• International Journal of Precision Engineering and Manufacturing
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• v.7 no.4
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• pp.18-22
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• 2006

Although many efforts have been made in making nanometer-sized holes, there is still a major challenge in fabricating individual single-digit nanometer holes in a more controllable way for different materials, size distribution and hole shapes. In this paper we describe our efforts to use a top down approach in nanofabrication method to make single-digit nanoholes. There are three major steps towards the fabrication of a single-digit nanohole. 1) Preparing the freestanding thin film by epitaxial deposition and electrochemical etching. 2) Making sub-micro holes ($0.2{\mu}\;to\;0.02{\mu}$) by focused ion beam (FIB), electron beam (EB), atomic force microscope (AFM), and others methods. 3) Reducing the hole size to less than 10 nm by epitaxial deposition, FIB or EB induced deposition and micro coating. Preliminary work has been done on thin films (30 nm in thickness) preparation, sub-micron hole fabrication, and E-beam induced deposition. The results are very promising.

• Fibers and Polymers
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• v.3 no.3
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• pp.113-119
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• 2002

Nanoimprint lithography (NIL) is a nanofabrication method known to be a low cost method of fabricating nanoscale patterns as small as 6 m. This study is focused on understanding physical phenomena in the embossing of nano/micro scale structures with 100 nm minimum feature size. We present the effects of capillary force and width of stamp groove on flow behavior at the embossing stage through numerical experimentation. We also compare our numerical results with previous experimental results and discuss our results.

• Journal of the Semiconductor & Display Technology
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• v.10 no.4
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• pp.89-94
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• 2011

In recent years there have been considerable attentions on nanoimprint lithography (NIL) by the display device and semiconductor industry due to its potential abilities that enable cost-effective and high-throughput nanofabrication. A major disadvantage of thermal NIL is the thermal cycle, that is, heating over glass transition temperature and then cooling below it, which requires a significant amount of processing time and limits the throughput. One of the methods to overcome this disadvantage is to improve the cooling performance in NIL process. In this paper, a numerical analysis model of cooling system in thermal NIL was development by CAD/CAE program and the performance of the cooling system was analyzed by the model. The calculated temperatures of nanoimprint device were verified by the measurements. By using the analysis model, the case that the cooling material is replaced by liquid nitrogen is investigated.

• Bulletin of the Korean Chemical Society
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• v.24 no.1
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• pp.32-36
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• 2003

Co nanoparticles were prepared by the reverse micelle technique (NaBH₄reduction of cobalt chloride in a reversed micelle solution of didodecyldimethylammoniumbromide (DDAB)/toluene). The size and the shape of Co nanoparticles could be easily controlled by changing the water contents and micelle concentrations, and the solubility of Co nanoparticles was systematically tuned by choosing appropriate surface capping organic ligand molecules. Furthermore, a novel nanofabrication process was clearly demonstrated, which generated oxide over-coated Co nanorods from Co nanoparticles in organic solution by slow oxidation with an external magnetic field.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.17 no.5
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• pp.76-81
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• 2008

Nanoimprint lithography(NIL) is an emerging technology enabling cost-effective and high-throughput nanofabrication. Among NILs, significant efforts from both academia and industry have been put in UV NIL research and development because of its ability to pattern at room temperature and at low pressure. In UV NIL, there may be in-line set-up error of the stamp and the substrate. To compensate this error, the dummy blocks are put on the stamp and pressurized uniformly. Contact problems between the stamp and the photoresist layer on the substrate are often happened, which results in the non-uniform residual layer In this paper, the pressurization method on the dummy block is investigated by the finite element method. A new method is recommended and evaluated far the uniform stamp deformation.

• Journal of the Semiconductor & Display Technology
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• v.12 no.2
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• pp.93-98
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• 2013

Nanoimprint lithography (NIL) is a next generation technology for fabrication of micrometer and nanometer scale patterns. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. To successfully imprint a nanosized pattern with the thermal NIL, the process conditions such as temperature and pressure should be appropriately selected. This starts with a clear understanding of polymer material behavior during the thermal NIL process. In this paper, a filling process of the polymer resist into nanometer scale cavities during the thermal NIL at the temperature range, where the polymer resist shows the viscoelastic behaviors with consideration of stress relaxation effect of the polymer. In the simulation, the filling process and the residual layer formation are numerically investigated. And the effects of pressure and temperature on NIL process, specially the residual layer formation are discussed.

• Bulletin of the Korean Chemical Society
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• v.24 no.5
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• pp.600-604
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• 2003

The light pressure force from an optical standing wave (SW) can focus an atomic beam to submicrometer dimensions. To make the best of this technique it is necessary to find a set of optimal experimental parameters. In this paper we consider theoretically the chromium atoms focusing and demonstrate that the focusing performance depends not only on the strength of but also on the time atoms take to traverse the force field. The general conclusions drawn can easily be applied to other atoms. To analyze the problem we numerically integrate a coupled time-dependent $Schr{\"{o}}dinger$ equation over a wide range of experimental parameters. It is found that an optimal atomic beam speed-laser intensity pair does exist, which could give substantially improved focusing over the one with the experimental parameters given in the literature. It is also shown that the widely used classical particle optics approach can lead to erroneous predictions.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.05a
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• pp.8.1-8.1
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• 2009

The self-assembly of peptide-based building blocks into nanostructures is an attractive route for fabricating novel materials because of their capacity for molecular recognition and functional flexibility as well as the mild conditions required in the fabrication process. Among various peptide-based building blocks forming nanostructures, the simplest building blocks are aromatic dipeptides like diphenylalanine, which can readily self-assemble into nanotubes in aqueous solutions at ambient conditions. Recently, we have developed a high-temperature solid-phase self-assembly process for diphenylalanine. Through this novel process, we succeeded in the growth of vertically well-aligned, uniform nanowires from amorphous peptide thin film. To demonstrate the versatility of our approach, we also fabricated a micropattern of peptide nanowires by combining our solid-phase growth method and simple soft lithographic techniques. We believe that our studies on peptide self-assembly will provide a new horizon for peptide-based nanofabrication.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.87-87
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• 2010

We report a new patterning technique of inorganic materials by using thin-film transfer printing (TFTP) with atomic layer deposition. This method consists of the atomic layer deposition (ALD) of inorganic thin film and a nanotransfer printing (nTP) that is based on a water-mediated transfer process. In the TFTP method, the Al2O3 ALD growth occurs on FTS-coated PDMS stamp without specific chemical species, such as hydroxyl group. The CF3-terminated alkylsiloxane monolayer, which is coated on PDMS stamp, provides a weak adhesion between the deposited Al2O3 and stamp, and promotes the easy and complete release of Al2O3 film from the stamp. And also, the water layer serves as an adhesion layer to provide good conformal contact and form strong covalent bonding between the Al2O3 layer and Si substrate. Thus, the TFTP technique is potentially useful for making nanochannels of various inorganic materials.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.92.1-92.1
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• 2013

Molecular electronics has been the subject of intese research for many years because of the fundamental interest in molecular charge transport and potential applications, such as (bio)nanosensors and molecular memory devices. Molecular electronics requires a method for making reliable eletrical contacts to singlemolecules. To date, several approaches have been reported: scanning-probe microscopy, mechanical break junctions, nano patterning, and direct deposition of electrode on a self-assembled monolayers. However, most methods are laborious and difficult for large-scale application and more importantly, cannot control the number of moleucles in the junction. Recently, DNA has been used as a template for metallic nanostructures (e.g., Ag, Pd, and Au nanowires) through DNA metallization process. Furthermore, oligodeoxynucleotides have been tethered to organic molecules by using conventional organic reactions. Collectively, these techniques should provide an efficient route toward reliable and reproducible molecular electronic devices with large-scale fabrication. Therefore, I will present a paradigm for the fabrication of moleuclar electronic devices by using micrometer-sized DNA-singe organic molecule and DNA triblock structures.