• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.153-153
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• 2009

We investigated the dependence of the memory margin of the Cap-less memory cell on the strain of top silicon channel layer and also compared kink effect of strained Cap-less memory cell with the conventional Cap-less memory cell. For comparison of the characteristic of the memory margin of Cap-less memory cell on the strain channel layer, Cap-less transistors were fabricated on fully depleted strained silicon-on-insulator of 0.73-% tensile strain and conventional silicon-on-insulator substrate. The thickness of channel layer was fabricated as 40 nm to obtain optimal memory margin. We obtained the enhancement of 2.12 times in the memory margin of Cap-less memory cell on strained-silicon-on-insulator substrate, compared with a conventional SOI substrate. In particular, much higher D1 current of Cap-less memory cell was observed, resulted from a higher drain conductance of 2.65 times at the kink region, induced by the 1.7 times higher electron mobility in the strain channel than the conventional Cap-less memory cell at the effective field of 0.3MV/cm. Enhancement of memory margin supports the strained Cap-less memory cell can be promising substrate structures to improve the characteristics of Cap-less memory cell.

• 한국통신학회논문지
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• 제34권9C호
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• pp.880-886
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• 2009

메모리는 최근 많은 전자제품에 이용되면서 많은 연구자들이 메모리에 대한 연구를 진행하고 있다. 그중, 단위 면적당 저장용량을 증가하기 위한 많은 연구들이 진행되고 있는데, 단위 면적당 저장용량을 증가하기 위하여 메모리의 공정의 크기를 줄이는 연구 뿐 아니라, 최근에는 한 셀에 2비트 이상의 데이터를 저장 할 수 있는 멀티 레벨 셀 메모리의 연구가 진행되고 있다. 하지만, 한 셀에 멀티 비트를 저장하게 되면서 다양한 오류들로 인하여 저장된 데이터를 정확히 읽는 데 어려움이 많다. 본 논문에서는 멀티 레벨 셀 메모리의 오류의 요인을 분석하고 그에 대한 멀티 레벨 셀 메모리의 채널을 모델링 하였다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제15권2호
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• pp.286-291
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• 2015

For highly scalable NAND flash memory applications, a compact ($4F^2/cell$) nonvolatile memory architecture is proposed and investigated via three-dimensional device simulations. The back-channel program/erase is conducted independently from the front-channel read operation as information is stored in the form of charge at the backside of the channel, and hence, read disturbance is avoided. The memory cell structure is essentially equivalent to that of the fully-depleted transistor, which allows a high cell read current and a steep subthreshold slope, to enable lower voltage operation in comparison with conventional NAND flash devices. To minimize memory cell disturbance during programming, a charge depletion method using appropriate biasing of a buried back-gate line that runs parallel to the bit line is introduced. This design is a new candidate for scaling NAND flash memory to sub-20 nm lateral dimensions.

• 경영과학
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• 제26권1호
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• pp.171-182
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• 2009

We consider the inventory replenishment problem and the vehicle routing problem simultaneously in the vending machine operation. This problem is known as the inventory routing problem. We design a memory cell in the clonal selection algorithm. The memory cell store the best solution of previous solved problem and use an initial solution for next problem. In general, the other clonal selection algorithm used memory cell for reserving the best solution in current problem. Experiments are performed for testing efficiency of the memory cell in demand uncertainty. Experiment result shows that the solution quality of our algorithm is similar to general clonal selection algorithm and the calculations time is reduced by 20% when the demand uncertainty is less than 30%.

• 정보처리학회논문지:컴퓨터 및 통신 시스템
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• 제5권1호
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• pp.1-6
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• 2016

본 논문은 NAND Flash Memory 수명을 향상시키기 위한 동작 algorithm 개선을 제안한다. Flash memory에 대한 read/write/erase 과정에서, 해당 cell의 Vth가 원하는 level대로 위치를 한다면 문제가 없으나, 원하는 위치대비 변동이 되어 있다면 잘못된 data를 읽어내게 된다. 이러한 cell간 interference나 disturbance 현상들은 program이나 erase 동작이 반복(EW cycle)될수록 더 심해지는 특징이 있다. 이는 반복되는 high bias 인가상태에서 벌어지는 FN tunneling 현상으로 인한 tunnel oxide 막질손상(trap site 증가)에 기인한다고 알려져 있다. 본 논문에서는 erase cell 관점에서 stress양 자체를 감소시킴으로써 cell 열화 속도를 느리게 하여, 궁극적으로 발생하는 Vth 변동사항인 disturbance를 줄일 수 있는 erase 동작방법에 대해 논한다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제2권3호
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• pp.197-204
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• 2002

DRAM, SRAM, and FLASH memory are three major memory devices currently used in most electronic applications. But, they have very distinct attributes, therefore, each memory could be used only for limited applications. MRAM (Magneto-resistive Random Access Memory) is a promising candidate for a universal memory that meets all application needs with non-volatile, fast operational speed, and low power consumption. The simplest architecture of MRAM cell is a series of MTJ (Magnetic Tunnel Junction) as a data storage part and MOS transistor as a data selection part. To be a commercially competitive memory device, scalability is an important factor as well. This paper is testing the actual electrical parameters and the scaling factors to limit MRAM technology in the semiconductor based memory device by an actual integration of MRAM core cell. Electrical tuning of MOS/MTJ, and control of resistance are important factors for data sensing, and control of magnetic switching for data writing.

• 반도체디스플레이기술학회지
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• 제5권1호
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• pp.17-20
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• 2006

This paper presents of a new type of memory cell that could potentially replace both DRAM and flash memory. The proposed device cell operates by sensing the state of about 1,000 electrons trapped between unique insulating barriers in the channel region of the upper transistor. These electrons are controlled by a side gate on the transistor, and their state in turn controls the gate of the larger transistor, providing signal gain within the memory cell. It becomes faster and more reliable memory with lower operation voltage. Moreover, the use of a multiple tunnel junction (MTJ) fur the vertical transistor can significantly improve the data retention and operation speed.

• IMMUNE NETWORK
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• 제20권3호
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• pp.20.1-20.15
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• 2020

Memory CD8+ T cells in the immune system are responsible for the removal of external Ags for a long period of time to protect against re-infection. Naïve to memory CD8+ T cell differentiation and memory CD8+ T cell maintenance require many different factors including local environmental factors. Thus, it has been suggested that the migration of memory CD8+ T cells into specific microenvironments alters their longevity and functions. In this review, we have summarized the subsets of memory CD8+ T cells based on their migratory capacities and described the niche hypothesis for their survival. In addition, the basic roles of CCR7 in conjunction with the migration of memory CD8+ T cells and recent understandings of their survival niches have been introduced. Finally, the applications of altering CCR7 signaling have been discussed.

• 대한전기학회논문지:시스템및제어부문D
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• 제51권8호
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• pp.344-351
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• 2002

The proposed immune algorithm has an uncomplicated structure and memory-cell mechanism as the optimization algorithm which imitates the principle of humoral immune response. We use the proposed algorithm to solve parameter optimization problems. Up to now, the applications of immune algorithm have been optimization problems with non-varying system parameters. Therefore the usefulness of memory-cell mechanism in immune algorithm is without. This paper proposes the immune algorithm using a memory-cell mechanism which can be the application of system with nonlinear varying parameters. To verified performance of the proposed immune algorithm, the speed control of nonlinear DC motor are performed. The results of Computer simulations represent that the proposed immune algorithm shows a fast convergence speed and a good control performances under the varying system parameters.

• 전기학회논문지
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• 제59권6호
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• pp.1095-1102
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• 2010

This paper presents an equalizer reducing CCI(cell-to-cell interference) in MLC NAND flash memory. High growth of the flash memory market has been driven by two combined technological efforts that are an aggressive scaling technique which doubles the memory density every year and the introduction of MLC(multi level cell) technology. Therefore, the CCI is a critical factor which affects occurring data errors in cells. We introduced an equation of CCI model and designed an equalizer reducing CCI based on the proposed equation. In the model, we have been considered the floating gate capacitance coupling effect, the direct field effect, and programming methods of the MLC NAND flash memory. Also we design and verify the proposed equalizer using Matlab. As the simulation result, the error correction ratio of the equalizer shows about 20% under 20nm NAND process where the memory channel model has serious CCI.