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http://dx.doi.org/10.4283/JKMS.2003.13.3.115

Laser Micro-machining technology for Fabrication of the Micro Thin-Film Inductors  

Ahn, Seong-Joon (선문대학교 정보통신전공)
Ahn, Seung-Joon (선문대학교 차세대반도체기술연수소)
Kim, Dae-Wook (선문대학교 차세대반도체기술연수소)
Kim, Ho-Seob (선문대학교 차세대반도체기술연수소)
Kim, Cheol-Gi (충남대학교 신소재공학부)
Abstract
We have developed laser micro-machining technology for fabrication of the micro thin-film inductors. After the thin layers of FM/M/FM films were coated to the silicon substrate by using the conventional sputtering method, the new laser machining was applied to the patterning process that used to be carried out by the semiconductor lithography procedure. A CW Nd:YAG laser operating in TEM$\sub$00/ mode was actively Q-switched to obtain the very short pulse of 200 ns. The laser micro-machining process with pulse energy and repetition rate have been optimized as 5 mJ/pulse and 5 kHz, respectively, to obtain the line resolution as fine as 20 $\mu\textrm{m}$.
Keywords
line patterning; Laser micro-machining; Micro thin-film inductors Active Q-switched Nd:Yag laser; FM/M/Fm multi-layer thin film line patterning;
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