• Title/Summary/Keyword: N $O_{}$ x/

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온도에 따른 $SiO_2$, $SiN_X$ 게이트 절연막 ITZO 산화물 반도체 트랜지스터 전기적 특성 연구

  • Kim, Sang-Seop;Go, Seon-Uk;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.243.2-243.2
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    • 2013
  • 본 실험에서 $SiO_2$, $SiN_x$ 게이트 절연막에 따른 ITZO 산화물 반도체 트랜지스터를 제작하여, 온도변화에 따라 전달 특성 변화를 측정하여 열에 대한 소자의 안정성을 비교, 분석하였다. 온도가 증가함에 따라 carrier가 증가하는 온도 의존성을 보이며, 이로 인해 Ioff가 증가하였다. multiple-trapping 모델을 적용하여, 이동도 증가와 문턱 전압이 감소를 확인하였다. 또한 M-N rule을 적용하여 $SiO_2$, $SiN_x$ 게이트 절연막을 가진 ITZO 산화물 박막 트랜지스터의 활성화 에너지를 추출하고, sub-threshold 지역에서 활성화 에너지의 변화량이 $SiO_2$, SiNX 각각 0.37 eV/V, 0.24 eV/V로 차이를 통해 $SiN_x$ 게이트 절연체를 가진 ITZO 산화물 반도체 트랜지스터의 이동도와 문턱 전압의 변화가 더 컸음을 확인하였다.

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EXISTENCE AND NON-EXISTENCE FOR SCHRÖDINGER EQUATIONS INVOLVING CRITICAL SOBOLEV EXPONENTS

  • Zou, Henghui
    • Journal of the Korean Mathematical Society
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    • v.47 no.3
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    • pp.547-572
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    • 2010
  • We study existence of positive solutions of the classical nonlinear Schr$\ddot{o}$dinger equation $-{\Delta}u\;+\;V(x)u\;-\;f(x,\;u)\;-\;H(x)u^{2*-1}\;=\;0$, u > 0 in $\mathbb{R}^n$ $u\;{\rightarrow}\;0\;as\;|x|\;{\rightarrow}\;{\infty}$. In fact, we consider the following more general quasi-linear Schr$\ddot{o}$odinger equation $-div(|{\nabla}u|^{m-2}{\nabla}u)\;+\;V(x)u^{m-1}$ $-f(x,\;u)\;-\;H(x)u^{m^*-1}\;=\;0$, u > 0 in $\mathbb{R}^n$ $u\;{\rightarrow}\;0\;as\;|x|\;{\rightarrow}\;{\infty}$, where m $\in$ (1, n) is a positive number and $m^*\;:=\;\frac{mn}{n-m}\;>\;0$, is the corresponding critical Sobolev embedding number in $\mathbb{R}^n$. Under appropriate conditions on the functions V(x), f(x, u) and H(x), existence and non-existence results of positive solutions have been established.

MoOx-Windowed High-Performing Transparent Photodetector (MoOx 기반의 고성능 투명 광검출기)

  • Park, Wang-Hee;Lee, Gyeongnam;Kim, Joondong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.6
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    • pp.387-392
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    • 2017
  • A high-performing all-transparent photodetector was created by configuring a $MoO_x$/NiO/ZnO/ITO structure on a glass substrate. The ITO bottom layer was applied as a back contact. To achieve the transparent p/n junction, p-type NiO was coated on the n-type ZnO layer. Reactive sputtering was used to spontaneously form the ZnO or NiO layer. In order to improve the transparent photodetector performance, the functional $MoO_x$ window layer was used. Optically, the $MoO_x$ window provided a refractive index layer (n=1.39) lower than that of NiO (n=2), increasing the absorption of the incident light wavelengths (${\lambda}s$). Moreover, the $MoO_x$ window can provide a lower sheet resistance to improve the carrier collection for the photoresponses. The $MoO_x$/NiO/ZnO/ITO device showed significantly better photoresponses of 877.05 (at ${\lambda}$=460nm), 87.30 (${\lambda}$=520 nm), and 30.38 (${\lambda}$=620 nm), compared to 197.28 (${\lambda}$=460 nm), 51.74 (${\lambda}$=520 nm) and 25.30 (${\lambda}$=620 nm) of the NiO/ZnO/ITO device. We demonstrated the high-performing transparent photodetector by using the multifunctional $MoO_x$ window layer.

Enhanced Anti-reflective Effect of SiNx/SiOx/InSnO Multi-layers using Plasma Enhanced Chemical Vapor Deposition System with Hybrid Plasma Source

  • Choi, Min-Jun;Kwon, O Dae;Choi, Sang Dae;Baek, Ju-Yeoul;An, Kyoung-Joon;Chung, Kwun-Bum
    • Applied Science and Convergence Technology
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    • v.25 no.4
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    • pp.73-76
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    • 2016
  • Multi-layer films of $SiN_x/SiO_x$/InSnO with anti-reflective effect were grown by new-concept plasma enhanced chemical vapor deposition system (PECVD) with hybrid plasma source (HPS). Anti-reflective effect of $SiN_x/SiO_x$/InSnO was investigated as a function of ratio of $SiN_x$ and $SiO_x$ thickness. Multi-layers deposited by PECVD with HPS represents the enhancement of anti-reflective effect with high transmittance, comparing to the layers by conventional radio frequency (RF) sputtering system. This change is strongly related to the optical and physical properties of each layer, such as refractive index, composition, film density, and surface roughness depending on the deposition system.

Structural and Dielectric Properties of $(1-y)Pb(Mg_{(1-x)/3}Zn_{x/3}Zn_{x/3}Nb_{2/3})O_3-yBaTiO_3$Ceramics ($(1-y)Pb(Mg_{(1-x)/3}Zn_{x/3}Zn_{x/3}Nb_{2/3})O_3-yBaTiO_3$ 세라믹스의 구조 및 유전 성질)

  • 홍영식;박휴범;김시중
    • Journal of the Korean Ceramic Society
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    • v.32 no.8
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    • pp.938-944
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    • 1995
  • Dielectric properties and the stabilization of perovskite phase for the (1-y)Pb(Mg(1-x)/3Znx/3Znx/3Nb2/3)O3-yBaTiO3 ((1-y)PM1-xZxN-yBT) ceramics have been investigated as a function of amount of x and y. In the (1-y)PM0.6Z0.4N-yBT ceramics, the amount of pyrochlore phae was decreased by the addition of 2 mol% BT and the dielectric constant was increased. However, the dielectric constant decreased with further addition of BT even though pyrochlore phase was decreased. Dielectric prooperties in (1-y)PM0.6Z0.4N-yBT ceracmis were affected by the character of the BT rather than the amount of pyrochlore phase. The phase transitions were broadened and phase transition temperatures were lowered by the increase of BT contents.

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Phase Relations and Microstructure of Comounds in the $Si_3N_4-Al_2O_3-SiO_2$ system at $1700^{\cire}C$ ($Si_3N_4-Al_2O_3-SiO_2$계의 1,$700^{\circ}C$에서 생성하는 화합물의 상관계 및 미구조)

  • Lee, Eey-Jong;Kim, Hwan
    • Journal of the Korean Ceramic Society
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    • v.16 no.4
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    • pp.206-212
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    • 1979
  • The phase relations and microstructure appeared at 1700℃ in a system of Si3N4-Al2O3-SiO2 were studied. The samples were pressurelessly sintered at 1700℃ for 1hr and reheated at 1600℃ for 1hr under nitrogen atmosphere. The compounds formed were identified by X-ray diffraction method and the microstrues were observed by SEM. The stable phases appeared in this system were X-phase, Si2ON2, β'-Si3N4 and Mullite. From the results of those experiments, it was concluded that the X-phase has very close composition to that proposed by G, K. Layden, Si3Al6O12N2. SEM photographs showed that Si2ON2 was a plate phase and X-phase was a rectagular plate phase.

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Influence of the Solid Solution for Crystalline Phase on the Characterization of $Bi_2Sr_2Ca{_{n-1}}Cu_nO_x$(n=0,1,2) Thin Films (결정상에 대한 고용체가 $Bi_2Sr_2Ca{_{n-1}}Cu_nO_x$(n=0,1,2) 박막의 특성에 미치는 영향)

  • Yang, Seung-Ho;Lee, Ho-Shik;Park, Yong-Pil
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.11 no.6
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    • pp.1115-1121
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    • 2007
  • [ $Bi_2Sr_2Ca{_{n-1}}Cu_nO_x$ ](n=0,1,2) thin fans have been fabricated by co-deposition at an ultra-low growth rate using ion beam sputtering(IBS) method. Bi 2212 phase appeared in the temperature range of 750 and $795^{\circ}C$ and single phase of Bi 2201 existed in the lower region than $785^{\circ}C$. Whereas, $PO_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with $T_c$(onset) of about 90 K and $T_c$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as $CaCuO_2$ was observed in all of the obtained films.

Formation and Intergrowth of the Superconducting Phase in the Bi2Sr2Can-1CunOx (n=2~4) System

  • Cheon, Min-Woo;Park, Yong-Pil
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.5
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    • pp.199-203
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    • 2004
  • Superconducting B $i_2$S $r_2$C $a_{n-l}$C $u_{n}$ $O_{x}$(n=2~4) thin films were prepared by single target DC-magnetron sputtering. And, that was compared with the B $i_2$S $r_2$C $a_{n-l}$C $u_{n}$ $O_{x}$(n=1~3) thin film fabricated by using the ion beam sputtering. Phase intergrowth among n=2-3, 3-4 and 4-5 phases was observed. The molar fraction of each phase in the mixed crystal of the deposited films was determined by x-ray diffraction analyses and investigated as a function of $O_2$ gas pressure during sputtering. We investigated the changes of the superconducting properties by molar fraction of each phase. Also, the thin film surface observation was carried out by atomic force microscope. The images show the average particle size decreases, and the distribution density of particles on the film surface was to increase with lower gas pressures. The fabrication conditions for selective growth of the single n=2, 3 and 4 phases in BiSrC $a_{n-l}$C $u_{n}$ $O_{x}$(n=2~4) thin film are discussed.e discussed.ussed.

Sticking Characteristics in Bi2Sr2CanCun+1Ox Thin Films Fabricated by using the Evaporation Method to Improve the Sticking Ratio (부착율 개선을 위해 증발 법으로 제작한 Bi2Sr2CanCun+1Ox 박막의 부착 특성)

  • 천민우;박용필
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.11
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    • pp.1029-1034
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    • 2003
  • The Bi$_2$Sr$_2$Ca$_{n}$Cu$_{n+1}$ O$_{x}$, superconducting thin films arc fabricated by using the sputtering and evaporation method. Because we confirmed the sticking ratio of Bi element in the Bi$_2$Sr$_2$Ca$_{n}$Cu$_{n+1}$ O$_{x}$ superconducting thin film fabricated by using the sputtering method was much lower than the expected value, to get the enough number of the flakes of Bi, faraday cup was used to evaporate Bi clement. As a result of the fabrication, Bi 2201 and Bi 2212 single phases could be made by the optima of deposition condition. And we confirmed the sticking coefficient of Bi element was clearly related to the temperature change of the substrate and the generation of Bi22l2 phase