• Title/Summary/Keyword: Insulated Gate Bipolar Transistor

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A Study on the Electrical Characteristics with Design Parameters in 1,200 V Trench Gate Field Stop IGBT (1,200 V급 Trench Gate Field Stop IGBT 소자의 전기적 특성 향상 방안에 관한 연구)

  • Geum, Jong-Min;Jung, Eun-Sik;Kang, Ey-Goo;Sung, Man-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.4
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    • pp.253-260
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    • 2012
  • IGBT (insulated gate bipolar transistor) have received wide attention because of their high current conduction and good switching characteristics. To reduce the power loss of IGBT, the on state voltage drop should be lowered and the switching time should be shorted. However, there is Trade-off between the breakdown voltage and the on state voltage drop. To achieving good electrical characteristics, field stop IGBT (FS IGBT) is proposed. In this paper, 1,200 V planar gate non punch-through IGBT (planar gate NPT IGBT), planar gate FS IGBT and trench gate FS IGBT is designed and optimized. The simulation results are compared with each three structures. In results, we optain optimal design parameters and confirm excellence of trench gate FS IGBT. Experimental result by using medici, shows 40% improvement of on state voltage drop.

A Study on Parameters for Design of IGBT (IGBT 설계 Parameter 연구)

  • Lho, Young-Hwan;Lee, Sang-Yong;Kim, Yoon-Ho
    • Proceedings of the KSR Conference
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    • 2009.05a
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    • pp.1943-1950
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    • 2009
  • The development of high voltage Insulated Gate Bipolar Transistor (IGBT) have given new device advantage in the areas where they compete with conventional GTO (Gate Turnoff Thyristor) technology. The IGBT combines the advantages of a power MOSFET (Metal-Oxide Semiconductor Field-Effect Transistor) and a bipolar power transistor. The change of electrical characteristics for IGBT is mainly coming from the change of characteristics of MOSFET at the input gate and the PNP transistors at the output. The gate oxide structure gives the main influence on the changes in the electrical characteristics affected by environments such as radiation and temperature, etc.. The change of threshold voltage, which is one of the important design parameters, is brought by charge trapping at the gate oxide. In this paper, the electrical characteristics are simulated by SPICE simulation, and the parameters are found to design optimized circuits.

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Turn-on Loss Reduction for High Voltage Power Stack Using Active Gate Driving Method

  • Kim, Jin-Hong;Park, Joon Sung;Gu, Bon-Gwan;Won, Chung-Yuen
    • Journal of Electrical Engineering and Technology
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    • v.12 no.2
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    • pp.632-642
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    • 2017
  • This paper presents an improved approach towards reducing the switching loss of insulated gate bipolar transistors (IGBTs) for a medium-capacity-class power conditioning system (PCS). In order to improve the switching performance, the switching operation is analyzed, and based on this analysis, an improved switching method that reduces the switching time and switching loss is proposed. Compared to a conventional gate drive scheme, the switching loss, switching time, and delay are improved in the proposed gate driving method. The performance of the proposed gate driving method is verified through several experiments.

Study on the Electrical Characteristics of 600 V Trench Gate IGBT with Single N+ Emitter (600 V급 IGBT Single N+ Emitter Trench Gate 구조에 따른 전기적 특성)

  • Shin, Myeong Cheol;Yuek, Jinkeoung;Kang, Ey Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.5
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    • pp.366-370
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    • 2019
  • In this paper, a single N+ emitter trench gate-type insulated gate bipolar transistor (IGBT) device was studied using T-CAD, in order to achieve a low on-state voltage drop (Vce-sat) and high breakdown voltage, which would reduce power loss and device reliability. Using the simulation, the threshold voltage, breakdown voltage, and on-state voltage drop were studied as a function of the temperature, the length of time in the diffusion process (drive-in) after implant, and the trench gate depth. During the drive-in process, a $20^{\circ}C$ change in temperature from 1,000 to $1,160^{\circ}C$ over a 150 minute time frame resulted in a 1 to 4 V change in the threshold voltage and a 24 to 2.6 V change in the on-state voltage drop. As a result, a 0.5 um change in the trench depth of 3.5 to 7.5 um resulted in the breakdown voltage decreasing from 802 to 692 V.

A New SOl LIGBT Structure with Improved Latch-Up Performance

  • Sung, Woong-Je;Lee, Yong-11;Park, Woo-Beom;Sung, Man-Young
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.283-285
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    • 2001
  • In this paper, a new lateral insulated gate bipolar transistor (LIGBT) is proposed to improve the latch-up performance without current path underneath the n+ cathode region. The improvement of latch-up performance is verified using the two-dimensional simulator MEDICI and the simulation results on the latch-up current density are 3.12${\times}$10$\^$-4/ A/$\mu\textrm{m}$ for the proposed LIGBT and 0.94${\times}$10$\^$-4/ A/$\mu\textrm{m}$ for the conventional LIGBT. The proposed SOI LIGBT exhibits 3 times larger latch-up capability than the conventional SOI LIGBT.

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Analysis of excess minority carrier and charge wish lifetimes in N-dirft region of NPT-IGBT (수명시간에 따른 NPT-IGBT의 N-drift 영역에서의 과잉소수 캐리어와 전하량 분석)

  • 류세환;이용국;안형근;한득영
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.844-847
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    • 2001
  • In this work, transient characteristics of the Non-Punch Through(NPT) Insulated Gate Bipolar Transistor(IGBT) has been studied. we has analyzed with lifetimes excess minority carrier injected into N-dirft, base region of IGBT's BJT part and accumulated charge of on-state which affected swiching characteristic. In this paper, excess minority carrier and charge distribution in active base region is expressed analytically. This analysis proposed optical trade-off between lifetimes and accumulated charge for decreasing switching losses because charge result in switching loss when device was tuned off.

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Analytical Modeling of the IGBT Device for Transient Analysis Simulation (과도 해석 시뮬레이션을 위한 IGBT소자의 논리적인 모델링)

  • Seo, Yong-Soo;Jang, Seong-Chil;Kim, Yong-Chun;Cho, Moon-Taek;Seo, Soo-Ho
    • Proceedings of the KIEE Conference
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    • 1993.11a
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    • pp.148-150
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    • 1993
  • The IGBT(Insulated Gate Bipolar Transistor) is a power semiconductor device that has gained acceptance among power electronic circuit design engineers for motor drive and Power converter applications. The device-circuit interaction of power insulated gate bipolar transistor for a series-inductor load, both with and without a snubber are, simulated. An analytical model for the transient operation of the IGBT is used in conjunction with the load circuit state equations for the simulations.

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Characteristic Analysis of 1200V Insulated Gate Bipolar Transistor Devices (1200V급 절연게이트 바이폴라 트랜지스터 특성 해석)

  • Kim, Sang-Cheol;Kim, Hyung-Woo;Kang, In-Ho;Joo, Sung-Jae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.212-213
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    • 2008
  • This paper describes the analysis of the device characteristics of the NPT type 1200V Insulated gate Bipolar Transistor. In case of NPT type IGBT devices, optimized n-epi layer thickness and concentration is important to obtain low on-state voltage and breakdown voltage characteristics. In this paper, we analyzed on-state and off-state characteristics of NPT type IGBT. Breakdown voltage of designed IGBT was higher than 1200V when we optimized Field Limiting Ring structures. And also, on-state voltage characteristics was shown less then 2.5V at 25A of drain current.

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A New SOI LIGBT Structure with Improved Latch-Up Performance

  • Sung, Woong-Je;Lee, Yong-Il;Park, Woo-Beom;Sung, Man-Young
    • Transactions on Electrical and Electronic Materials
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    • v.2 no.4
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    • pp.30-32
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    • 2001
  • In this paper, a new silicon-on-insulator (SOI) lateral insulated gate bipolar transistor (LIGBT) is proposed to improve the latch-up performance without current path underneath the n$^{+}$ cathode region. The improvement of latch-up performance is verified using the two- dimensional simulator MEDICI and the simulation results on the latch-up current density are 4468 A/cm2 for the proposed LIGBT and 1343 A/$\textrm{cm}^2$ for the conventional LIGBT. The proposed SOI LIGBT exhibits 3 times larger latch-up capability than the conventional SOI LIGBT.T.

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Analysis for the parallel operation of IGBT considering snubber circuit (스너버를 고려한 IGBT의 병렬운전 특성해석)

  • Kim, Yoon-Ho;Yoon, Byung-Do;Lee, Jang-Sun;Lee, Sang-Sup
    • Proceedings of the KIEE Conference
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    • 1993.07b
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    • pp.777-780
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    • 1993
  • An insulated gate bipolar transistor(IGBT) is a MOS gate turn on/off bipolar transistor which combines the attributes of the MOSFET and bipolar transistor. Because of its limitation of power capability compared to thyristor or GTO, some parallel connection of IGBT has been studied to improve the limitation of current capabillity. In this paper, the switching effects from the unbalance of internal parameters of IGBT and the turn-off snubber characteristics are investigated using SPICE program.

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