• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.29-30
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• 2001

This paper presents some results of plasma nitriding on hard chromium deposit. The substrates were C45 steel and $30~50{\;}\mu\textrm{m}$ of chromium deposit by electroplating was formed. Plasma nitriding was carried out in a plasma nitriding system with $95NH_3{\;}+{\;}SCH_4$ atmosphere at the pressure about 600 Pa and different temperature from $450^{\circ}C{\;}to{\;}720^{\circ}C$ for various time. Optical microscopy and X-ray diffraction were used to evaluate the characteristics of surface nitride layer formed by nitrogen diffusion from plasma atmosphere inward iCr coating and interface carbide layer formed by carbon diffusion from substrate outward Cr coating. The microhardness was measured using microhareness tester at the load of 100 gf. Corrosion resistance was evaluated using the potentiodynamic measurement in 3.5% NaG solution. A saturated calomel electrode (SiCE) was used as the reference electrode. Fig.1 shows the typical microstructures of top surface and cross-section for nitrided and unnitrided samples. Aaer plasma nitriding a sandwich structure was formed consisting of surface nitride layer, center chromium layer and interface carbide layer. The thickness of nitride and carbide layers was increased with the increase of processing temperature and time. Hardness reached about 1000Hv after nitriding while 900Hv for unnitrided hard chromium deposit. X-ray diffraction indicated that surface nitrided layer was a mixture of $Cr_2N$ and CrN at low temperature and erN at high temperature (Fig.2). Anodic polarization curves showed that plasma nitriding can greatly improve the corrosion resistance of chromium e1ectrodeposit. After plasma nitriding, the corrosion potential moved to noble direction and passive current density was lower by 1 to 4 orders of magnitude compared with chromium deposit(Fig.3).

• Korean Journal of Materials Research
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• v.14 no.1
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• pp.46-51
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• 2004

The annealing of a Cu(4.5at.% Mg)/$SiO_2$/Si structure in ambient $O_2$, at 10 mTorr, and $300-500^{\circ}C$, allows for the outdiffusion of the Mg to the Cu surface, forming a thin MgO (15 nm) layer on the surface. The surface MgO layer was patterned, and successfully served as a hard mask, for the subsequent dry etching of the underlying Mg-depleted Cu films using an $O_2$ plasma and hexafluoroacetylacetone [H(hfac)] chemistry. The resultant MgO/Cu structure, with a taper slope of about $30^{\circ}C$ shows the feasibility of the dry etching of Cu(Mg) alloy films using a surface MgO mask scheme. A dry-etched Cu(4.5at.% Mg) gate a-Si:H TFT has a field effect mobility of 0.86 $\textrm{cm}^2$/Vs, a subthreshold swing of 1.08 V/dec, and a threshold voltage of 5.7 V. A novel process for the dry etching of Cu(Mg) alloy films, which eliminates the use of a hard mask, such as Ti, and results in a reduction in the process steps is reported for the first time in this work.

• Journal of the Korean Society of Clothing and Textiles
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• v.24 no.3
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• pp.429-439
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• 2000

This study was aimed to investigate the handle and mechanical properties of silk woven fabrics according to the fabric structure and yarn types 56 male and female students evaluated 16 black specimens with semantic differential scale of 20 hand adjectives. Mechanical parameters such as surface properties, bending properties and compression properties were tested using by KES-FS system. Data were analyzed through factor analysis, pearson correlation coefficient and t-test using PC SAS package. The results were as follows: The hand adjectives were grouped as 4 'surface roughness', 'flexibility', ;sense of thermal', and 'dryness'. 'Surface roughness' was highly sensed at satin fabrics of hard-twist yarn, noil yarn and spun yarn, while it was not at the fabrics of normal satin and twill at all. 'Flexibility' was reverse to 'surface roughness'. Thermal sense was felt highly at satin fabrics of noil-yarn, while low at plain fabrics of normal yarn. 'Dryness' was high at satin fabrics of hard-twist yarn and while it was low at normal satin fabrics. Predicted equations for subjective hand from mechanical properties of fabrics were developed using Stevens's law and stepwise regression and the coefficients of determination were high.

• Design & Manufacturing
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• v.14 no.1
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• pp.36-41
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• 2020

Recently, due to the development of MEMS technology, researches for the production of effective micro structures and shapes have been actively conducted. However, the process technology based on chemical etching has a number of problems such as environmental pollution and time problems due to multi-process. Various processes to cope with this process are being studied, and one of the mechanical etching processes is the powder blasting process. This process is a method of spraying fine particles, which has the advantage of being an effective process in manufacturing hard brittle materials. However, it is also a process that adversely affects the material surface roughness and material properties due to the impact of the injection of fine particles. In this study, after fabricating micro-channels in fused silica glass with excellent optical properties among the hard brittle materials, we used the nano indentation system to analyze the micro parts using nano-particles as well as machinability and surface roughness analysis of the processed surface. The analysis was performed for the effective processing of powder blasting.

• Journal of Korean Physical Therapy Science
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• v.9 no.1
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• pp.113-121
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• 2002

The purpose of this study was to investigate the effects of home exercise program on the improvement of balance in the elderly. Subjects were twenty members living in Daegu (10 males, 10 females), between 65 and 81 years of age. The subjects for the experimental group were participated in the home exercise program for 8 weeks, between April 2001 and June 2001. The results of this study were as follows: After the exercise program, balance ability by CTSIB in the experiment group improved with no statistical significance. On the other hand, balance ability by OLST was significantly improved in the condition with open eyes than dosed eyes. Balance ability by OLSTR was improved 37.2% (p<0.001) on the hard surface with open eyes and improved 41.1% (p<0.01) on the soft surface with open eyes. Balance ability by OLSTL improved 37.1% (p<0.001) on the hard surface with open eyes and improved 72.5% (p<0.001) on the soft surface with open eyes. Balance ability by BBT also improved 1.7% (p<0.05).

• Journal of the Korean Ceramic Society
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• v.50 no.6
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• pp.523-527
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• 2013

Ti-based coatings following laser ablation were studied to compare degradation behaviors by thermomechanical stress. TiN, TiCN, and TiAlN coatings were degraded by a Nd:YAG pulsed laser with an increase in the laser pulses. A decrease in the hardness was identified as the pulses increased, and the hardness levels were in the order of TiAlN > TiCN > TiN. The TiN showed cracks on the surface, and cracks with pores formed along the cracks were observed in the TiCN. The dominant degradation behavior of the TiAlN was surface pore formation. EDS results revealed that diffusion of substrate atoms to the coating surface occurred in the TiN. Delamination occurred in the TiN and TiCN, while the TiAlN which has higher thermal stability than the TiN and TiCN maintained adhesion to the substrate. It was considered that the decrease in the hardness of the Ti-based hard coatings is attributed to surface cracking and the diffusion of substrate atoms.

• Journal of the Korean institute of surface engineering
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• v.52 no.4
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• pp.203-210
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• 2019

In this work, anodizing behavior of 6xxx series aluminum alloys was studied under constant current density and constant voltage conditions in 20% sulfuric acid solution by V-t curves, I-t curves, thickness measurement, observations of surface appearance and cross-sectional observation of anodizing films. The film growth rate of the anodizing films on Al6063, Al6061 and Al6082 obtained at 20 V were $0.63{\mu}m/min$. $0.46{\mu}m/min$ and $0.38{\mu}m/min$, respectively. Time to the initiation of imperfections at the oxide/substrate interface under constant current condition was shortened and colors of anodizing films became darker with the amount of alloying elements in 6xxx series aluminum alloys. Based upon the experimental results obtained in this work, it is concluded that maximum anodizing film thickness without interfacial defects is reduced with increasing amount of alloying elements and brighter anodizing films can be obtained by decreasing amount of alloying elements in the aluminum alloys.

• Journal of the Semiconductor & Display Technology
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• v.18 no.2
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• pp.44-47
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• 2019

Amorphous carbon layer (ACL) is actively used as an etch mask. Recent advances in patterning ACL requires the next level of durability of hard mask in high aspect ratio etch in near future semiconductor manufacturing, and it is worthwhile to know the surface property of ACL thin film to enhance the property of etch hard mask. In this research, ACL are deposited by 6 inch plasma enhanced chemical vapor deposition system with $C_3H_6$ and $N_2$ gas mixture. Surface properties of deposited ACL are investigated depending on gas flow, pressure, RF power. Fourier transform infrared is used for the analysis of surface chemistry, and X-ray photoemission spectra is used for the structural analysis with the consideration of the contents of $sp^2$ and $sp^3$ through fitting of C1s. Also mechanical properties of deposited ACL are measured in order to evaluate hardness.

• Journal of the Semiconductor & Display Technology
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• v.12 no.4
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• pp.55-59
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• 2013

Mold die sticking arises from silica filler abrasion to the cavity surface. Ni-P electroplating was examined to substitute conventional hard Cr plating. More than 4% of Phosphorus in the electroplated film produces nano crystal structure and annealing makes $Ni_3P$ precipitated to get hardness values equivalent to hard Cr.

• Journal of the Korean Magnetics Society
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• v.8 no.6
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• pp.395-399
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• 1998

평면 실리콘 헤드를 사용한 디스크 드라이브(hard disk:HDD) 시스템의 average bit error rate(ABER)를 계산하였다. ABER을 구하기 위해 3차원 유한 요소법을 사용하여 헤드 자장 분포를 구하고 error rate response surface(ERRS)를 구하엿다. 다음에 track misregistration(TMR)과 계산되어진 ERRS를 컨볼루션하여 ABER을 시뮬레이션 하였다. 허용할 수 잇는 에러 율이 10-6이라 하고 트랙 피치가 3.7$\mu$m일 때, 요구되는 TMR은 0.36$\mu$m이었다. 이는 트랙 피치의 9.7이었다.