-684
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    • 1995
  • The most effective way to improve the performance of a fuzzy controller may be to optimize look-up values. Look-up values are derived from processes used input-output scale factors, membership functions, rule base, fuzzy inference method and defuzzification. It is powerful way to modify or organize look-up table values. In this paper, We propose the look-up values self-organizing fuzzy controller(LSOFC). We use the plus-minus tuning method(PMTM), scanning values through the processes of addition and subtraction. We show the efficiency of this LSOFC by the results of simulation for nonlinear time-varying plant with unmodelled dynamics.

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AR(1) 공정에서의 효과적인 공정평균 관리도 (An Effective Control Chart for Monitoring Mean Shift in AR(1) Processes)

  • 원경수;강창욱;이배진
    • 산업경영시스템학회지
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    • 제24권67호
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    • pp.27-36
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    • 2001
  • A standard assumption when using a control chart to monitor a process is that the observations from the process output are statistically independent. However, for many processes the observations are autocorrelated and this autocorrelation can have a significant effect on the performance of the control chart. In this paper, we consider combined control chart of monitoring the mean of a process in which the observations can be modeled as a first-order autoregressive process. The Shewhart control chart of residuals-EWMA control chart of the observations is considered and the method of combination is recommended. The performance of the proposed control chart is compared with the performance of other control charts using a simulation.

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X-대역 12-W 급 고출력증폭기 MMIC 개발 (Development of A X-band 12 W High Power Amplifier MMIC)

  • 장동필;노윤섭;이정원;안기범;엄만석;염인복;나형기;안창수;김선주
    • 한국군사과학기술학회지
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    • 제12권4호
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    • pp.446-451
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    • 2009
  • In this paper, we described the design and test results of a high output power amplifier MMIC developed by using 0.5um power pHEMT processes on a 6-inch GaAs wafer for the X-band T/R module application. In the MMIC design, we have used a simple on-chip gate active bias technology to compensate the threshold-voltage variation of pHEMT during the fabrication process and 16-to-1 power combining method to achieve the output power over 10watt. The fabricated chip has an output power over 12watts and maximum PAE of 32% over the frequency range of fo +/-750MHz.

Image Restoration by Lifting-Based Wavelet Domain E-Median Filter

  • Koc, Sema;Ercelebi, Ergun
    • ETRI Journal
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    • 제28권1호
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    • pp.51-58
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    • 2006
  • In this paper, we propose a method of applying a lifting-based wavelet domain e-median filter (LBWDEMF) for image restoration. LBWDEMF helps in reducing the number of computations. An e-median filter is a type of modified median filter that processes each pixel of the output of a standard median filter in a binary manner, keeping the output of the median filter unchanged or replacing it with the original pixel value. Binary decision-making is controlled by comparing the absolute difference of the median filter output and the original image to a preset threshold. In addition, the advantage of LBWDEMF is that probabilities of encountering root images are spread over sub-band images, and therefore the e-median filter is unlikely to encounter root images at an early stage of iterations and generates a better result as iteration increases. The proposed method transforms an image into the wavelet domain using lifting-based wavelet filters, then applies an e-median filter in the wavelet domain, transforms the result into the spatial domain, and finally goes through one spatial domain e-median filter to produce the final restored image. Moreover, in order to validate the effectiveness of the proposed method we compare the result obtained using the proposed method to those using a spatial domain median filter (SDMF), spatial domain e-median filter (SDEMF), and wavelet thresholding method. Experimental results show that the proposed method is superior to SDMF, SDEMF, and wavelet thresholding in terms of image restoration.

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