• Journal of Hydrogen and New Energy
• /
• v.24 no.2
• /
• pp.160-171
• /
• 2013

$LiNi_{1/3}Co_{1/3}Mn_{1/3}O_2$ powder for cathode materials in lithium rechargeable batteries was treated by atmospheric plasma containing hydrogen to investigate the relationship between charge/discharge performance and physical/chemical changes of materials. Hydrogen plasma at atmosphere pressure was irradiated on the surface of active materials, and the change for their crystal structure, surface morphology, and chemical composition were observed by XRD, SEM-EDS and titration method, respectively. The crystal structure and surface morphology of $H_2$ plasma-treated powders were not changed but their chemical compositions were slightly varied. For charge/discharge test, $H_2$ plasma affected initial capacity and rate capability of active materials but continuous cycling was not subject to plasma treatment. Therefore, it was observed that $H_2$ plasma treatment affected the surface of materials and caused the change of chemical composition.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2015.08a
• /
• pp.136.1-136.1
• /
• 2015

In the present study, UHF (320 MHz) in combination with RF (13.56 MHz) plasmas was used for the synthesis of hydrogenated silicon nitride (SiNx:H) films by PECVD process at low temperature. RF/UHF hybrid plasmas were maintained at a fixed pressure of 410 mTorr in the N2/SiH4 and N2/SiH4/NH3 atmospheres. To investigate the radical generation and plasma formation and their control for the growth of the film, plasma diagnostic tools like vacuum ultraviolet absorption spectroscopy (VUVAS), optical emission spectroscopy (OES), and RF compensated Langmuir probe (LP) were utilized. Utilization of RF/UHF hybrid plasmas enables very high plasma densities ~ 1011 cm-3 with low electron temperature. Measurements using VUVAS reveal the UHF source is quite effective in the dissociation of the N2 gas to generate more active atomic N. It results in the enhancement of the Si-N bond concentration in the film. Consequently, the deposition rate has been significantly improved up to 2nm/s for the high rate synthesis of highly transparent (up to 90 %) SiNx:H film. The films properties such as optical transmittance and chemical composition are investigated using different analysis tools.

• Korean Journal of Materials Research
• /
• v.3 no.6
• /
• pp.565-574
• /
• 1993

The Ar/Ar- $H_{2}$ plasma method Lvas applied to reduce and refine high purity Nb metal. Inaddition, the reaction between molten Nb metal and hydrogen were also analyzed in the Ar-(20%)$H_{2}$plasma. The metallic Nb of 99.5wt% was obtained at the ratio of $C/Nb_{2}O_{5}$=5.00 in the Ar plasma reductionand the $O_2$ loss from the thermal decomposition of niobium oxides did not take place. In the Ar-(20%)Hi plasma the metallic Nb of 99.8wt% was produced at the ratio of $C/Nb_{2}O_{5}$=4.80. It was observedthat a major reaction of the deoxidation was the reaction with H, Hi, and a deoxidation by the evaporationof $NbO_x$ did not occur but a mass loss of Nb did by a "splash" effect. The deoxidation reaction rateobeyed the 1st order reaction kinetics and the reaction rate constant(k') of deoxidation was $7.8 \times 10_{-7}$(m/sec).The solubility of hydrogen in Nb metal was 60ppm and it was larger than the solubility of molecularstate hydrogen by 40ppm in the Ar-(20%)$H_{2}$ plasma method. A saturation was within 60sec anda hydrogen content was reduced below lOppm by a Ar plasma re-treatment.by a Ar plasma re-treatment.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.22 no.5
• /
• pp.448-454
• /
• 2009

Hydrogen was produced from water plasma excited in high frequency (HF) inductively coupled tubular reactor. Mass spectrometry was used to monitor gas phase species at various process conditions, Water dissociation rate depend on the process parameters such as ICP power, $H_{2}O$ flow-rate and process pressure, Water dissociation percent in ICP reactor decrease with increase of chamber pressure, while increase with increase of ICP power and $H_{2}O$ flow rate. The effect of $CH_4$ gas addition to a water plasma on the hydrogen production has been studied in a HF ICP tubular reactor. The main roles of $CH_4$ additive gas in $H_{2}O$ plasma are to react with 0 radical for forming $CO_x$ and CHO and resulting additional $H_2$ production. Furthermore, $CH_4$ additives in $H_{2}O$ plasma is to suppress reverse-reaction by scavenging 0 radical. But, process optimization is needed because $CH_4$ addition has some negative effects such as cost increase and $CO_x$ emission.

• Biomedical Science Letters
• /
• v.8 no.4
• /
• pp.275-282
• /
• 2002

This study was carried out to investigate the effect of fibrinogen genotype and other characteristics on the plasma fibrinogen levels. Many studies have conformed that high plasma fibrinogen levels are associated with the increased risk of ischaemic heart disease, stroke and arterial disease. And fibrinogen levels are related with age, obesity, cholesterol and alcohol consumption, genotypes. For this study the blood samples were collected from 93 healthy Koreans (66 males and 27 females). The blood samples were individually analyzed by smoking status, cholesterol levels, genotype, age, and gender. The plasma fibrinogen was assayed by clotting method (modified Clauss assay) and cholesterol was assayed by cholesterol oxidase method. Subjects were classified by current smokers, ex-smokers (<6 month), or nonsmokers. The $\beta$-fibrinogen genotype was detected by PCR of relevant region and digestion with HaeIII, with the H$_1$H$_1$ allele allowing cleavage by this restriction enzyme and H$_2$H$_2$ allele being refractory. In conclusion, the study shows that the factor of the increasement in the fibrinogen level was closely related with the cholesterol level, smoking status and genotype (H$_1$H$_2$); but there was no significant difference by gender, Especially, among the people over 50 years of age, fibrinogen level was higher with the increasement of cholesterol level (<200 mg/dl), current smoker, and genotype H$_1$H$_2$.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.08a
• /
• pp.309-309
• /
• 2010

We have investigated the effect of $H_2$ plasma treatment on the BZO (ZnO:B, Boron doped ZnO) thin films. The BZO thin films are prepared by LP-MOCVD (Low Pressure Metal Organic Chemical Vapor Deposition) technique and the samples of BZO thin film are performed with $H_2$ plasma treatment by plasma treatment system with 13.56 MHz as RIE (Reactive Ion Etching) type. After exposing $H_2$ plasma treatment, measurement of transmittance, reflectance and haze spectra in 300~1100 nm, electrical properties as resistivity, mobility and carrier concentration and work function was analysed. Regarding the results of the $H_2$ plasma treatment on the BZO thin films are application to the TCO for solar cells, such as the a-Si thin films solar cell.

• Journal of Korean Ophthalmic Optics Society
• /
• v.4 no.1
• /
• pp.15-20
• /
• 1999

Visible light spectrum emitted from $H_2$ plasma in the parallel plate reactor using a commercial electric power are investigated by optical emission spectroscopy. Intensity of visible light is measured as a function of $H_2$ pressure and discharging power, and the intensity is compared with plasma density measured with the probe. As a result, the intensity is affected by plasma density and the plasma density is controlled the $H_2$ pressure and the discharging power.

• Journal of Surface Science and Engineering
• /
• v.29 no.6
• /
• pp.648-653
• /
• 1996

Hydrogenated amorphous carbon(a-C:H) films are prepared by rf plasma CVD in a $CH_4$ source gas system diluted with Ar of $H_2$. The spectra of emissive and reactive species in the plasma are detected using in stiu optical emission spectroscopy. Inaddition, the relationship between the film properties which can be varied by the deposition parameters and the Raman spectra is studied. In the $CH_4/H_2$ gas system, the emission intensities of CH and $H \tau$ decrease and those of $H \alpha$, $H \beta$, $C_2$ and Ar increase with increasing $H_2$ concentration, The formation of $C_2$ and CH in the $CH_4/Ar/H_2$ gas system is greatly suppressed by hydrogen addition and the excess of hydrogen addition is found to form graphite structure. The $C_2$ formation in the gas phase enhances a-C:H film formation.

• Korean Journal of Materials Research
• /
• v.14 no.1
• /
• pp.52-58
• /
• 2004

The surface property and formation behavior of a boride layer formed on Ni-Cr-Mo steel in a plasma paste boronizing treatment were investigated. The plasma paste boronizing treatment was carried out at 973～1273 K for 1-7 hrs under the gas ratio of Ar:H$_2$ (2:1). The thickness of the boride layer increased with increasing temperature and time in the boronizing treatment. The cross-section of the boride layer was a tooth structure and the hardness was Hv 2000～2500. XRD analysis revealed that the compound was identified as FeB, $Fe_2$B, and mixed phase of FeB/$Fe_2$B in the boride layer formed at 973～1073 K, 1173K, and 1273K, respectively. The Ni-Cr-Mo alloy boronized at 1173-1273 K showed the best excellent wear resistance against the sand. As a results of corrosion test in 1 M $H_2$$SO_4$ solution, $Fe_2$B formed on the matrix alloy exhibited higher corrosion resistance than FeB.

• Asian-Australasian Journal of Animal Sciences
• /
• v.13 no.11
• /
• pp.1536-1541
• /
• 2000

The present study was carried out to measure changes of feed intake and thirst level caused by water deprivation in goats fed on dry feed and to elucidate the relationship between those two parameters. Water deprivation significantly (p<0.01) decreased cumulative feed intake and rate of eating at 30, 60, 90 and 120 min, respectively, after feed presentation. Cumulative feed intake, after completion of 2 h feeding, was reduced by about 20, 21 and 64 % due to water deprivation during feeding for 2 h (WD2), for 22 h (WD22) and for 46 h (WD46), respectively, compared to free access to water (FAW). Compared to the FAW, WD2, WD22 and WD46 increased thirst level by about 5, 5 and 9 times, respectively. Mean thirst level (X, g/30 min) was negatively correlated with cumulative feed intake (Y, g DM) after completion of 2h feeding (Y=1302-0.2 X, $r^2=0.97$, p<0.05). Water deprivation depressed plasma volume and there was a significant positive regression between plasma volume (X, ml) and cumulative feed intake (Y, g DM) after completion of 2h feeding (Y=-1003+0.6 X, $r^2=0.99$, p<0.01). Mean plasma osmolality (X, mOsmol/l) correlated significantly and negatively with cumulative feed intake (Y, g DM) after completion of 2h feeding (Y=27004-84.9 X, $r^2=0.95$, p<0.05). In conclusion, a decrease of feed intake during water deprivation is mainly due to an increase of thirst level quantitatively, and the act of feeding itself induces thirst more than the length of water-deprivation periods in goats fed on dry feeds. The present findings suggest that plasma osmolality and plasma volume which affect thirst level are involved in the decrease of feed intake in water-deprived goats.