• 한국레이저가공학회지
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• 제18권4호
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• pp.1-5
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• 2015

For continuous laser micro patterning on three-dimensional free form surface, innovative laser system is developed. The two axis galvanometer is combined with the dynamic focusing unit to increase optical distance. Also, it is synchronized with the 3 axis mechanical system. To determine laser machining sequence, laser CAM system is developed. It can make possible of 3D surface micro patterning under $25{\mu}m$ pattern width. The uniformity of pattern width is about 2.8% and it is validated that focal plane is well conserved by the dynamic focusing unit. Velocity and positional information of 1 axis is stage is fed to the scanner control board by the encoder signal and it makes possible real time synchronization. With this system, possible patterning volume is enlarged from $40{\times}40mm^2$ to $40{\times}120{\times}30mm^3$.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2005년도 금형가공,미세가공,플라스틱가공 공동 심포지엄
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• pp.54-58
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• 2005

Femtosecond laser is the latest generation pulsed laser delivering shortest pulses. Any solid materials can be machined by it. Femtosecond laser micromachining allows highest precision and minimal heat influence within the workpiece. But due to the complex physical phenomena between the laser beam and the workpiece materials, it is very difficult to determine the optimal process conditions in the femtosecond laser micromachining. In this study, a method to simulate the femtosecond laser micromachining process was proposed. And femtosecond laser micro patterning processes of chromium thin film are simulated by the proposed method using a commercial FE code, LS-Dyna. Simulation results were compared with those of experiments.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.369-372
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• 2004

Photo-induced surface alignment is charming as a non-contact photo-patternable alignment technology which can be used in the next generation of displays, such as large area, multi-domain. For decades, many polymer film have been investigated and developed to be used in the photo alignment. Among these photoreactive materials, recently developed polyimide, Chloromethylated Polyimide(CMPI) now became the focus of interests in this area because of its high photosensitivity and superior thermal stability. In this report, we present micro patterning method to form the nanoscale structure by Mask-Less laser patterning using this CMPI film and NSOM probe.

• 한국전기전자재료학회논문지
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• 제13권6호
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• pp.538-544
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• 2000

The laser patterning of sputter-deposited CoNdZr/Cu/CoNbZr multi-layered films had been tried using Nd:YAG laser. However generally it is very difficult to remove metal films because of their high reflectance of the laser on the surfaces. As a counterproposal for this problem authors for the first time tried to deposit energy-absorbing layers on the metal films and then irradiated the laser on the surfaces of energy-absorbing layers. Here the energy-absorbing layers consisted of laser energy-absorbing fine powders and binding polymers. Three kinds of powders for the energy-absorbing layers had been used to see the difference in the pattern formation with the degree of laser energy absorption. They were electrically conductive silver powders insulating BaTiO$_3$powder and semiconducting carbon powder. Remarkable difference in width of the formed pattern and the roughness of pattern edge were observed with the characteristic of the powder for the energy-absorbing layer. The pattern width using carbon paste was about three times larger than that using BaTiO$_3$paste. It was observed that the energy-absorbing layer with carbon was the most effective on this micro-patterning.

• 한국정밀공학회지
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• 제27권2호
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• pp.25-28
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• 2010

The micro fabrication on the mold material using picosecond laser ablation processing has been studied. We used the two kind of system with picosecond laser. First one is two mirror type scanner and telecentric f-theta lens. Second one is X-Y stage and objective lens. By using these system, the $100{\mu}m$ size chess patterning and $2{\mu}m$ size patterning was fabricated. Especially $2{\mu}m$ size patterning on the mold material can be used as the decorative rainbow color logo for industrial field. In this paper, it is proved the picosecond laser is effective tool for the laser ablation processing.

• 한국자기학회지
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• 제13권3호
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• pp.115-120
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• 2003

스퍼터링 방법으로 FM/M/FM의 다층박막을 증착한 다음 초소형 박막 인덕터를 제작하기 위하여 반도체 공정을 대체할 수 있는 레이저 미세가공 기술을 개발하였다. TE $M_{00}$ 모드로 발진하는 CW Nd:YAG 레이저를 active Q-switching 하여 펄스폭이 200 ns인 극 초단 레이저 펄스를 얻었다. 레이저 미세가공 조건을 반복율 5 kHz, 펄스 당 에너지 5 mJ/pulse로 최적화 하여 분해능이 20 $\mu\textrm{m}$인 line patterning을 얻었다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2011년도 춘계학술대회 논문집
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• pp.247-248
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• 2011

• International Journal of Precision Engineering and Manufacturing
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• 제7권1호
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• pp.13-17
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• 2006

Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

• 한국정밀공학회지
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• 제21권12호
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• pp.160-166
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• 2004

Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated fer applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecule and bio molecule. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAMs structure formation.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.219-222
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• 2003

Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecular and bio molecular. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance in selective etching of thin metal film of Self- Assembled Monolayers. In this report, we present the micromachining thin metal film by Mask-Less laser patterning of alknanethiolate Self-Assembled Monolayers.