• Title/Summary/Keyword: High purity aluminum

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Effect of Aluminum Purity on the Pore Formation of Porous Anodic Alumina

  • Kim, Byeol;Lee, Jin Seok
    • Bulletin of the Korean Chemical Society
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    • v.35 no.2
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    • pp.349-352
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    • 2014
  • Anodic alumina oxide (AAO), a self-ordered hexagonal array, has various applications in nanofabrication such as the fabrication of nanotemplates and other nanostructures. In order to obtain highly ordered porous alumina membranes, a two-step anodization or prepatterning of aluminum are mainly conducted with straight electric field. Electric field is the main driving force for pore growth during anodization. However, impurities in aluminum can disturb the direction of the electric field. To confirm this, we anodized two different aluminum foil samples with high purity (99.999%) and relatively low purity (99.8%), and compared the differences in the surface morphologies of the respective aluminum oxide membranes produced in different electric fields. Branched pores observed in porous alumina surface which was anodized in low-purity aluminum and the size; dimensions of the pores were found to be usually smaller than those obtained from high-purity aluminum. Moreover, anodization at high voltage proceeds to a significant level of conversion because of the high speed of the directional electric field. Consequently, anodic alumina membrane of a specific morphology, i.e., meshed pore, was produced.

Fabrication of uniform micropattern arrays using nonionic surfactant-based wet etching process of high purity aluminum (비이온계 계면활성제기반 고순도 알루미늄 습식식각을 통한 균일한 마이크로패턴 어레이 제작)

  • Jang, Woong-Ki;Jeon, Eun Chae;Choi, Doo Sun;Kim, Byeong Hee;Seo, Young Ho
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.13 no.4
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    • pp.13-20
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    • 2014
  • In this paper, the effects of a nonionic surfactant on the etch uniformity and the etch profile during the wet-etching process of high-purity aluminum were investigated for the fabrication of uniform micropattern arrays. To improve the surface roughness of a high-purity aluminum plate, a mechanical lapping process and an electrolytic polishing process were used. After electrolytic polishing process, the surface roughness, Ra, of the high-purity aluminum plate was improved from $1.25{\mu}m$ to $0.02{\mu}m$. A photoresist was used as an etching mask during the aluminum etching process, where the mixture of phosphoric acid, acetic acid, nitric acid, a nonionic surfactant and water was used as the aluminum etchant. Different amounts of the Triton X-100 nonionic surfactant were added to the aluminum etchant to investigate the effect of a nonionic surfactant during the wet-etching process of high-purity aluminum. The etch rate and the etch profile were measured by an optical interferometer and a scanning electron microscope.

Synthesis of high purity aluminum nitride nanopowder by RF induction thermal plasma (유도결합 열 플라즈마를 이용한 고순도 질화알루미늄 나노 분말 합성)

  • Kim, Kyung-In;Choi, Sung-Churl;Han, Kyu-Sung;Hwang, Kwang-Taek;Kim, Jin-Ho
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.24 no.1
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    • pp.1-7
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    • 2014
  • Aluminum nitride, which has outstanding properties such as high thermal conductivity and electrical resistivity, has been received a great attention as a substrate and packaging material of semiconductor devices. Since aluminum nitride has a high sintering temperature of 2173 K and its properties depends on the impurity level, it is necessary to synthesize high-purity and nano-sized aluminum nitride powders for the applications. In this research, we synthesized high purity aluminum nitride nanopowders from aluminum using RF induction thermal plasma system. Sheath gas (NH3) flow was controlled to establish the synthesis condition of high purity aluminum nitride nanopowders. The obtained aluminum nitride nanopowders were evaluated by XRD, SEM, TEM, BET, FTIR and N-O analysis.

A pilot study of half-value layer measurements using a semiconductor dosimeter for intraoral radiography

  • Shun Nouchi;Hidenori Yoshida;Yusaku Miki;Yasuhito Tezuka;Ruri Ogawa;Ichiro Ogura
    • Imaging Science in Dentistry
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    • v.53 no.3
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    • pp.217-220
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    • 2023
  • Purpose: This pilot study was conducted to evaluate half-value layer (HVL) measurements obtained using a semiconductor dosimeter for intraoral radiography. Materials and Methods: This study included 8 aluminum plates, 4 of which were low-purity (less than 99.9%) and 4 high-purity (greater than 99.9%). Intraoral radiography was performed using an intraoral X-ray unit in accordance with the dental protocol at the authors' affiliated hospital: tube voltage, 60 kVp and 70 kVp; tube current, 7 mA; and exposure time, 0.10 s. The accuracy of HVL measurements for intraoral radiography was assessed using a semiconductor dosimeter. A simple regression analysis was performed to compare the aluminum plate thickness and HVL in relation to the tube voltage (60 kVp and 70 kVp) and aluminum purity (low and high). Results: For the low-purity aluminum plates, the HVL at 60 kVp (Y) and 70 kVp (Y) was significantly correlated with the thickness of the aluminum plate (X), with Y=1.708+0.415X (r=0.999, P<0.05) and Y=1.980+0.484X (r=0.999, P<0.05), respectively. Similarly, for the high-purity aluminum plates, the HVL at 60 kVp (Y) and 70 kVp (Y) was significantly correlated with the plate thickness(X), with Y=1.696+0.454X (r=0.999, P<0.05) and Y=1.968+0.515X (r=0.998, P<0.05), respectively. Conclusion: This pilot study examined the relationship between aluminum plate thickness and HVL measurements using a semiconductor dosimeter for intraoral radiography. Semiconductor dosimeters may prove useful in HVL measurement for purposes such as quality assurance in dental X-ray imaging.

AlN preparation by Self-propagation High-temperature Synthesis (SHS) in Al-N2 and Al-N2-AIN system (Al-N2와 Al-N2-AlN계에서 고온자전연소법에 의한 AlN 합성)

  • 이재령;이익규;안종관;김동진;안양규;정헌생
    • Journal of Powder Materials
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    • v.11 no.4
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    • pp.294-300
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    • 2004
  • This study for preparation of aluminum nitride (AlN) with high purity was carried out by self-propagating high-temperature synthesis method in two different systems, $Al-N_{2}$ and $Al-N_{2}$-AlN, with the change of nitrogen gas pressure and dilution factor. On the occasion of $Al-N_{2}$ system, unreacted aluminum was detected in the product in spite of high nitrogen pressure, 10 MPa, This may be caused by obstructing nitrogen gas flow to inner part of molten and agglomerate of aluminum, formed in pre-heating zone. In $Al-N_{2}$-AlN system, AlN with a purity of 95% or ever can be prepared in the condition of $f_{Dil}\geq0.5$, $P_{N_{2}}\geq$ 1 MPa, and the purity can be elevated to 98% over in the condition of $f_{Dil}$ = 0.7 and $P_{N_{2}}$ = 10 MPa.

Preparation of High Purity α-Alumina from Aluminum Black Dross by Redox Reaction (알루미늄 블랙 드로스로부터 산화 환원반응을 이용한 고순도 알파 알루미나의 제조)

  • Shin, Eui-Sup;An, Eung-Mo;Lee, Su-Jeong;Ohtsuki, Chikara;Kim, Yun-Jong;Cho, Sung-Baek
    • Korean Journal of Materials Research
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    • v.22 no.9
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    • pp.445-449
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    • 2012
  • We investigate the effects of redox reaction on preparation of high purity ${\alpha}$-alumina from selectively ground aluminum dross. Preparation procedure of the ${\alpha}$-alumina from the aluminum dross has four steps: i) selective crushing and grinding, ii) leaching process, iii) redox reaction, and iv) precipitation reaction under controlled pH. Aluminum dross supplied from a smelter was ground to separate metallic aluminum. After the separation, the recovered particles were treated with hydrochloric acid(HCl) to leach aluminum as aluminum chloride solution. Then, the aluminum chloride solution was applied to a redox reaction with hydrogen peroxide($H_2O_2$). The pH value of the solution was controlled by addition of ammonia to obtain aluminum hydroxide and to remove other impurities. Then, the obtained aluminum hydroxide was dried at $60^{\circ}C$ and heat-treated at $1300^{\circ}C$ to form ${\alpha}$-alumina. Aluminum dross was found to contain a complex mixture of aluminum metal, aluminum oxide, aluminum nitride, and spinel compounds. Regardless of introduction of the redox reaction, both of the sintered products are composed mainly of ${\alpha}$-alumina. There were fewer impurities in the solution subject to the redox reaction than there were in the solution that was not subject to the redox reaction. The impurities were precipitated by pH control with ammonia solution, and then removed. We can obtain aluminum hydroxide with high purity through control of pH after the redox reaction. Thus, pH control brings a synthesis of ${\alpha}$-alumina with fewer impurities after the redox reaction. Consequently, high purity ${\alpha}$-alumina from aluminum dross can be fabricated through the process by redox reaction.

Synthesis of High Purity Aluminum Nitride Nanopowder in Ammonia and Nitrogen Atmosphere by RF Induction Thermal Plasma (RF 유도결합 열 플라즈마를 이용한 암모니아와 질소분위기에서 고순도 AlN 나노 분말의 합성)

  • Kim, Kyung-In;Choi, Sung-Churl;Kim, Jin-Ho;Hwang, Kwang-Taek;Han, Kyu-Sung
    • Journal of the Korean Ceramic Society
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    • v.51 no.3
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    • pp.201-207
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    • 2014
  • High-purity aluminum nitride nanopowders were synthesized using an RF induction thermal plasma instrument. Ammonia and nitrogen gases were used as sheath gas to control the reactor atmosphere. Synthesized AlN nanopowders were characterized by XRD, SEM, TEM, EDS, BET, FTIR, and N-O analyses. It was possible to synthesize high-purity AlN nanoparticles through control of the ammonia gas flow rate. However, additional process parameters such as plasma power and reactor pressure had to be controlled for the production of high-purity AlN nanopowders using nitrogen gas.

Effect of Electrolyte-Additives on the Performance of Al-Air Cells (전해질 첨가제가 알루미늄-공기전지의 성능에 미치는 영향)

  • Park, Gwun Pil;Chun, Hai Soo
    • Applied Chemistry for Engineering
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    • v.9 no.1
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    • pp.52-57
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    • 1998
  • The effects of additives such as zinc compounds in 4M KOH electrolyte of Al-air cell have been studied. Zinc compounds in electrolyte increased hydrogen evolution overpotential and TPC(tripotasium citrate)/CaO formed fine film on aluminum surface, and these additives decreased hydrogen evolution rate and corrosion rate of aluminum. These additives shifted the OCP in the positive direction on high purity aluminum(purity, 99.999%) and in the negative direction on Al No 1050(purity,99.5%). Addition of two or more additives resulted in the prevention or the reduction of corrosion rate and hydrogen evolution at OCP. As the overpotential on Al electrode increased, the hydrogen evolution rate decreased and the utilization of aluminum increased. At high current density$(>100mA/cm^2)$, TPC/CaO/ZnO additives increased the utilization of high purity aluminum up to that of aluminum alloys containing indium, gallium and thallium.

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Preparation of Alumina and Amorphous Silica from Clay Minerals (점토광물로부터 알루미나 및 비정질 실리카 제조에 관한 연구)

  • 박희찬;조원제;강효경;손명모
    • Journal of the Korean Ceramic Society
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    • v.26 no.1
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    • pp.81-90
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    • 1989
  • High purity alumina and amorphous silica were prepared from Ha-dong kaolin by means of appliance of sulfuric acid. The effect of sulfuric acid concentration, reaction temperature and reaction time on the formation of aluminum sulfate was investigated. The precipitation conditions ofaluminum sulfate from the sulfuric acid solution with ethanol and ammonium hydroxide were deteremined. In the optimum condition, the conversion of aluminum oxide in kaolin to aluminum oxide powder was 85.0 percent. Alumina powder was prepared by calcination of the precipitates, and its purity was 99.0 percent.

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Fabrication and Characterization of High Purity of Fine Alumina from Korean Alunite and Sulfate Salts (국산 명반석과 황산염으로부터 고순도의 미세한 알루미나의 제조 및 특성에 관한 연구)

  • 변수일;이수영;김종희
    • Journal of the Korean Ceramic Society
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    • v.16 no.1
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    • pp.13-20
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    • 1979
  • High purity alumina has been extracted form low grade Korean alunite. Alunite ore was treated by 15% $NH_4OH$ solution, followed by 10% $H_2SO_4$ leaching and metallic impurities such as Fe and Ti were removed by solvent extraction method. Alumina prepared by the extraction process was 99.9% in purity. Hot Petroleum Drying Method has been employed for the preparation of uniformly fine alumina powder, using chemical reagent aluminum sulfate and ammonium aluminum sulfate extrated from Korea alunite. The sinterability of alumina powder prepared by Hot Petroleum Drying Method was shown to be improved in comparison with the one treated by other methods such as ball milling method, but dry pressing was difficult due to the agglomeration of calcined powder. The best slip of alumina powder prepared by Hot Petroleum Drying Method contained a lower soild content than the one treated by other methods. The alumina body formed by soild and drain casting with the former alumina powder showed a higher sintered density.

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