• 한국전기전자재료학회논문지
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• 제27권2호
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• pp.71-75
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• 2014

To observe the optical characteristic of oxide semiconductor depending on the degree of bonding structures, SiOC, ZnO and IGZO were prepared by the RF magnetron sputter system and chemical vapor deposition. Generally, crystal ZnO, amorphous SiOC and IGZO changed the optical characteristics in according to the electro-chemical behavior due to the oxygen vacancy at an interface between different groups. Transmittance of SiOC and IGZO with amorphous structures was higher than that of ZnO with crystal structure, because of lowering the carrier concentration due to the recombination of electron and holes carriers as oxygen vacancies. Besides, the energy gap of amorphous SiOC and IGZO was higher than the energy gap of crystal ZnO. The diffusion mobility of holes is higher than the drift mobility of electrons.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.362-363
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• 2007

The transport property of stabilized amorphous selenium typical of the material used in direct conversion x-ray imaging devices was studied using the moving photo-carrier grating (MPG) technique and time-of-flight (TOF) measurements. For MPG measurement, the electron and hole mobility, and recombination lifetime of a-Se films with arsenic (As) additions have been obtained. For TOF measurement, a laser beam with pulse duration of 5ns and wavelength of 350 nm was illuminated on the surface of a-Se with thickness of $400{\mu}m$.

• The Korean Journal of Ceramics
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• 제4권2호
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• pp.103-113
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• 1998

By using a gas-tight electrochemical cell, we can perform high-temperature coulometric titration and measure electronic transport properties to determine the elecronic defect structure of metal oxides. This technique reduces the time and expense required for conventional thermogravimetric measurements. The components of the gas-tight coulometric titration cell are an oxygen sensor, Pt/yttria stabilitized zirconia(YSZ)/Pt, and an encapsulated metal oxide sample. Based on cell design, both transport and thermodynamic measurements can be performed over a wide range of oxygen partial pressure ($pO_2=10^{-35}$ to 1 atm). This paper describes the high-temperature gas-tight electrochemical cells used to determine electronic defect structures and transport properties for pure and doped-oxide systems, such as YSZ, doped and pure ceria $(Ca-CeO_2 \;and\; CeO_2)$, copper oxides and copper-oxide-based ceramic superconductors, transition metal oxides, $SrFeCo_{0.5}O_x,\; and \;BaTiO_2$.

• 한국통신학회논문지
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• 제25권8B호
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• pp.1469-1476
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• 2000

증가형 MOS FET에서 강반저의 경우 드레인 전류는 모두 드리프트에 기인하여 흐르기 때문에 I-V모델링시 수직전계와 수평전계를 함께 고려하여야한다. 특히 게이트전압 인가시 발생되는 수직전계는 표면이동도에 영향을 크게 주고 이로 인해서 캐리어들의 정상적인 흐름이 저해되는데 본 논문에서 제안한 다중 box분할법에 의하여 반전층의 깊이를 구하여 이동도 모델에 영향을 크게 미치는 반전층 내에서의 수직전계를 수치해석하였다.

• 한국전기전자재료학회논문지
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• 제20권1호
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• pp.14-18
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• 2007

The electric property in the $GaAs-Al_{x}Ga_{1-x}$ quantum well with the Si ${\delta}-doping$ layer in a non-central position is studied through the effect of the electric field intensity on the electron distribution. The finite difference method is used for the calculation of the subband energy level and its wavefunction. In order to account for the change of the potential energy due to the charged particles, the self consistent method is employed. As the Si ${\delta}-doping$ layer becomes closer to the heterojunction interface, the electrons less affected by Coulomb scattering are greatly increased under the external electric field. Therefore, the high speed device is suggested due to the fact that the high mobility electrons can be increased by positioning the ${\delta}-doping$ layer in the quantum well and by applying the electric field intensity.

• Advances in nano research
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• 제2권1호
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• pp.1-14
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• 2014

Dislocations are basic crystal defects and represent one-dimensional native nanostructures embedded in a perfect crystalline matrix. Their structure is predefined by crystal symmetry. Two-dimensional, self-organized arrays of such nanostructures are realized reproducibly using specific preparation conditions (semiconductor wafer direct bonding). This technique allows separating dislocations up to a few hundred nanometers which enables electrical measurements of only a few, or, in the ideal case, of an individual dislocation. Electrical properties of dislocations in silicon were measured using MOSFETs as test structures. It is shown that an increase of the drain current results for nMOSFETs which is caused by a high concentration of electrons on dislocations in p-type material. The number of electrons on a dislocation is estimated from device simulations. This leads to the conclusion that metallic-like conduction exists along dislocations in this material caused by a one-dimensional carrier confinement. On the other hand, measurements of pMOSFETs prepared in n-type silicon proved the dominant transport of holes along dislocations. The experimentally measured increase of the drain current, however, is here not only caused by an higher hole concentration on these defects but also by an increasing hole mobility along dislocations. All the data proved for the first time the ambipolar behavior of dislocations in silicon. Dislocations in p-type Si form efficient one-dimensional channels for electrons, while dislocations in n-type material cause one-dimensional channels for holes.

• 대한전자공학회논문지SD
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• 제42권9호
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• pp.9-18
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• 2005

60 nm C-MOSFET 기술 분기점 이상의 고성능, 저전력 트랜지스터를 구현 시키기 위해 SiGe/SiO2/Si위에 성장된 strained Si의 두께가 전자 이동도에 미치는 영향을 두 가지 관점에서 조사 연구하였다. 첫째, inter-valley phonon 산란 모델의 매개변수들을 최적화하였고 둘째, strained Si 반전층의 2-fold와 4-fold의 전자상태, 에너지 밴드 다이어그램, 전자 점유도, 전자농도, phonon 산란율과 phonon-limited 전자이동도를 이론적으로 계산하였다. SGOI n-MOSFET의 전자이동도는 고찰된 SOI 구조의 Si 두께 모든 영역에서 일반적인 SOI n-MOSFET보다 $1.5\~1.7$배가 높음이 관찰 되었다. 이러한 경향은 실험 결과와 상당히 일치한다. 특히 strained Si의 두께가 10 nm 이하일 때 Si 채널 두께가 6 nm 보다 작은 SGOI n-MOSFET에서의 phonon-limited 전자 이동도는 일반 SOI n-MOSFET과 크게 달랐다. 우리는 이러한 차이가 전자들이 suained SGOI n-MOSFET의 반전층에서 SiGe층으로 터널링 했기 때문이고, 반면에 일반 SOI n-MOSFET에서는 캐리어 confinement 현상이 발생했기 때문인 것으로 해석하였다. 또한 우리는 10 nm와 3 nm 사이의 Si 두께에서는 SGOI n-MOSFET의 phonon-limited 전자 이동도가 inter-valley phonon 산란율에 영향을 받는 다는 것을 확인하였으며, 이러한 결과는 더욱 높은 드레인 전류를 얻기 위해서 15 nm 미만의 채널길이를 가진 완전공핍 C-MOSFET는 stained Si SGOI 구조로 제작하여야 함을 확인 했다

• 한국인쇄학회지
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• 제22권1호
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• pp.75-82
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• 2004

The photoluminescence and electroluminescence of poly(9-vinylcarbazole) (PVCz) containing different ratio 1.3,5-dimethly-3,5-di-tert-butyl-4,4-diphenoquinone (MBDQ), 1.3,5-diemthyl-3.5-di-tert-butyl-4,4-stylbenquinone (MBSQ) were characterized. As the contents of DQ and SQ increased, the intensity of peaks at 516 and 540nm increased in PL spectra. The results of TOF measurement were shown that the hole mobility of PVCz decreased as the ratio of DQ or SQ increased. On the other hand, the electron mobility of PVCz increased. Therefore Electron transport is more favorable than hole transport in these charge transfer complexes, due to the stronger localization of the holes. Evidence for better electron transport is the higher mobility of electrons in pure DQ or SQ compared to hole mobility in pure PVCz, and lower DQ or SQ concentration required for equivalent mobilities in the charge-transfer complexes.

• 전자공학회논문지A
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• 제32A권12호
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• pp.122-129
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• 1995

The most important feature of a-Si TFT is dense localized states such as dangling bonds which exist in tis bandgap. Electrons trapped by localized states dominate the potential distribution in the active a-Si region ,and influence the performance of a-Si TFT. In this paper, we describe the electrical characteristics of a-Si TFT with respect to trap distribution within bandgap, electron mobility and interface states using 2-Dimensional device simulator and compare the result of simulation with measurements. Using the mixed-mode simulator, we can predict the potential variation of pixel which causes residual image problem during the turn-off of a-Si TFT driving circuit. Therefore it is possible to consider trade-off between potential variation of pixel and turn-on current of a-Si TFT for the optimized driving circuit.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 기술교육위원회 창립총회 및 학술대회 의료기기전시회
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• pp.43-46
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• 2001

The DC dielectric breakdown of epoxy composites used for transformer was experimented and then its data were simulated by Weibull distribution equation in this study. The more hardener increased the stronger breakdown strength at low temperature because of cross-linked density by the virtue of ester radical, and the breakdown strength of specimens with filler was lower than it of non-filler specimens because it was believed that the adding filler formed interface, charges were accumulated in it, the molecular mobility was raised, the electric field was concentrated, electrons were accelerated and then electron avalanche was early accomplished. From the analysis of Wei bull distribution equation, it was confirmed that as the allowed breakdown probability was· given by 0.1[%], the value of 'applied field was needed to be under 17.20[kV/mm].