Journal of the Korean Society of Manufacturing Process Engineers (한국기계가공학회지)

The Korean Society of Manufacturing Process Engineers (한국기계가공학회)
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Fabrication of uniform micropattern arrays using nonionic surfactant-based wet etching process of high purity aluminum

비이온계 계면활성제기반 고순도 알루미늄 습식식각을 통한 균일한 마이크로패턴 어레이 제작

  • 장웅기 (강원대학교 기계메카트로닉스공학과) ;
  • 전은채 (한국기계연구원 나노공정연구실) ;
  • 최두선 (한국기계연구원 나노공정연구실) ;
  • 김병희 (강원대학교 기계메카트로닉스공학과) ;
  • 서영호 (강원대학교 기계메카트로닉스공학과)
  • Received : 2014.08.04
  • Accepted : 2014.08.20
  • Published : 2014.08.31
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Abstract

In this paper, the effects of a nonionic surfactant on the etch uniformity and the etch profile during the wet-etching process of high-purity aluminum were investigated for the fabrication of uniform micropattern arrays. To improve the surface roughness of a high-purity aluminum plate, a mechanical lapping process and an electrolytic polishing process were used. After electrolytic polishing process, the surface roughness, Ra, of the high-purity aluminum plate was improved from $1.25{\mu}m$ to $0.02{\mu}m$. A photoresist was used as an etching mask during the aluminum etching process, where the mixture of phosphoric acid, acetic acid, nitric acid, a nonionic surfactant and water was used as the aluminum etchant. Different amounts of the Triton X-100 nonionic surfactant were added to the aluminum etchant to investigate the effect of a nonionic surfactant during the wet-etching process of high-purity aluminum. The etch rate and the etch profile were measured by an optical interferometer and a scanning electron microscope.

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References

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