• Title/Summary/Keyword: NBE emission

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Temperature-dependent Photoluminescence Study on Aluminum-doped Nanocrystalline ZnO Thin Films by Sol-gel Dip-coating Method

  • Nam, Giwoong;Lee, Sang-Heon;So, Wonshoup;Yoon, Hyunsik;Park, Hyunggil;Kim, Young Gue;Kim, Soaram;Kim, Min Su;Jung, Jae Hak;Lee, Jewon;Kim, Yangsoo;Leem, Jae-Young
    • Bulletin of the Korean Chemical Society
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    • v.34 no.1
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    • pp.95-98
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    • 2013
  • The photoluminescence (PT) properties of Al-doped ZnO thin films grown by the sol-gel dip-coating method have been investigated. At 12 K, nine distinct PL peaks were observed at 2.037, 2.592, 2.832, 3.027, 3.177, 3.216, 3.260, 3.303, and 3.354 eV. The deep-level emissions (2.037, 2.592, 2.832, and 3.027 eV) were attributed to native defects. The near-band-edge (NBE) emission peaks at 3.354, 3.303, 3.260, 3.216, and 3.177 eV were attributed to the emission of the neutral-donor-bound excitons ($D^0X$), two-electron satellite (TES), free-to-neutral-acceptors (e,$A^0$), donor-acceptor pairs (DAP), and second-order longitudinal optical (2LO) phonon replicas of the TES (TES-2LO), respectively. According to Haynes' empirical rule, we calculated the energy of a free exciton (FX) to be 3.374 eV. The thermal activation energy for $D^0X$ in the nanocrystalline ZnO thin film was found to be ~25 meV, corresponding to the thermal dissociation energy required for $D^0X$ transitions.

Effects of Growth Conditions on Properties of ZnO Nanostructures Grown by Hydrothermal Method (수열합성법으로 성장된 ZnO 나노구조의 성장조건에 따른 특성)

  • Cho, Min-Young;Kim, Min-Su;Kim, Ghun-Sik;Choi, Hyun-Young;Jeon, Su-Min;Yim, Kwang-Gug;Lee, Dong-Yul;Kim, Jin-Soo;Kim, Jong-Su;Lee, Joo-In;Leem, Jae-Young
    • Korean Journal of Materials Research
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    • v.20 no.5
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    • pp.262-266
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    • 2010
  • ZnO nanostructures were grown on an Au seed layer by a hydrothermal method. The Au seed layer was deposited by ion sputter on a Si (100) substrate, and then the ZnO nanostructures were grown with different precursor concentrations ranging from 0.01 M to 0.3M at $150^{\circ}C$ and different growth temperatures ranging from $100^{\circ}C$ to $250^{\circ}C$ with 0.3 M of precursor concentration. FE-SEM (field-emission scanning electron microscopy), XRD (X-ray diffraction), and PL (photoluminescence) were carried out to investigate the structural and optical properties of the ZnO nanostructures. The different morphologies are shown with different growth conditions by FE-SEM images. The density of the ZnO nanostructures changed significantly as the growth conditions changed. The density increased as the precursor concentration increased. The ZnO nanostructures are barely grown at $100^{\circ}C$ and the ZnO nanostructure grown at $150^{\circ}C$ has the highest density. The XRD pattern shows the ZnO (100), ZnO (002), ZnO (101) peaks, which indicated the ZnO structure has a wurtzite structure. The higher intensity and lower FWHM (full width at half maximum) of the ZnO peaks were observed at a growth temperature of $150^{\circ}C$, which indicated higher crystal quality. A near band edge emission (NBE) and a deep level emission (DLE) were observed at the PL spectra and the intensity of the DLE increased as the density of the ZnO nanostructures increased.

Effects of Precursor Concentration on Surface and Optical Properties of ZnO Nano-Fibrous Thin Films Fabricated by Spin-Coating Method (스핀코팅 방법으로 제작된 ZnO 나노 섬유질 박막의 전구체 농도에 따른 표면 및 광학적 특성)

  • Kim, Min-Su;Kim, Ghun-Sik;Yim, Kwang-Gug;Cho, Min-Young;Jeon, Su-Min;Choi, Hyun-Young;Lee, Dong-Yul;Kim, Jin-Soo;Kim, Jong-Su;Lee, Joo-In;Leem, Jae-Young
    • Journal of the Korean Vacuum Society
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    • v.19 no.6
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    • pp.483-488
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    • 2010
  • ZnO nano-fibrous thin films with various precursor concentrations ranging from 0.2 to 1.0 mol (M) were grown by spin-coating method and effects of the precursor concentration on surface and optical properties of the ZnO nano-ribrous thin films were investigated by using scanning electron microscopy (SEM) and photoluminescence (PL). ZnO nuclei were formed at the precursor concentration below 0.4 M and the ZnO nano-fibrous thin films were grown at the precursor concentration above 0.6 M. Further increase in the precursor concentration, the thickness of the ZnO nano-fibrous thin films is gradually increased. The intensity and the full-width at half-maximum (FWHM) of the near-band-edge emission (NBE) is increased as the precursor concentration is increased. The deep-level emission (DLE) is red-shifted as the precursor concentration is increased.

Sol-Gel 법으로 증착된 ZnO 박막의 냉각속도에 따른 특성 변화 및 후열처리 효과

  • Kim, Min-Su;Im, Gwang-Guk;Kim, So-ARam;Nam, Gi-Ung;Park, Sang-Hyeon;U, Seok-Beom;Lee, Dong-Yul;Kim, Jin-Su;Kim, Jong-Su;Lee, Ju-In;Im, Jae-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.81-81
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    • 2011
  • Sol-gel spin-coating법을 이용하여 ZnO 박막을 증착하였다. Sol 전구체 용액을 Si(100) 기판에 증착하고 전열처리(pre-heat treatment)하여 gel 상태의 ZnO 박막을 형성시킨 후 다른 속도로 냉각시켰다. Atomic force microscopy (AFM), X-ray diffraction (XRD), Raman, photoluminescence (PL)을 이용하여 냉각속도가 ZnO 박막의 구조적 및 광학적 특성에 미치는 영향을 분석하였다. 느린 속도($5^{\circ}C$/min)로 냉각시킨 ZnO 박막은 나노섬유질구조(nano-fibrous structure)를 나타내었고, 상온에서 바로 냉각시킨 ZnO 박막은 매우 매끄러운 표면(mirror-like surface)을 나타내었다. ZnO (100), ZnO (002), ZnO (101) 방향을 나타내는 회절피크가 관찰되었고, 냉각속도에 따른 ZnO 박막의 배향성을 알아보기 위하여 texture coefficient (TC)를 계산해 보았다. 상온에서 바로 냉각시킨 ZnO 박막(TC(002)=76.3%)이 느린 속도로 냉각시킨 박막(TC(002)=45.2%)보다 (002) 방향으로의 배향성이 우세하게 나타났으며, 잔류응력도 작았다. 뿐만 아니라 PL을 이용한 광학적 특성평가에서도 상온에서 바로 냉각시킨 ZnO 박막에서 더 강한 강도와 좁은 반치폭(full-width at halt-maximum)을 갖는 near-band-edge emission (NBE) 피크가 관찰되었다. 후열처리에 따른 구조적 및 광학적 특성 변화 또한 연구하였다.

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CVD를 이용한 산화아연 (ZnO) 나노구조 형성 및 특성평가

  • Kim, Jae-Su;Jo, Byeong-Gu;Lee, Gwang-Jae;Park, Dong-U;Kim, Hyeon-Jun;Kim, Jin-Su;Kim, Yong-Hwan;Min, Gyeong-In;Jeong, Hyeon;Jeong, Mun-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.179-179
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    • 2010
  • 1차원 나노구조를 갖는 ZnO를 성장하기 위해 Laser ablation, Chemical vapor deposition (CVD), Chemical transport method, Molecular beam epitaxy, Sputtering 등의 다양한 형성법들이 이용되어지고 있다. 특히 대량생산과 경제성 측면에서 많은 장점을 가지고 있는 CVD를 이용한 ZnO 성장 및 응용 연구가 활발하게 수행되고 있다. 본 연구에서는 Thermal CVD를 이용하여 반응물질과 기판 사이의 거리, 기판온도, $O_2$/Zn 비율 등의 성장변수를 변화시켜 ZnO 나노구조를 성장하고 구조 및 광학적 특성을 연구하였다. Scanning electron microscope를 통한 구조 특성평가 결과 반응물질과 기판 사이의 거리가 13 cm 이하의 조건에서 ZnO 나노구조들은 나노판(Nanosheet)과 나노선(Nanowire)이 혼재하여 성장된 것을 보였다. 그리고 반응물질과 기판사이의 거리가 15 cm 이상부터 나노판이 없어지고 수직한 ZnO 나노막대(Nanorod)가 형성되었다. 상온 Photoluminescence 스펙트럼에서 반응물질과 기판사이의 거리가 5에서 15 cm로 증가할수록 결함 (Defect)에 의해 발생된 515 nm 파장의 최대세기 (Maximum intensity)가 10배 이상 감소한 반면, ZnO 나노구조에 의한 378 nm 파장의 NBE발광 (Near band edge emission)은 8배 이상 증가하였다. 이러한 구조 및 광학적 결과로부터, 질서 없이 성장된 것보다 수직 성장된 ZnO 나노구조의 결정질(Crystal quality)이 좋은 것을 확인하였다. 이를 바탕으로 성장변수에 따른 ZnO 나노구조의 형성 메커니즘을 Zn와 O 원자의 성장거동을 기반으로 한 모델을 이용하여 해석하였다.

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Hydrothermal Growth and Characterization of ZnO Nanostructures on R-plane Sapphire Substrates (R-plane Sapphire 기판에 수열합성법으로 제작된 ZnO 나노구조체의 성장 및 특성)

  • Cho, Guan Sik;Kim, Min Su;Leem, Jae-Young
    • Korean Journal of Metals and Materials
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    • v.50 no.8
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    • pp.605-611
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    • 2012
  • ZnO nanostructures were grown on R-plane sapphire substrates with seed layers annealed at different temperatures ranging from 600 to $800^{\circ}C$. The properties of the ZnO nanostructures were investigated by scanning electron microscopy, high-resolution X-ray diffraction, UV-visible spectrophotometer, and photoluminescence. For the as-prepared seed layers, ZnO nanorods and ZnO nanosheets were observed. However, only ZnO nanorods were grown when the annealing temperature was above $700^{\circ}C$. The crystal qualities of the ZnO nanostructures were enhanced when the seed layers were annealed at $700^{\circ}C$. In addition, the full width at half maximum (FWHM) of near-band-edge emission (NBE) peak was decreased from 139 to 129 meV by increasing the annealing temperature to $700^{\circ}C$. However, the FWHM was slightly increased again by a further increase in the annealing temperature. Optical transmittance in the UV region was almost zero, while that in the visible region was gradually increased as the annealing temperature increased to $700^{\circ}C$. The optical band gap of the ZnO nanostructures was increased as the annealing temperature increased to $700^{\circ}C$. It is found that the optical properties as well as the structural properties of the rod-shaped ZnO nanostructures grown on R-plane sapphire substrates by hydrothermal method are improved when the seed layers are annealed at $700^{\circ}C$.

Investigation on Growth Characteristic of ZnO Nanostructure with Various O2 Pressures by Thermal Evaporation Process (열증착법으로 성장된 ZnO 나노구조물의 산소유량 변화에 대한 성장 변화)

  • Kim, Kyoung-Bum;Jang, Yong-Ho;Kim, Chang-Il;Jeong, Young-Hun;Lee, Young-Jin;Jo, Jeong-Ho;Paik, Jong-Hoo;Nahm, Sahn
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.10
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    • pp.839-843
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    • 2011
  • ZnO nanostructures were developed on a Si (100) substrate from powder mixture of ZnO and 5 mol% Pd (ZP-5) as reactants by ${\times}$ sccm oxygen pressures(x= 0, 10, 20, 40). DTA (differential thermal analysis) result shows the Pd(5 mol%)+ZnO mixtured powder(PZ-5) is easily evaporated than pure ZnO powder. The PZ-5 mixtured powder was characterized by DTA to determine the thermal decomposition which was found to be at $800^{\circ}C$, $1,100^{\circ}C$. Weight loss(%) and ICP (inductively coupled plasma) analysis reveal that Zn vaporization is decreased by increased oxygen pressures from the PZ-5 at $1,100^{\circ}C$ for 30 mins. Needle-like ZnO nanostructures array developed from 10 sccm oxygen pressure, was well aligned vertically on the Si substrate at $1,100^{\circ}C$ for 30 mins. The lengths of the Needle-like ZnO nanostructures is about 2 ${\mu}m$ with diameters of about 65 nm. The developed ZnO nanostructures exhibited growth direction along [001] with defect-free high crystallinity. It is considered that Zn vaporization is responsible for the growth of Needle-like ZnO nanostructures by controlling the oxygen pressures. The photoluminescence spectra of ZnO nanostructures exhibited stronger 376.7 nm NBE (near band-edge emission) peak and 529.3 nm DLE (deep level energy) peak.