• 제목/요약/키워드: MO

검색결과 17,185건 처리시간 0.044초

모정건축이 갖는 건축적 의미에 관한 연구 (A Study on the Architectural Means of Mo-Jung)

  • 김학삼
    • 한국주거학회논문집
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    • 제12권2호
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    • pp.65-76
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    • 2001
  • The study background is that Mo-Jung happens as the produce of the agricultural society but it is not easy to find it beside Ho-nam area. Because of this, it results construction has. The study progress is to understand the happening time, and regional cause the Mo-Jung construction has. The study progress is to understand the happening time of Mo-Jung, constructional meaning, and the meaning of Mo-Jung with the investigation method of literature consideration of the village society, data of the existing study, survey investigation, interview, and question through the process of analyzing the characteristics of differentiation of the village and Dure organization. 1. Mo-Jung construction has the meaning of vernacular construction reflecting the meaning of village community intensively as an element comprising the village, and the territory of Mo-Jung space is revealed as the male space. 2. The economic wealth of the village community and the image reflecting the community sense are stood out. 3. It is the reason why Mo-Jung construction is limited to Ho-nam area and is explained as the life style difference each village community has, the regional characteristic difference Dae-dong play of Yong.Ho-nam areas have, etc. so to speak. 4. It is estimated that the happening time of Mo-Jung is after the 18th century when the agricultural As my suggestion, Mo-Jung construction is the construction phenomenon reflecting the phenomenon of social change directly and it is to suggest the possibility of approaching the regional housing construction as the life style difference the life community of each area has is reflected. production quantity was increased and Dure organization was activated.

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MoS2 기반의 쇼트키 반도체 광전소자 (MoS2-Embedded Schottky Photoelectric Devices)

  • 반동균;박왕희;정복만;김준동
    • 한국전기전자재료학회논문지
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    • 제30권7호
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    • pp.417-422
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    • 2017
  • A high-performing photoelectric device was realized for the $MoS_2$-embedded Si device. $MoS_2$-coating was performed by an available large-scale sputtering method. The $MoS_2$-layer coating on the p-Si spontaneously provides the rectifying current flow with a significant rectifying ratio of 617. Moreover, the highly optical transmittance of the $MoS_2$-layer provides over 80% transmittance for broad wavelengths. The $MoS_2$-embedded Si photodetector shows the sensitive photo-response for middle and long-wavelength photons due to the functional $MoS_2$-layer, which resolves the conventional limit of Si for long wavelength detection. The functional design of $MoS_2$-layer would provide a promising route for enhanced photoelectric devices, including photovoltaic cells and photodetectors.

중간층 조건에 따른 Cr-Mo-N 막의 상형성 및 마찰마모 거동 연구 (Tribology and Phase Evolution of Cr-Mo-N Coatings with Different Interlayer Condition)

  • 양영환;여인웅;박상진;임대순;오윤석
    • 한국표면공학회지
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    • 제44권6호
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    • pp.269-276
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    • 2011
  • Phase evolution and tribological behavior of Cr-Mo-N multi compositional films with different interlayer were investigated. The films were deposited by hybrid PVD (Physical Vapor Deposition) system consisted of dc unbalanced magnetron (UBM) sputtering and arc ion plating (AIP) sources. A pure molybdenum (Mo) was used as sputtering target and also a pure Cr was used as AIP target to form the Cr-Mo-N films. Various growth planes were found, no textured surface, in all of the multi composition films. Maximum value of microhardness was measured in Cr-Mo-N film with Mo interlayer as 29 GPa. Composition film was mainly showed the aspect of the adhesive wear than CrN film. The friction coefficient was decreased from 0.6 for pure CrN coating to 0.35 for Cr-Mo-N film with Mo interlayer. This result may come from the formation of metal oxide tribo-layer which is known as solid lubricant during the wear test.

Fe-P-C-B-Al-Mo계 비정질합금의 열적.화학적 성질에 미치는 P 및 Mo의 영향 (The Effect of P and Mo for Thermal and Chemical Properties of Fe-PC-B-Al-Mo Amorphous Alloys)

  • 국진선;전우용
    • 열처리공학회지
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    • 제15권2호
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    • pp.76-81
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    • 2002
  • The melt-spun amorphous $Fe_{77-X}P_{13}C_4B_4Al_2Mo_X$(x=4~10) and $Fe_{82-X}P_XC_4B_4Al_2Mo_8$(x=9~15) alloys were found to exhibit a large supercooled liquid region(${\Delta}T_x$) exceeding 40 K before crystallization. The largest ${\Delta}T_x$ for the glassy alloys containing Mo reaches as large as 65 K for the $Fe_{69}P_{13}C_4B_4Al_2Mo_8$ alloy. The corrosion behavior of the amorphous $Fe_{77-X}P_{13}C_4B_4Al_2Mo_X$(x=4~15) and $Fe_(82-X)P_XC_4B_4Al_2Mo_8$ (x=9~17) alloys were examined by electrochemical measurements in 9M $H_2SO_4$ solution at 303 K. The addition of Mo(or P) for replacing some portion of Fe is effective in improving the corrosion resistance of the investigated Fe-based glassy alloys. They are spontaneously passivated and have a wide passive region with low passive current density.

$MoS_2$ 박막 증착을 위한 Mo 전구체 특성 평가

  • 문지훈;박명수;윤주영;강상우;신재수;이창희;김태성
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.252-252
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    • 2013
  • 최근 그래핀, hexagonal boron nitride (h-BN) 및 $MoS_2$ (molybdenum disulfide)와 같은 2차원 결정 물질들은 무어의 법칙(Moore's Law)를 뛰어넘어 계속적인 소자의 소형화를 가능케 하고 또한 대면적, 저비용 소자 개발을 가능케 하는 우수한 특성을 가진 차세대 반도체 트랜지스터 소재로 각광받고 있다. $MoS_2$는 bulk 상태일 때는 1.2 eV의 indirect 밴드갭을 가지지만 단층형태일 때는 1.8 eV의 direct 밴드갭을 가지며 dielectric screening 기법등을 통해 mobility를 향상시킬 수 있는 것으로 연구된 바 있다. 본 연구에서는 화학기상증착 (chemical vapor deposition)법을 이용하여 $MoS_2$ 박막을 형성하기 위한 기초연구인 Mo 전구체의 특성평가 및 적합한 공정조건 개발 연구를 수행하였다. 사용한 전구체는 $Mo(CO)_6$ (Molybdenum hexacarbonyl)이고, 온도 및 압력, 반응기체(H2 S, Hydrogen sulfide) 유량 등의 공정 조건 변화에 따른 거동을 Fourier transform infrared spectroscopy (FT-IR) 시스템을 사용하여 측정하였다. 또한 $Mo(CO)_6$의 분자구조를 상용 프로그램인 Gaussian으로 시뮬레이션 하여 실제 FT-IR 측정 결과값과 비교 분석하였다.

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아쿠아옥소몰리브텐(V) 이합체 착물과 바나듐(V)과의 반응에 대한 속도와 메카니즘 (Rates and Mechanism of the Reactions of Aquaoxomolybdenum(V) Dimer with Vanadium(V))

  • 김창수;이문평
    • 대한화학회지
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    • 제30권6호
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    • pp.532-537
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    • 1986
  • $VO_2^+$$[Mo_2O_4(H_2O)_6]^{2+}$의 반응에 대한 속도론은 25$^{\circ}$C에서 분광광도법으로 연구하였다. $[Mo_2O_4(H_2O)_6]^{2+}$이 산화반응의 화학양론은$ Mo_2^V + 2V^V {\rightleftharpoons} 2Mo^{VI} + 2V^{IV}$이다. 관찰된 유사일차속도상수, $k_{obs}$는 수소이온과 $ VO^{2+}$에 의존한다. $[Mo_2O_4(H_2O)_6]^{2+}$$VO^{2+}$의 산화-환원반응에 대한 메카니즘이 제시되며 이에 대하여 논의된다.

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Dissolution of Mo/Al Bilayers in Phosphoric Acid

  • Kim, In-Sung;Chon, Seung-Whan;Kim, Ky-Sub;Jeon, Il-Cheol
    • Bulletin of the Korean Chemical Society
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    • 제24권11호
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    • pp.1613-1617
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    • 2003
  • In the phosphoric acid based etchant, the dissolution rates of Mo films were measured by microgravimetry and the corrosion potentials of Mo and Al were estimated by Tafel plot method with various concentrations of nitric acid. Dissolution rate of Mo increased with the nitric acid concentration and reached a limiting value at high concentration of nitric acid in ambient condition. Corrosion potentials of Mo and Al shifted to positive direction and the difference between potentials of both metals was about 1,100 mV and 1,200 mV with 1% and above 4% of $HNO_3$, respectively. For a Mo/Al bilayers, the dissolution rate inversion is the main reason for good taper angle in shower etching process. Taper angles are observed by scanning electron microscope (SEM) after wet etching process for Mo/Al layered films with different concentrations of $HNO_3$. In the etch side profile, it was found that Al corroded faster than Mo below 4% of $HNO_3$ in dip etching process, however, Mo corroded faster above 4%. Trend for variation of taper angle of etched side of Mo/Al layered film can be explained by considering the effect corrosion rates of both metals with various concentrations of $HNO_3$.

Synthesis and Characterization of Nb, Mo-doped and Nb/Mo-codoped Monoclinic VO2 Nanoparticles and Their Thin Films by Hydrothermal/Post-Thermal Transformation and Wet-Coating Method

  • Kim, Jongmin;Jung, Young Hee;Kwak, Jun Young;Kim, Yeong Il
    • 대한화학회지
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    • 제63권2호
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    • pp.94-101
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    • 2019
  • Nb, Mo-doped and Nb/Mo-codoped $VO_2(M)$ nanocrystallites with various doping levels were synthesized for the first time by a hydrothermal and post thermal transformation method. The reversible phase transition characteristics of those doped $VO_2(M)$ was comparatively investigated. Nb-doping of $VO_2(M)$ by this method resulted in a very efficient lowering of the transition temperature ($T_c$) with a rate of $-16.7^{\circ}C/at.%$ that is comparable to W-doping, while Mo-doping did not give a serious reduction of $T_c$ with only a rate of $-5.1^{\circ}C/at.%$. Nb/Mo-codoping gave a similar result to Nb-doping without a noticeable difference. The thin films of Nb-doped and Nb/Mo-codoped $VO_2(M)$ with a thickness of ca. 120 nm were prepared by a wet-coating of the nanoparticle-dispersed solutions. Those films showed a good thermochromic modulation of near infrared radiation with 30-35% for Nb-doped $VO_2(M)$ and 37-40% for Nb/Mo-codoped ones. Nb/Mo-codoped $VO_2(M)$ film showed slightly enhanced thermochromic performance compared with Nb-doped $VO_2(M)$ film.

차세대 초고온 합금인 Mo-Si-B 합금의 연구 동향 (Research Trends of the Mo-Si-B Alloys as Next Generation Ultra-high-temperature Alloys)

  • 최원준;박천웅;박정효;김영도;변종민
    • 한국분말재료학회지
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    • 제26권2호
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    • pp.156-165
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    • 2019
  • Over the last decade, the next generation's ultra-high-temperature materials as an alternative to Nickel-based superalloys have been highlighted. Ultra-high-temperature materials based on refractory metals are one of several potential candidates. In particular, molybdenum alloys with small amounts of silicon and boron (Mo-Si-B alloys) have superior properties at high temperature. However, research related to Mo-Si-B alloys were mainly conducted by several developed countries but garnered little interest in Korea. Therefore, in this review paper, we introduce the development history of Mo-Si-B alloys briefly and discuss the properties, particularly the mechanical and oxidation properties of Mo-Si-B alloys. We also introduce the latest research trends of Mo-Si-B alloys based on the research paper. Finally, for domestic research related to this field, we explain why Mo-Si-B alloys should be developed and suggest the potential directions for Mo-Si-B alloys research.

다양한 조건의 플라즈마 원자층 증착법으로 증착된 Mo 금속의 전기적 특성 (Electrical Properties of Molybdenum Metal Deposited by Plasma Enhanced - Atomic Layer Deposition of Variation Condition)

  • 임태완;장효식
    • 한국재료학회지
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    • 제29권11호
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    • pp.715-719
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    • 2019
  • Molybdenum is a low-resistivity transition metal that can be applied to silicon devices using Si-metal electrode structures and thin film solar cell electrodes. We investigate the deposition of metal Mo thin film by plasma-enhanced atomic layer deposition (PE-ALD). $Mo(CO)_6$ and $H_2$ plasma are used as precursor. $H_2$ plasma is induced between ALD cycles for reduction of $Mo(CO)_6$ and Mo film is deposited on Si substrate at $300^{\circ}C$. Through variation of PE-ALD conditions such as precursor pulse time, plasma pulse time and plasma power, we find that these conditions result in low resistivity. The resistivity is affected by Mo pulse time. We can find the reason through analyzing XPS data according to Mo pulse time. The thickness uniformity is affected by plasma power. The lowest resistivity is $176{\mu}{\Omega}{\cdot}cm$ at $Mo(CO)_6$ pulse time 3s. The thickness uniformity of metal Mo thin film deposited by PE-ALD shows a value of less than 3% below the plasma power of 200 W.