Micromachining Thin Film Using Femtosecond Laser Photo Patterning Of Organic Self-Assembled Monolayers.

유기 자기조립 단분자막의 레이저 포토 패터닝을 이용한 박막 미세 형상 가공 기술

  • 최무진 (한국기계연구원 나노공정그룹) ;
  • 장원석 (한국기계연구원 나노공정그룹) ;
  • 김재구 (한국기계연구원 나노공정그룹) ;
  • 조성학 (한국기계연구원 나노공정그룹) ;
  • 황경현 (한국기계연구원 나노공정그룹)
  • Published : 2004.12.01

Abstract

Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated fer applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecule and bio molecule. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAMs structure formation.

Keywords

References

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