• 제목/요약/키워드: Nickel (Ni)

검색결과 1,508건 처리시간 0.029초

공침법을 이용한 Ag-Ni 초미분 제조 (Production of Ag- Ni fine powder by coprecipitation)

  • 김봉서;우병철;변우봉;이희우
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1994년도 하계학술대회 논문집 C
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    • pp.1342-1344
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    • 1994
  • Silver-Nickel alloy has been used as a electrical contact material for low voltage, low current. Since the solubility between Ag and Ni is very low, it is difficult to produce Ag-Ni alloy by using conventional melting method and disperse Ni powder homogeneously in Ag matrix. In this study we have been produced fine Ag-Ni alloy powder by using coprecipitation method. Firstly, we have produced silver-nickel nitrate solution by dissolving the Ag and Ni ingot in nitric acid solution and then, coprecipitate (Ag, Ni)carbonate dropping Ag-Ni nitrate solution to sodium carbonate solution. (Ag, Ni) carbonate is heat-treated in $H_2$ atmosphere, $400^{\circ}C$ and it has been analysed by TGA, SEM, XRD, ICP. It is represented Silver-Nickel alloy powder in the particle range of $0.1{\sim}0.5{\mu}m$.

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니켈-크롬 합금 보철물 주위 치은열구 내에서 발견된 니켈 내성 균주에 관한 분자생물학적 연구 (A Study of Ni-resistant bacteria isolated from gingival crevicular fluid on the patients wearing Ni-Cr alloy prosthesis (In terms of molecular biological aspects))

  • 채영아;우이형;최부병;최대균;이성복;권긍록
    • 대한치과보철학회지
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    • 제37권6호
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    • pp.741-755
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    • 1999
  • As a material of metal-ceramic prosthesis, nickel as a form of Ni-Cr alloy has been used for many dental prostheses in many cases. However, several problems in use of the alloy have been revealed (ex : tissue stimulation, skin allergy, hypersensitivity, cytotoxicity and carcinogenecity). Little is known about nickel with respect to the relationship between Ni-prosthesis and gaining of Ni-resistance in oral microorganisms. The present study was undertaken to check wheather use of Ni-prosthesis leads to occurrence of Ni-resistant microorganisms. So this study may suggest the possible relationships between the oral microorganisms and nickel-resistance in oral environment. Bacteria were isolated from the gingival crevicular fluid on the pateints wearing Ni-Cr prosthesis. The isolated bacteria were tested for their Ni-resistance in nickel containing media at different concentration from 3mM to 110mM. E. coli HB101 was used as control. The Ni-resistant bacteria were isolated and biochemically identified. The Ni-resistant bacteria were tested several bio-chemical, molecular-biological tests. Performed tests were ; measuring the growth curve, antibiotic test, growth ability test in liquid media, isolation of the chromosome and plasmid, digestion of DNA by restriction enzyme, electrophoresis of chromosome and plasmid DNA, identification of Ni-resistant genes by the DNA hybridization. The results were as follows: 1) The bacteria isolated from gingival crevicular fluid on the patients wearing Ni-Cr alloy pros-thesis showed nickel-resistance. 2) The isolated microorganisms grew at nickel containing media of high concentrations (60mM-110mM). 3) Based on the biochemical tests, the isolated microorganisms were identified as Enterococcus faecalis(13 cases), Klebsiella pneumoniae(1 case) and Enterobacter gergeviae(1 case). 4) Enterococcus faecalis expressed not only nickel resistance but also the multi-drug resistance to several antibiotics ; chloramphenicol, kanamicin, streptomycin, lincomycin, clindamycin. However, all strain showed the sensitivity against the tetracycline. 5) DNA hybridization result suggest that there is no homology between the previousely known gene of nickel resistance in Klebsiella pneumoniae and chromosomal DNA of Enterococcus faecalis.

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고효율 저가형 결정질 실리콘 태양전지에 적용될 Ni/Cu 전극 및 Ni silicide 형성에 대한 연구

  • 김민정;이수홍
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.260-260
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    • 2009
  • In high-efficiency crystalline silicon solar cell, If high-efficiency solar cells are to be commercialized, It is need to develop superior contact formation method and material that can be inexpensive and simple without degradation of the solar cells ability. For reason of plated metallic contact is not only high metallic purity but also inexpensive manufacture. It is available to apply mass production. Especially, Nickel, Copper are applied widely in various electronic manufactures as easily formation is available by plating. Ni is shown to be a suitable barrier to Cu diffusin as well as desirable contact metal to silicon. Nickel monosilicide has been suggested as a suitable silicide due to its lower resistivitym lower sintering temperature and lower layer stress than $TiSi_2$. In this paper, Nickel as a seed layer and diffusion barrier is plated by electroless plating to make nickel monosilicide.

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Nickel Hexacyanoferrate 이온교환체의 전기화학적 특성에 관한 연구 (A Study on the Electrochemical Characteristics of the Nickel Hexacyanoferrate Ion Exchanger)

  • 황영기
    • 한국산업융합학회 논문집
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    • 제19권4호
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    • pp.198-205
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    • 2016
  • For the study on the ion exchange of nickel hexacyanoferrate(NiHCNFe) electrode with the several cations, the film of hexacyanoferrate was prepared on the bare nickel surface by the electrochemical and chemical methods in the solution composed with 5mM K3Fe(CN)6 and 100mM KNO3. To compare the capability of the ion exchange of NiHCNFe film electrode, the repeated cyclic voltammograms were measured in the 0.5M cation nitrate solutions at $25^{\circ}C$ and pH7. It was found that the capacity of the electrochemically derivatized NiHCNFe reduced in the rate of 0.5~0.7%/cycle and was nearly exhausted at the 150th potential cycle. Better result was obtained from that the capacity loss of the chemically assembled NiHCNFe was less than 0.02%/cycle for 5,000cycles. Furthermore, the residual capacity was more than 30% at the 5,000th cycle.

Borate 완충용액에서 니켈 산화피막의 생성 과정과 전기적 성질 (Growth Kinetics and Electronic Properties of Passive Film of Nickel in Borate Buffer Solution)

  • 김연규
    • 대한화학회지
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    • 제58권1호
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    • pp.9-16
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    • 2014
  • Borate 완충용액에서 Ni의 부동화 피막의 생성과정(growth kinetics)과 부동화 피막의 전기적 성질을 변전위법, 대 시간 전류법 그리고 단일 주파수 또는 다중 주파수 전기화학적 임피던스 측정법으로 조사하였다. 이때 생성되는 산화피막은 Mott-Schottky 식이 적용되는 p-형 반도체 성질을 보였으며, 낮은 전극전위에서 생성되는 Ni의 부동화 피막 $Ni(OH)_2$는 전극 전위가 증가하면서 NiO, NiO(OH)로 변화되는 것을 알 수 있었다.

염산용액에서 Bromley식을 이용한 염화니켈의 이온평형해석 (Ionic Equilibria Analysis of $NiCl_2$ in Chloride Solutions by Using Bromley Equation)

  • 이만승;이광섭
    • 자원리싸이클링
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    • 제12권3호
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    • pp.38-45
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    • 2003
  • 화학평형, 물질수지 및 전기적 중성식을 고려하고 Bromley식으로 용질들의 활동도계수를 구하여 염산용액에서 염화니켈의 이온평형을 해석하였다. 본 연구에서 고려한 조성범위에서 니켈을 함유한 화학종의 대부분은 $Ni^{2+}$$NiCl^{+}$ 로 존재하고 니켈수산화물의 농도분율은 매우 낮으나, 용액의 pH가 증가함에 따라 $Ni_4$ $(OH)_{4}^{4+}$ 의 농도분율은 급격히 증가하였다. $NiCl_2$ $-HCl-NaOH-H_2$O 계에 대해 전해질의 농도를 변화시키며 $25^{\circ}C$에서 측정한 pH값과 계산값은 이온강도 9.4m정도의 범위까지 서로 잘 일치하였다.

10 nm-Ni 층과 비정질 실리콘층으로 제조된 저온공정 나노급 니켈실리사이드의 물성 변화 (Property of Nickel Silicides with 10 nm-thick Ni/Amorphous Silicon Layers using Low Temperature Process)

  • 최용윤;박종성;송오성
    • 대한금속재료학회지
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    • 제47권5호
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    • pp.322-329
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    • 2009
  • 60 nm- and 20 nm-thick hydrogenated amorphous silicon (a-Si:H) layers were deposited on 200 nm $SiO_2/Si$ substrates using ICP-CVD (inductively coupled plasma chemical vapor deposition). A 10 nm-Ni layer was then deposited by e-beam evaporation. Finally, 10 nm-Ni/60 nm a-Si:H/200 nm-$SiO_2/Si$ and 10 nm-Ni/20 nm a-Si:H/200 nm-$SiO_2/Si$ structures were prepared. The samples were annealed by rapid thermal annealing for 40 seconds at $200{\sim}500^{\circ}C$ to produce $NiSi_x$. The resulting changes in sheet resistance, microstructure, phase, chemical composition and surface roughness were examined. The nickel silicide on a 60 nm a-Si:H substrate showed a low sheet resistance at T (temperatures) >$450^{\circ}C$. The nickel silicide on the 20 nm a-Si:H substrate showed a low sheet resistance at T > $300^{\circ}C$. HRXRD analysis revealed a phase transformation of the nickel silicide on a 60 nm a-Si:H substrate (${\delta}-Ni_2Si{\rightarrow}{\zeta}-Ni_2Si{\rightarrow}(NiSi+{\zeta}-Ni_2Si)$) at annealing temperatures of $300^{\circ}C{\rightarrow}400^{\circ}C{\rightarrow}500^{\circ}C$. The nickel silicide on the 20 nm a-Si:H substrate had a composition of ${\delta}-Ni_2Si$ with no secondary phases. Through FE-SEM and TEM analysis, the nickel silicide layer on the 60 nm a-Si:H substrate showed a 60 nm-thick silicide layer with a columnar shape, which contained both residual a-Si:H and $Ni_2Si$ layers, regardless of annealing temperatures. The nickel silicide on the 20 nm a-Si:H substrate had a uniform thickness of 40 nm with a columnar shape and no residual silicon. SPM analysis shows that the surface roughness was < 1.8 nm regardless of the a-Si:H-thickness. It was confirmed that the low temperature silicide process using a 20 nm a-Si:H substrate is more suitable for thin film transistor (TFT) active layer applications.

금 합금 도금층의 접촉저항에 미치는 합금원소의 종류 및 Thermal Aging의 영향 (Effect of Alloying Elements and Thermal Aging on the Contact Resistance of Electroplated Gold Alloy Layers)

  • 이지웅;손인준
    • 한국표면공학회지
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    • 제46권6호
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    • pp.235-241
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    • 2013
  • In this study, the effects of alloying elements and thermal aging on the contact resistance of electroplated gold alloy layers were investigated by surface analysis using X-ray photoelectron spectroscopy (XPS). The contact resistance of Au-Ag alloy was lower than that of Au-Ni or Au-Co alloy after thermal aging. The XPS results show that nickel and oxygen present as nickel oxides such as NiO and $Ni_2O_3$ on the surface of gold layers after thermal aging. The increase in the contact resistance after thermal aging is attributable to the nickel oxide layer formed on the surface of the gold layers. The content of nickel diffused from the underlayer during the thermal aging was high in the order of Au-Co, Au-Ni and Au-Ag alloy because the area of grain boundary was large in the order of Au-Ag, Au-Ni and Au-Co alloy.

니켈 나노입자가 흡착된 에너제틱용 고반응성 알루미늄 분말 합성 (Synthesis of Nickel Nanoparticle-adsorbed Aluminum Powders for Energetic Applications)

  • 김동원;권구현;김경태
    • 한국분말재료학회지
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    • 제24권3호
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    • pp.242-247
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    • 2017
  • In this study, the electroless nickel plating method has been investigated for the coating of Ni nanoparticles onto fine Al powder as promising energetic materials. The adsorption of nickel nanoparticles onto the surface of Al powders has been studied by varying various process parameters, namely, the amounts of reducing agent, complexing agent, and pH-controller. The size of nickel nanoparticles synthesized in the process has been optimized to approximately 200 nm and they have been adsorbed on the Al powder. TGA results clearly show that the temperature at which oxidation of Al mainly occurs is lowered as the amount of Ni nanoparticles on the Al surface increases. Furthermore, the Ni-plated Al powders prepared for all conditions show improved exothermic reaction due to the self-propagating high-temperature synthesis (SHS) between Ni and Al. Therefore, Al powders fully coated by Ni nanoparticles show the highest exothermic reactivity: this demonstrates the efficiency of Ni coating in improving the energetic properties of Al powders.

에너제틱 응용을 위한 Ni코팅된 Al분말소재 제조 및 산화거동 (Fabrication and Oxidation Behaviors of Nickel-coated Aluminum Powders for Energetic Applications)

  • 김경태;우재열;유지훈;이혜문;임태수;최윤정;김창기
    • 한국입자에어로졸학회지
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    • 제10권4호
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    • pp.177-182
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    • 2014
  • In this study, nickel-coated aluminum (Ni/Al) powders were synthesized for the utilization of energetic applications. Oxide materials present at the surface of Al powders of $45{\mu}m$ in averaged size were removed by using sodium hydroxide(NaOH) solution which is used for controlling pH. Nickel material is coated into the surface of oxide-removed Al powders by electroless-plating process. The microstructure of fabricated Ni/Al powders shows that nickel layers with a few hundreds nm were very homogeneously formed onto the surface of Al powders. The oxidation behavior of Ni/Al exihibit somewhat faster oxidation rate than that of pure Al with surface oxidation. Also, the higher exothermic reaction was observed from the Ni/Al powders. From the result of this, nickel coating is very promising method to obtain highly reactive and safe Al powders for energetic applications.