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Design of the Dummy Block for Uniform Stamp Deformation in the UV Nanoimprint Lithography  

Kim, Nam-Woong (서울대 대학원 기계항공공학부)
Kim, Kug-Weon (순천향대학교 기계공학과)
Chung, Tae-Eun (인덕대 정보메카트로닉스과)
Sin, Hyo-Chol (서울대 기계항공공학부)
Publication Information
Transactions of the Korean Society of Machine Tool Engineers / v.17, no.5, 2008 , pp. 76-81 More about this Journal
Abstract
Nanoimprint lithography(NIL) is an emerging technology enabling cost-effective and high-throughput nanofabrication. Among NILs, significant efforts from both academia and industry have been put in UV NIL research and development because of its ability to pattern at room temperature and at low pressure. In UV NIL, there may be in-line set-up error of the stamp and the substrate. To compensate this error, the dummy blocks are put on the stamp and pressurized uniformly. Contact problems between the stamp and the photoresist layer on the substrate are often happened, which results in the non-uniform residual layer In this paper, the pressurization method on the dummy block is investigated by the finite element method. A new method is recommended and evaluated far the uniform stamp deformation.
Keywords
UV Nanoimprint; Uniform Stamp Deformation; Dummy Block; Finite Element Method;
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Times Cited By KSCI : 1  (Citation Analysis)
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