• 제목/요약/키워드: Nano Thin Film

검색결과 789건 처리시간 0.045초

PS-PB-PS 삼블럭 공중합체 박막형판에서의 금의 자기응집에 의한 Nano-Scale 패턴형성 (Nano-Scale Patterning by Gold Self-Assembly on PS-PB-PS Triblock Copolymer Thin Film Templates)

  • Kim, G.;Libera, M.
    • Elastomers and Composites
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    • 제34권1호
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    • pp.45-52
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    • 1999
  • 본 논문에서는 미세 상분리된 블럭 공중합체 박막의 특이상에서 금 입자들이 어떻게 자기응집(self assemble) 되고 잘 배열된 패턴을 형성하는지를 살펴보았다. 본 연구에서는 원통형 모폴로지를 갖는 PS-PB-PS 삼블럭 공중합체(30wt% PS) 박막(${\sim}100nm$)을 0.1wt% 톨루엔 용액으로부터 캐스팅하여 고분자 박막 형판(template)으로 사용하였다. 각각의 상이한 용매 증발조건으로부터 PB matrix내에 수평배열 PS cylinder와 수직 PS cylinder를 함께 갖는 막이 얻어졌다. 블럭 공중합체박막의 표면 및 bulk 몰폴로지를 살펴보기 위하여 단면투과전자현미경(TEM)을 사용하였다. Nano-scale 패턴을 얻기 위하여는 소량의 금입자를 블럭 공중합체 박막상에 증발시켰다. 캐스팅된 상태 그 대로의 박막형판이 사용되어질때 금입자들은 표면 장력이 적은 PB상에 우선적으로 자기응집(self as-semble)하여 비교적 잘 배열된 nano-scale의 패턴을 형성하였다. 그러나 열처리(annealing)에 의하여 표면장력이 적은 PB-rich충이 형성된 후에는 금입자의 자기응집에 의한 패턴은 관찰되지 않았다.

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RF Sputtering의 증착 조건에 따른 HfO2 박막의 Nanocrystal에 의한 Nano-Mechanics 특성 연구 (Nano-mechanical Properties of Nanocrystal of HfO2 Thin Films for Various Oxygen Gas Flows and Annealing Temperatures)

  • 김주영;김수인;이규영;권구은;김민석;엄승현;정현진;조용석;박승호;이창우
    • 한국진공학회지
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    • 제21권5호
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    • pp.273-278
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    • 2012
  • 현재 Hf (Hafnium)을 기반으로한 게이트 유전체의 연구는 여러 분야에서 다양하게 진행되어져 왔다. 이는 기존의 $SiO_2$보다 유전상수 값이 크고, 또한 계속되는 scaling-down 공정에서도 양자역학적인 터널링을 차단하는 특성이 뛰어나기 때문이다. MOSFET 구조에서 유전체 박막의 두께 감소로 인한 전기적 특성 저하를 보완하기 위해서 high-K 재료가 대두되었고 현재 주를 이루고 있다. 그러나 현재까지 $HfO_2$에 대한 nano-mechanical 특성 연구는 부족한 상태이므로 본 연구에서는 게이트 절연층으로 최적화하기 위하여 $HfO_2$ 박막의 nano-mechanical properties를 자세히 조사하였다. 시료는 rf magnetron sputter를 이용하여 Si (silicon) 기판 위에 Hafnium target으로 산소유량(4, 8 sccm)을 달리하여 증착하였고, 이후 furnace에서 400에서 $800^{\circ}C$까지 질소분위기에서 20분간 열처리를 실시하였다. 실험결과 산소 유량을 8 sccm으로 증착한 시료가 열처리 온도가 증가할수록 누설전류 특성 성능이 우수 해졌다. Nano-indenter로 측정하고 Weibull distribution으로 정량적 계산을 한 결과, $HfO_2$ 박막의 stress는 as-deposited 시료를 기준으로 $400^{\circ}C$에서는 tensile stress로 변화되었다. 그러나 온도가 증가(600, $800^{\circ}C$)할수록 compressive stress로 변화 되었다. 특히, $400^{\circ}C$ 열처리한 시료에서 hardness 값이 (산소유량 4 sccm : 5.35 GPa, 8 sccm : 5.54 GPa) 가장 감소되었다. 반면에 $800^{\circ}C$ 열처리한 시료에서는(산소유량 4 sccm : 8.09 GPa, 8 sccm : 8.17 GPa) 크게 증가된 것을 확인하였다. 이를 통해 온도에 따른 $HfO_2$ 박막의 stress 변화를 해석하였다.

Pentacene Thin Film Transistors with Various Polymer Gate Insulators

  • Kim, Jae-Kyoung;Kim, Jung-Min;Yoon, Tae-Sik;Lee, Hyun-Ho;Jeon, D.;Kim, Yong-Sang
    • Journal of Electrical Engineering and Technology
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    • 제4권1호
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    • pp.118-122
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    • 2009
  • Organic thin film transistors with a pentacene active layer and various polymer gate insulators were fabricated and their performances were investigated. Characteristics of pentacene thin film transistors on different polymer substrates were investigated using an atomic force microscope (AFM) and x-ray diffraction (XRD). The pentacene thin films were deposited by thermal evaporation on the gate insulators of various polymers. Hexamethyldisilazane (HMDS), polyvinyl acetate (PVA) and polymethyl methacrylate (PMMA) were fabricated as the gate insulator where a pentacene layer was deposited at 40, 55, 70, 85, 100 oC. Pentacene thin films on PMMA showed the largest grain size and least trap concentration. In addition, pentacene TFTs of top-contact geometry are compared with PMMA and $SiO_2$ as gate insulators, respectively. We also fabricated pentacene TFT with Poly (3, 4-ethylenedioxythiophene)-Polysturene Sulfonate (PEDOT:PSS) electrode by inkjet printing method. The physical and electrical characteristics of each gate insulator were tested and analyzed by AFM and I-V measurement. It was found that the performance of TFT was mainly determined by morphology of pentacene rather than the physical or chemical structure of the polymer gate insulator

나노 채널 구조를 가진 산화 주석 박막 전극 제조 및 전기화학적 특성 평가 (Fabrication of Nano-Channeled Tin Oxide Film Electrode and Evaluation of Its Electrochemical Properties)

  • 박수진;신헌철
    • 한국재료학회지
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    • 제22권1호
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    • pp.1-7
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    • 2012
  • Thin film electrode consisting purely of porous anodic tin oxide with well-defined nano-channeled structure was fabricated for the first time and its electrochemical properties were investigated for application to an anode in a rechargeable lithium battery. To prepare the thin film electrode, first, a bi-layer of porous anodic tin oxides with well-defined nano-channels and discrete nano-channels with lots of lateral micro-cracks was prepared by pulsed and continuous anodization processes, respectively. Subsequent to the Cu coating on the layer, well-defined nano-channeled tin oxide was mechanically separated from the specimen, leading to an electrode comprised of porous tin oxide and a Cu current collector. The porous tin oxide nearly maintained its initial nano-structured character in spite of there being a series of fabrication steps. The resulting tin oxide film electrode reacted reversibly with lithium as an anode in a rechargeable lithium battery. Moreover, the tin oxide showed far more enhanced cycling stability than that of powders obtained from anodic tin oxides, strongly indicating that this thin film electrode is mechanically more stable against cycling-induced internal stress. In spite of the enhanced cycling stability, however, the reduction in the initial irreversible capacity and additional improvement of cycling stability are still needed to allow for practical use.

Nano-Mechanical and Tribological Characteristics of Ultra-Thin Amorphous Carbon Film Investigated by AFM

  • Chung, Koo-Hyun;Lee, Jae-Won;Kim, Dae-Eun
    • Journal of Mechanical Science and Technology
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    • 제18권10호
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    • pp.1772-1781
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    • 2004
  • The mechanical as well as tribological characteristics of coating films as thin as a few nm become more crucial as applications in micro-systems grow. Especially, the amorphous carbon film has a potential to be used as a protective layer for micro-systems. In this work, quantitative evaluation of nano-indentation, scratching, and wear tests were performed on the 7nm thick amorphous carbon film using an Atomic Force Microscope (AFM). It was shown that AFM-based nano-indentation using a diamond coated tip can be feasibly utilized for mechanical characterization of ultra-thin films. Also, it was found that the critical load where the failure of the carbon film occurred was about 18${\mu}$N by the ramp load scratch test. Finally, the wear experimental results showed that the quantitative wear rate of the carbon film ranged 10$\^$-9/~10$\^$-8/ ㎣ /N cycle. These experimental methods can be effectively utilized for a better understanding the mechanical and tribological characteristics at the nano-scale.

Analysis of the Current-voltage Curves of a Cu(In,Ga)Se2 Thin-film Solar Cell Measured at Different Irradiation Conditions

  • Lee, Kyu-Seok;Chung, Yong-Duck;Park, Nae-Man;Cho, Dae-Hyung;Kim, Kyung-Hyun;Kim, Je-Ha;Kim, Seong-Jun;Kim, Yeong-Ho;Noh, Sam-Kyu
    • Journal of the Optical Society of Korea
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    • 제14권4호
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    • pp.321-325
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    • 2010
  • We analyze the current density - voltage (J - V) curve of a Cu(In,Ga)$Se_2$ (CIGS) thin-film solar cell measured at different irradiation power densities. For the solar-cell sample investigated in this study, the fill factor and power conversion efficiency decreased as the irradiation power density (IPD) increased in the range of 2 to 5 sun. Characteristic parameters of solar cell including the series resistance ($r_s$), the shunt resistance ($r_{sh}$), the photocurrent density ($J_L$), the saturation current density ($J_s$) of an ideal diode, and the coefficient ($C_s$) of the diode current due to electron-hole recombination via ionized traps at the p-n interface are determined from a theoretical fit to the experimental data of the J - V curve using a two-diode model. As IPD increased, both $r_s$ and $r_{sh}$ decreased, but $C_s$ increased.

Fabrication of Roll-Printed Organic Thin-Film Transistors using Patterned Polymer Stamp

  • Jo, Jeong-Dai;Yu, Jong-Su;Kim, Dong-Soo;Kim, Kwang-Young;Lee, Eung-Sug
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.243-246
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    • 2008
  • Roll-printed organic thin-film transistors (OTFTs) were fabricated by gravure or flexography printing using patterned PDMS stamp with various channel lengths, silver pastes, coated polyvinylphenol dielectric, and jetted bis(triisopropyl-silylethynyl) pentacene semiconductor on plastic substrates. The roll-printed OTFT parameters were obtained: fieldeffect mobility of $0.1\;cm^2/Vs$, an on/off current ratio of $10^4$ and a subthreshold slope of 2.53 V/decade.

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고온 열처리 과정에서 산소 Outgasing 효과에 의한 HfOx 박막의 Nanomechanics 특성 연구 (Nano-Mechanical Studies of HfOx Thin Film for Oxygen Outgasing Effect during the Annealing Process)

  • 박명준;김성준;이시홍;김수인;이창우
    • 한국진공학회지
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    • 제22권5호
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    • pp.245-249
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    • 2013
  • MOSFET 구조의 차세대 Oxide 박막으로 주목받고 있는 $HfO_X$박막을 rf magnetron sputter를 이용하여 Si(100) 기판 위에 증착하였다. 증착시 산소의 유량을 5, 10, 15 sccm으로 변화를 주며 증착하였고 이후 furnace에서 400부터 $800^{\circ}C$까지 질소분위기로 열처리 하였다. 실험결과 $HfO_X$ 박막의 전기적 특성은 산소유량 증가에 따라 누설전류 특성이 향상되었으나, 열처리 온도가 증가함에 따라서는 감소하였다. 특히, 이 논문에서는 Nano-indenter와 AFM으로 $HfO_X$ 박막의 nanomechanics 특성을 측정하였다. 측정 결과에 의하면 열처리 온도가 증가함에 따라 최대 압입력을 기준으로 최대 압입 깊이가 24.9 nm에서 38.8 nm로 증가하였으며 특히 $800^{\circ}C$ 열처리된 박막에서 압입 깊이가 급격하게 증가하였다. 이러한 압입 깊이의 급격한 증가는 박막내 응력 완화에 의한 스트레스 변화로 예상되며, 그 원인으로 증착시 박막내 포함된 산소가 열처리 조건에 의해 빠져나감에 의한 것으로 판단된다.

Bandgap Alteration of Transparent Zinc Oxide Thin Film with Mg Dopant

  • Salina, M.;Ahmad, R.;Suriani, A.B.;Rusop, M.
    • Transactions on Electrical and Electronic Materials
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    • 제13권2호
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    • pp.64-68
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    • 2012
  • We have successfully demonstrated a bandgap alteration of transparent zinc oxide (ZnO) thin film with Mg dopant by using sol-gel spin coating technique. By increasing the dopant from 0 to 30 atomic percent (at.%), a decrement value in the cutoff is observed, where the absorption edge shifts continuously to the shorter wavelength side, towards 300 nm. This resulted in a significant bandgap increment from 3.28 to 3.57 eV. However, the transmittance of the thin film at 350-800 nm gradually downgraded, from 93 to 80 % which is most probably due to the grain size that becomes bigger, and it also affected the electrical properties. The decrement from 45 to 0.05 mA at +10 V was observed in the I-V characteristics, concluding the significant relationship; where higher optical bandgap materials will exhibit lower conductivity. These findings may be useful in optoelectronics devices.