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Surface Properties of ACL Thin Films Depending on Process Conditions  

Kim, Kwang Pyo (Department of Electronics Engineering, Myongji University)
Choi, Jeong Eun (Department of Electronics Engineering, Myongji University)
Hong, Sang Jeen (Department of Electronics Engineering, Myongji University)
Publication Information
Journal of the Semiconductor & Display Technology / v.18, no.2, 2019 , pp. 44-47 More about this Journal
Abstract
Amorphous carbon layer (ACL) is actively used as an etch mask. Recent advances in patterning ACL requires the next level of durability of hard mask in high aspect ratio etch in near future semiconductor manufacturing, and it is worthwhile to know the surface property of ACL thin film to enhance the property of etch hard mask. In this research, ACL are deposited by 6 inch plasma enhanced chemical vapor deposition system with $C_3H_6$ and $N_2$ gas mixture. Surface properties of deposited ACL are investigated depending on gas flow, pressure, RF power. Fourier transform infrared is used for the analysis of surface chemistry, and X-ray photoemission spectra is used for the structural analysis with the consideration of the contents of $sp^2$ and $sp^3$ through fitting of C1s. Also mechanical properties of deposited ACL are measured in order to evaluate hardness.
Keywords
ACL; FT-IR; XPS; Nanoindentation; Box-Behnken;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
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