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이재종;최기봉;정광조
- Proceedings of the Korean Society of Precision Engineering Conference
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- 2003.06a
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- pp.196-198
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- 2003
Classical lithography in semiconductor employs stepper technologies. Limits of this technology are clearly seen at structures below 100nm. Nano-imprinting lithography is a new method for generating patterns in submicron range at reasonable cost. In order to manufacture nano-imprinting lithography(NIL) equipment, several NIL manufacturers have been developing key technologies for realization of nano-imprinting process, recently. In this paper, we've been describe state-of-the-art and technology trends for nano-imprinting lithography equipments.
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Shin Hong-Gue;Ban Jun-Ho;Cho Ki-Chul;Kim Heon-Yong;Kim Byeong-Hee
- Journal of the Korean Society for Precision Engineering
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- v.23 no.4 s.181
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- pp.162-167
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- 2006
Hot embossing lithography(HEL) has the production advantage of comparatively few process step, simple operation, a relatively low cost for embossing tools(Si), and high replication accuracy for small features. In this paper, we considered the nano-molding characteristic according to molding parameters(temperature, pressure, times, etc) and induced a optimal molding condition using HEL. High precision nano-patter master with various shapes were designed and manufactured using the DRIE(Deep Reactive ion Etching), LPCVD(Low Pressure Chemical Vapor Deposition) and thermal oxidation process, and we investigated the molding characteristic of DVD and Blu-ray nickel stamp. We induced flow behaviors of polymer, rheology by shapes and sizes of the pattern through various molding experiments. Finally, with achieving nano-structure molding with high aspect ratio, we will secure a basic technology about the molding of large-area nano-pattern media.
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Cui, Yuguo;Arai, Yoshikazu;Asai, Takemi;Ju, BinFeng;Gao, Wei
- International Journal of Precision Engineering and Manufacturing
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- v.9 no.3
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- pp.27-32
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- 2008
This paper describes a contact atomic force microscope (AFM) that can be used for high-speed precision measurements of microstructured surfaces. The AFM is composed of an air-bearing X stage, an air-bearing spindle with the axis of rotation in the Z direction, and an AFM probe unit. The traversing distance and maximum speed of the X stage are 300 mm and 400 mm/s, respectively. The spindle has the ability to hold a sample in a vacuum chuck with a maximum diameter of 130 mm and has a maximum rotation speed of 300 rpm. The bandwidth of the AFM probe unit in an open loop control circuit is more than 40 kHz. To achieve precision measurements of microstructured surfaces with slopes, a scanning strategy combining constant height measurements with a slope compensation technique is proposed. In this scanning strategy, the Z direction PZT actuator of the AFM probe unit is employed to compensate for the slope of the sample surface while the microstructures are scanned by the AFM probe at a constant height. The precision of such a scanning strategy is demonstrated by obtaining profile measurements of a microstructure surface at a series of scanning speeds ranging from 0.1 to 20.0 mm/s.
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이종혁;배준영;이상룡
- Journal of the Korean Society for Precision Engineering
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- v.21 no.11
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- pp.117-124
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- 2004
Recently, nano-methodology is increasingly important as the ruler for measuring nano-technology, and we applied the linear encoder to nano-methodology. The quadrature output in the linear encoder has an effect on increasing the resolution in some techniques. Already, various interpolation techniques based on the quadrature signal have applied to the precision servo system. In this paper, we propose a new interpolation algorithm for ultra-precision positioning in the low speed with simulation by MATLAB SIMULINK. This method modified previous methods and was properly designed for some given control system. To verify, we first fulfilled the encoder signal test to find main parameters fer the signal transformation, then we proved the proposed interpolation algorithm by experiments, which show that the result of the interpolation algorithm corresponds with the measurement of the laser interferometer in 100 nm unit approximately. In addition, we can get more precise measurement by more accurate and noise-free signal. So we need to compensate imperfections in the encoder signal. After that, we will apply this algorithm to nano positioning system.
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